Increasingly, SoC designs consist of assembling blocks of pre-designed IP. One special case is the derivative design where not just the IP blocks get re-used but a lot of the assembly itself. For example, in the design below some blocks are added, some blocks are updated, some hierarchy is changed. But the bulk of the design remains… Read More
There’s never a dull moment in the foundry race to offer FinFET processes that enable leading-edge SoC design. Today I attended a webinar hosted by Samsung and Synopsys on how to enable 14nm FinFET design. The two speakers were Dr. Kuang-Kuo Lin from Samsung and Dr. Henry Sheng from Synopsys.
Dr. Kuang-Kuo Lin, Samsung
Dr.… Read More
As we get down to smaller and smaller process nodes, the problem of soft errors becomes increasingly important. These soft errors are caused by neutrons from cosmic rays, alpha particles from materials used in manufacture and other sources. For chips that go into systems with high reliability this is not something that can be ignored.… Read More
Every process node these days has a new “gotcha” that designers need to be aware of. In some ways this has always been the case but the changes used to be gradual. But now each process node has something discontinuously different. At 20nm the big change is double patterning. At 14/16nm it is FinFET.
Rahul Deokar and John… Read More
Sequential clock gating offers more power savings that can be obtained just with combinational clock gating. However, sequential clock gating is very complex as it involves temporal analysis over multiple clock cycles and examination of the stability, propagation, and observability of signal values.
Trying to do sequential… Read More
EDA vendors, IP suppliers and Foundries provide an eco-system for SoC designers to use in getting their new electronic products to market quicker and at a lower cost. An example of this eco-system are three companies (TSMC, Atrenta, Sonics) that teamed up to produce a webinar earlier in March called: Unlocking the Full Potential… Read More
Design For Manufacturing (DFM) is the art and science of making an IC design yield better in order to receive a higher ROI. Ian Smith, an AE from Mentor in the Calibre group presented a pertinent webinar, IP Scoring Using TSMC DFM Kits. I’ll provide an overview of what I learned at this webinar.… Read More
In 2012 FinFET is one of the most talked about MOS technologies of the year because traditional planar CMOS has slowed down on scaling below the 28nm node. To learn more about FinFET process modeling I attended a Synopsys webinar where Bari Biswas presented for about 42 minutes include a Q&A portion at the end.
Bari Biswas, Synopsys… Read More
In April I attended and blogged about a webinar on MEMS and IC co-design hosted by two EDA companies: SoftMEMS and Tanner EDA. On October 30th you can attend a full-day event in Israel that is more comprehensive than the webinar that I attended.… Read More
When I think of EDA companies the first geography that comes to mind is Silicon Valley because of the rich history of semiconductor design and fabrication, being close to your customers always makes sense. In the information era it shouldn’t matter so much where you develop EDA tools, so there has been a gradual shift to a wider… Read More
