LAM Not Yet at Bottom Memory Worsening Down 50%

LAM Not Yet at Bottom Memory Worsening Down 50%
by Robert Maire on 04-24-2023 at 10:00 am

LAM RESEARCH Vantex external chamber lrg 300x300

-Lam reported in line results on reduced expectations
-Guidance disappoints as memory decline continues
-Memory capex down 50% but still sees “further declines”
-Lam ties future to EUV maybe not good idea after ASML report

Lam comes in above grossly already reduced expectations
and misses on guidance

We always … Read More


ASML Wavering- Supports our Concern of Second Leg Down for Semis- False Bottom

ASML Wavering- Supports our Concern of Second Leg Down for Semis- False Bottom
by Robert Maire on 04-21-2023 at 8:00 am

Semiconductor False Bottom

-ASML weakness is evidence of deeper chip down cycle
-When ASML sneezes other chip equip makers catch a cold
-Will backlog last long enough? Will EUV demand hold up?
-“Unthinkable” event, litho cancelations, could shock industry

ASML has in line quarter but alarm bells ring on wavering outlook

ASML reported Euro6.7B… Read More


Can Attenuated Phase-Shift Masks Work For EUV?

Can Attenuated Phase-Shift Masks Work For EUV?
by Fred Chen on 04-18-2023 at 6:00 am

1679926948898

Normalized image log-slope (NILS) is probably the single most essential metric for describing lithographic image quality. It is defined as the slope of the log of intensity, multiplied by the linewidth [1], NILS = d(log I)/dx * w = w/I dI/dx.  Essentially, it gives the % change in width for a given % change in dose. This is particularly… Read More


SPIE Advanced Lithography Conference 2023 – AMAT Sculpta® Announcement

SPIE Advanced Lithography Conference 2023 – AMAT Sculpta® Announcement
by Scotten Jones on 03-13-2023 at 8:00 am

Applied Materials Sculpta Presentation for Media Page 06

The SPIE Advanced Lithography Conference is the semiconductor industries premier conference on lithography. The 2023 conference was held the week of February 27th and at the conference Applied Materials announced their Sculpta® pattern shaping tool. Last week I had an opportunity to interview Steven Sherman the Managing … Read More


Report from SPIE- EUV’s next 15 years- AMAT “Sculpta” braggadocio rollout

Report from SPIE- EUV’s next 15 years- AMAT “Sculpta” braggadocio rollout
by Robert Maire on 03-06-2023 at 10:00 am

EUV DUV Lithography

-We attended the SPIE lithography Conference in San Jose
-No significant news or announcements on EUV
-Focus on 500WPM target and High & Hyper NA rollout
-AMAT overblown Sculpta-Not exactly what its cracked up to be

SPIE Lithography 2023

We have been attending SPIE for many years now and are happy to see a return to pre Covid levels… Read More


Resolution vs. Die Size Tradeoff Due to EUV Pupil Rotation

Resolution vs. Die Size Tradeoff Due to EUV Pupil Rotation
by Fred Chen on 03-02-2023 at 10:00 am

Resolution vs. Die Size Tradeoff Due to EUV Pupil Rotation

The many idiosyncrasies of EUV lithography affect the resolution that can actually be realized. One which still does not get as much attention as it should is the cross-slit pupil rotation [1-3]. This is a fundamental consequence of using rotational symmetry in ring-field optical systems to control aberrations in reflective… Read More


U.S., Japan & Dutch versus China Chips & Memory looks to be in a long downturn

U.S., Japan & Dutch versus China Chips & Memory looks to be in a long downturn
by Robert Maire on 02-01-2023 at 2:00 pm

US Japan China

-US, Japan & Dutch agree to embargo some China chip equip
-Goes beyond just leading edge & will increase negative impact
-China might catch up in decades or invade Taiwan tomorrow
-Why the memory downturn could be longer than expected

Ganging up on China

It appears that the US has put together a coalition of the US, Japan and… Read More


ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn

ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn
by Robert Maire on 01-26-2023 at 10:00 am

Robert Maire Bloomberg

-Demand far exceeds supply & much longer than any downturn
-Full speed ahead-$40B in solid backlog provides great comfort
-ASP increase shows strength- China is non issue
-In a completely different league than other equipment makers

Reports a good beat & Guide

Revenues were Euro6.4B with system sales making up Euro4.7B… Read More


Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects
by Fred Chen on 01-09-2023 at 10:00 am

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Stochastic defects in EUV lithography have been studied over the last few years. For years, the Poisson noise from the low photon density of EUV had been suspected [1,2]. EUV distinguishes itself from DUV lithography with secondary electrons functioning as intermediary agents in generating reactions in the resist. Therefore,… Read More


A Perspective on Semiconductor Manufacturing Initiatives & Strategies

A Perspective on Semiconductor Manufacturing Initiatives & Strategies
by Sagar Pushpala on 10-17-2022 at 10:00 am

A Perspective on Semiconductor Manufacturing Initiatives

My name is Sagar, and I’ve been a long-time executive in the semiconductor manufacturing world — holding key positions at large multi-nationals, a leading semiconductor foundry, and partnering with many of the top-tier foundries and OSATs. Since “retiring”, I’ve also spent time advising and investing in start-ups through Read More