I’m at the 2015 imec technology forum (ITF) in Brussels the next few days. One of the presentations today was by Peter Wennink, the CEO of ASML. The thing that most interested me in his presentation is what the status of EUV is today. ASML is the only company developing EUV steppers so what they think is important. On the other … Read More
Tag: euv
Extending EUV Lithography
I have previously written about SPIE day 1 and 2 so I want to wrap up my coverage with some impressions from days 3 and 4. My single biggest take away from the conference is that EUV has made tremendous progress in the last 12 months. Last year the mood of the conference was in my opinion pessimistic with respect to EUV, this year the mood… Read More
Imec Technology Forum
I like to quiz people on which country is the one where the most leading edge research on semiconductors is done. People reflexively answer USA or maybe Taiwan or Japan. Nobody who doesn’t already know the answer would pick Belgium. After all the EU headquarters is there not because Belgium is important but because Belgium… Read More
Life Without EUV: SPIE Day 2
I previously published a summary of day 1 of SPIE and I wanted to follow up with observations from successive days.
SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies.Serving more than 256,000 constituents from approximately 155 countries, the not-for-profit … Read More
EUV Makes Progress and Other Observations From SPIE
The SPIE Advanced Lithography Conference is the world’s premier conference for patterning techniques utilized to manufacture semiconductors. At any given time during the conference there are multiple parallel sessions so it is impossible to see all of the papers presented. Prior to the conference I reviewed and blogged on … Read More
ASML ASyMptotic progress- When will we get to EUV?
- ASML making progress – but is it fast enough?
- ASML has missed 10nm , can it catch 7nm? An economic question
- Day one at SPIE- Better tone than last year but still cautious
1000 simulated wafers versus 700 simulated
At the opening of the SPIE conference ASML announced that TSMC had reached 1000 wafers a day “exposed”… Read More
SPIE Advanced Lithography Preview
Next week is the SPIE Advanced Lithography Conference in San Jose, the premier conference for advanced lithography used to produce state-of-the-art semiconductors. Last year I blogged after the conference about some of the key points I heard at the conference and this year I plan to do the same.
7nm node is arriving, which ones will continue past 2020?
‘Laughing Buddha’ is eternal, but for semiconductor industry, I must say it’s ‘laughing Moore’. Moore made a predictive hypothesis and the whole world is inclined to let that continue, eternally? When we were at 28nm, we weren’t hoping to go beyond 20/22nm; voices like ‘Moore’s law is dead’ started emerging. Today, we are already… Read More
TSMC Bringing EUV Into Production
Last week was ASML’s investor day. I wasn’t there and they haven’t yet got the material posted on their website, so this is all second hand information. As you know, if you have read any of my comments on EUV, I have been dubious about whether EUV would ever work for production.
The three big problems seem to be:
- source
EUV Pellicles
Shakespeare reckoned that a man went through seven stages in his life.All the world’s a stage, And all the men and women merely players. They have their exits and their entrances, And one man in his time plays many parts, His acts being seven ages.
Well, an EUV mask seems to only go through three main stages:
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