This year’s Mentor Graphics user group meeting, User2User, will be held at the DoubleTree by Hilton in San Jose, California on April 25, 2013. The featured keynote presenters include…
Yesterday evening was the annual EDAC CEO forecast meeting. Actually it is not really a forecast meeting any more, more a sort of CEO response to some survey questions asked of EDAC members. Rich Valera of Needham moderated with Lip-Bu, Aart and Wally, along with Simon Segars representing the IP arm(!) of the business and Raul Camposano… Read More
What: Better IP Test with IJTAG
When: 26 March, 2013, 10:30am-1:30pm
Where: Mentor Graphics, 46871 Bayside Parkway, Fremont, CA 94538
If you are involved in IC test*, you’ve probably heard about the IEEE P1687 standard, called IJTAG for ‘internal’ JTAG. IJTAG defines a standard for embedded IP that includes simple… Read More
During DVCon I met with Steve Bailey to get an update on Mentor’s verification. They were also announcing some new capabilities. I also attended Wally Rhines keynote (primarily about verification of course, since this was DVCon; I blogged about that here) and the Mentor lunch (it was pretty much Mentor all day for me) on the… Read More
Wally Rhines gave the keynote at DVCon yesterday. He started out with a game of “name that graph” which was unfortunately a bit spoiled since when the names were revealed the first line was off the top of the screen. But he extrapolated several trends such as the decreasing number of fabs (the current trend is that there… Read More
The fabless revolution in the digital semiconductor industry is no more, with just a few integrated device manufacturers (IDMs) remaining on the playing field, it is now the normal way to do business. However, the learning curve for each new process node continues as it always has, with a host of new technical challenges for the … Read More
The industry plans to use 193nm light at the 20nm, 14nm, and 10nm nodes. Amazing, no? There is no magic wand; scientists have been hard at work developing computational lithography techniques that can pull one more rabbit out of the optical lithography hat.
Tortured metaphors aside, the goal for the post-tapeout flow is the same… Read More
FinFETs are hot, carbon nanotubes are cool, and collaboration is the key to continued semiconductor scaling. These were the main messages at the 2013 Common Platform Technology Forum in Santa Clara.
The collaboration message ran through most presenations, like the afternoon talk by Subi Kengeri of GLOBALFOUNDRIES and Joe Sawicki… Read More
Can’t make it to Santa Clara? Join us online!
The detailed 2013 CPTF agenda is now up in preparation for the February 5th event at the Santa Clara Convention Center. This is one of the rare times that you can get a free lunch! Watch this quick video to see what is in store for us this year. Dr. Paul McLellan and I will be there so please… Read More
While the SPIE Advanced Lithography conference is best known for IC manufacturing, computational lithography, mask preparation and other back-end topics, there is also a significant amount of interest in Design for Manufacturing (DFM) at the conference because some litho issues are best (or only) addressed by modifying the… Read More
