Advanced CMOS Technology 2019 (The 10/7/5 NM Nodes)

Advanced CMOS Technology 2019 (The 10/7/5 NM Nodes)
by Daniel Nenni on 09-12-2019 at 10:00 am

Our friends at Threshold Systems have a new class that may be of interest to you. It’s an updated version of the Advanced CMOS Technology class held last May. As part of the previous class we did a five part series on The Evolution of the Extension Implant which you can see on the Threshold Systems SemiWiki landing page HERE. And… Read More


Lithography For Advanced Packaging Equipment

Lithography For Advanced Packaging Equipment
by Robert Castellano on 06-24-2019 at 10:00 am

Advanced IC packaging, such as fan-out WLP (Wafer Level Packaging) and 2.5D TSV (Through Silicon Via) will drive the packaging equipment market, particularly lithography. This will help specific equipment manufacturers in 2019, since the WFE (Wafer Front End) market will drop 17%. But the Back-End lithography market, led … Read More


Samsung Foundry Update 2019

Samsung Foundry Update 2019
by Tom Dillinger on 06-08-2019 at 5:00 am

Samsung Foundry recently held their 4th annual technology forum in Santa Clara.  This article reviews the highlights of the presentations.  There were two prevalent themes throughout – focused execution on the current process roadmap, and the introduction of the 3nm process node features and schedule.

Before getting into … Read More


Chips are the bleeding edge of China trade war Recovery

Chips are the bleeding edge of China trade war Recovery
by Robert Maire on 05-17-2019 at 7:00 am

Image RemovedLast week we warned of a further down leg due to China trade. We were surprised how quickly our prediction came true as it appears we are now in the midst of giving back all the upside built in to stocks based on a peaceful resolution of the trade conflict which obviously isn’t happening.

Many of the semi stocks we … Read More


SPIE Advanced Lithography Conference – Imec and Veeco on EUV

SPIE Advanced Lithography Conference – Imec and Veeco on EUV
by Scotten Jones on 04-19-2019 at 12:00 pm

At the SPIE Advanced Lithography Conference Imec presented several papers on EUV and Veeco presented about etching for EUV masks. I had the opportunity to see the presentations and speak with some of the authors. In this article I will summarize the key issues around EUV based on this research.

EUV is ramping up into high volume 7nm… Read More


TSMC Q1 2019 Earnings Call Discussion!

TSMC Q1 2019 Earnings Call Discussion!
by Daniel Nenni on 04-19-2019 at 7:00 am

It’s no coincidence that the TSMC Symposium is right after the Q1 earnings call. This will allow TSMC to talk more freely and they certainly will, my opinion. It is a very interesting time in the semiconductor industry and TSMC, being the bellwether, can tell us what will happen the rest of the year and give us some 2020 insights.… Read More


SPIE Advanced Lithography Conference – ASML EUV Update

SPIE Advanced Lithography Conference – ASML EUV Update
by Scotten Jones on 03-23-2019 at 12:00 am

At the SPIE Advanced Lithography Conference ASML gave an update on both the current 0.33NA system and the 0.55 high-NA system development. I saw the presentations and got to sit down with Mike Lercel (Director of Strategic Marketing).… Read More


2018 Semiconductor Year in Review

2018 Semiconductor Year in Review
by Scotten Jones on 01-04-2019 at 12:00 pm

Image RemovedStrong Overall Market Growth but a Slowdown Looms
After six years of single digit percentage growth in the overall semiconductor market, 2017 saw almost 22% growth and 2018 year-to-date is up roughly 17% (based on numbers published by the world semiconductor trade statistics). The big growth driver the last two … Read More


Samsung vs TSMC 7nm Update

Samsung vs TSMC 7nm Update
by Daniel Nenni on 01-02-2019 at 7:00 am

Image RemovedThe semiconductor foundry business has gone through a dynamic transformation over the last 30 years. In the beginning the foundries were several process nodes behind the IDMs with little hope of catching up. Today the foundries are leading the process development race at 10nm – 7nm, and will continue to do … Read More


IEDM 2018 – ASML EUV Update

IEDM 2018 – ASML EUV Update
by Scotten Jones on 12-11-2018 at 7:00 am

At IEDM last week Anthony (Tony) Yen, Vice President and Head, Technology Development Centers Worldwide for ASML presented a paper entitled “EUV Lithography at Threshold of High-Volume Manufacturing” authored by Anthony Yen, Hans Meiling, and Jos Benschop. At IEDM I had a chance to sit down with Tony and discuss the paper and … Read More