It is free after you pay for it and there is a one-time annual fee: The Case for FD-SOI

It is free after you pay for it and there is a one-time annual fee: The Case for FD-SOI
by Camille Kokozaki on 05-04-2012 at 7:09 am

In one of Portlandia’s TV program sketches, there is a funny interchange between a carrier salesperson and Fred Armisen (of SNL fame) who was trying to buy a phone. One chuckle line was a statement by the seller that the phone was free after paying for it and that there was a one-time annual fee. With this anecdote as a mental backdrop,… Read More


28nm Layout Needs Signoff Quality at Design Time

28nm Layout Needs Signoff Quality at Design Time
by Pawan Fangaria on 05-03-2012 at 8:30 pm

We are all aware that at 28nm and below several types of complex layout effects manifest themselves into the design and pose a herculean task, with several re-spins to correct them at pre-tapeout. It’s apparent that the layout needs to be correct by construction at the very beginning during the design stage.

Having worked at CadenceRead More


The Biggest EDA Company You’ve Never Heard Of

The Biggest EDA Company You’ve Never Heard Of
by Paul McLellan on 05-02-2012 at 8:30 pm

There’s this EDA company. They have over 100 tapeouts. They have a $28M in funding. They have 250 people. And you’ve never heard of them. Or at least I hadn’t.

They are ICScape. They started in 2005 with an investment from Acorn Campus Ventures and delivered their first product, ClockExplorer, in 2007 and their… Read More


Use a SpyGlass to Look for Faults

Use a SpyGlass to Look for Faults
by Paul McLellan on 05-02-2012 at 5:24 pm

There is a famous quote (probably attributed to Mark Twain who gets them all by default) “When looking for faults use a mirror not a spyglass.” Of course if you have RTL of your IP or your design then using a SpyGlass is clearly the better way to go. But it is getting even better since there is a new enhanced release, SpyGlass… Read More


ARM Models: Carbon Inside

ARM Models: Carbon Inside
by Paul McLellan on 05-01-2012 at 10:00 pm

ARM used to build their own models. By hand. They had an instruction-set simulator (ISS) called ARMulator that was largely intended for software development, and cycle-accurate models that were intended to run within digital simulators for development of the hardware of ARM-based systems.

There were two problems with this … Read More


RedHawk: On to the Future

RedHawk: On to the Future
by Paul McLellan on 05-01-2012 at 6:00 am

For many, maybe most, big designs, Apache’s RedHawk is the signoff tool for analyzing issues around power: electromigration, power supply droop, noise, transients and so on. But the latest designs have some issues: they are enormous (so you can’t just analyze them naively any more than you can run a Spice simulation… Read More


GSA 3DIC and Cadence

GSA 3DIC and Cadence
by Paul McLellan on 04-29-2012 at 10:00 pm

At the GSA 3D IC working group meeting, Cadence presented their perspective on 3D ICs. Their view will turn out to be important since the new chair of the 3D IC working group is going to be Ken Potts of Cadence. Once GSA decided the position could not be funded then an independent consultant like Herb Reiter had to bow out and the position… Read More


Intel says fabless model collapsing… really?

Intel says fabless model collapsing… really?
by Daniel Nenni on 04-28-2012 at 7:00 pm

There is an interesting discussion in the SemiWiki forum in response to the EETimes article: Intel exec says fabless model ‘collapsing’. Definitely an interesting debate, one worth our time since the advertising click hungry industry pundits will certainly jump all over it. Clearly I’m biased since I helped build… Read More


Keeping Moore’s Law Alive

Keeping Moore’s Law Alive
by Paul McLellan on 04-27-2012 at 12:37 pm

At the GSA silicon summit yesterday the first keynote was by Subramanian Iyer of IBM on Keeping Moore’s Law Alive. He started off by asking the question “Is Moore’s Law in trouble?” and answered with an equivocal “maybe.”

Like some of the other speakers during the day, he pointed out that … Read More


Introduction to FinFET technology Part II

Introduction to FinFET technology Part II
by Tom Dillinger on 04-27-2012 at 9:00 am

The previous post in this series provided an overview of FinFET devices. This article will briefly cover FinFET fabrication.

The major process steps in fabricating silicon fins are shown in Figures 1 through 3. The step that defines the fin thickness uses Sidewall Image Transfer (SIT). Low-pressure chemical vapor (isotropic)… Read More