ASML is Strong Because TSMC is Hot!

ASML is Strong Because TSMC is Hot!
by Robert Maire on 10-15-2020 at 10:00 am

TSMC ASML EUV 2020
  • ASML has strong quarter lead by great Taiwan and EUV
  • EUV “crossed over” DUV as revenue leader- signaling new era
  • Taiwan doubles, China grows, Korea weaker, US further behind

ASML hits great numbers
ASML reported revenues of Euro 4B, with income of Euro 2.54EPS, both beating estimates handily. Ten EUV systems were … Read More


Highlights of the TSMC Technology Symposium – Part 1

Highlights of the TSMC Technology Symposium – Part 1
by Tom Dillinger on 09-04-2020 at 8:00 am

A72 core high density

Recently, TSMC held their 26th annual Technology Symposium, which was conducted virtually for the first time.  This article is the first of three that attempts to summarize the highlights of the presentations.

This article focuses on the TSMC process technology roadmap, as described by the following executives:

  • Y.J. Mii, SVP,
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Fully Self-Aligned 6-Track and 7-Track Cell Process Integration

Fully Self-Aligned 6-Track and 7-Track Cell Process Integration
by Fred Chen on 08-23-2020 at 6:00 am

Fully Self Aligned 6 Track and 7 Track Cell Process Integration

For the 10nm – 5nm nodes, the leading-edge foundries are designing cells which utilize 6 or 7 metal tracks, entailing a wide metal line for every 4 or 5 minimum width lines, respectively (Figure 1).

Figure 1. Left: a 7-track cell. Right: a 6-track cell.

This is a fundamental vulnerability for lithography, as defocus can change… Read More


SEMICON West – Applied Materials Selective Gap Fill Announcement

SEMICON West – Applied Materials Selective Gap Fill Announcement
by Scotten Jones on 08-17-2020 at 5:00 pm

Applied Materials Selective Gapfill July 2020 Page 02

At SEMICON West, Applied Materials announced a new selective gap fill tool to address the growing resistance issues in interconnect at small dimensions. I had the opportunity to discuss this new tool and the applications for it with Zhebo Chen global product manager in the Metal Deposition Products group at Applied Materials.… Read More


EUV faces Scylla and Charybdis

EUV faces Scylla and Charybdis
by Fred Chen on 08-03-2020 at 6:00 am

EUV faces Scylla and Charybdis

It is now time for the EUV community to realize they are caught between the proverbial Scylla and Charybdis. In Greek mythology, the two monsters terrorized ships that were unlucky enough to pass between them. By avoiding one, you approached the other.

S for Scylla, or Stochastics

Scylla was a former beautiful nymph turned into

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Application-Specific Lithography: a 28 nm Pitch DRAM Active Area

Application-Specific Lithography: a 28 nm Pitch DRAM Active Area
by Fred Chen on 07-19-2020 at 2:00 pm

Application Specific Lithography 28 nm Pitch DRAM Active Area

In the recent DRAM jargon, “1X”, “1Y”, “1Z”, etc. have been used to express all the sub-20 nm process generations. It is almost possible now to match them to real numbers which are roughly the half-pitch of the DRAM active area, such as 1X=18, 1Y ~ 17, etc. At this rate, 14 nm is somewhere around

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ASML More Covid Concerns and Impact

ASML More Covid Concerns and Impact
by Robert Maire on 07-19-2020 at 6:00 am

ASML Covid
  • Covid related Revenue Rec causes rev/EPS miss
  • Sharp order drop reflects H2 industry uncertainty
  • EUV remains solid- Memory/Logic mix is better

Results were in line after correcting Covid Caused Revenue Rec issue-
ASML reported revenues of Euro3.3B and EPS of Euro1.79 as revenues from two EUV systems was not recognized, due to … Read More


Application-Specific Lithography: The 5nm 6-Track Cell

Application-Specific Lithography: The 5nm 6-Track Cell
by Fred Chen on 07-05-2020 at 10:00 am

Application Specific Lithography The 5nm 6 Track Cell

The 5nm foundry (e.g., TSMC) node may see the introduction of 6-track cells (two double-width rails plus four minimum-width dense lines) with a minimum metal pitch in the neighborhood of 30 nm. IMEC had studied a representative case as its ‘7nm’ case [1]. TSMC had some published 5nm test structures which looked like… Read More


The Stochastic Impact of Defocus in EUV Lithography

The Stochastic Impact of Defocus in EUV Lithography
by Fred Chen on 06-28-2020 at 6:00 am

The Stochastic Impact of Defocus in EUV Lithography

The stochastic nature of imaging has received a great deal of attention in the area of EUV lithography. The density of EUV photons reaching the wafer is low enough [1] that the natural variation in the number of photons arriving at a given location can give rise to a relatively large standard deviation.

In recent studies [2,3], it … Read More