Coventor ASML IMEC: The last half nanometer

Coventor ASML IMEC: The last half nanometer
by Scotten Jones on 01-19-2016 at 4:00 pm

On Tuesday evening December 8[SUP]th[/SUP] at IEDM, Coventor held a panel discussion entitled the “The last half nanometer”. Coventor is a leading provider of simulation software used to design processes. This is my third year attending the Coventor panel discussion at IEDM and they are always excellent with very strong panels… Read More


EUV sees further delays?

EUV sees further delays?
by Robert Maire on 10-14-2015 at 12:00 pm

Headwinds which will likely continue into 2016…
ASML reported revenues of 1.55B Euros with EPS of 0.75 Euros more or less in line with expectations. Orders were the weak spot, falling to 904M Euros versus the previous Q2 orders of 1.523B Euros. The company guided Q4 revenues to be down about 10% to 1.4B Euros below current flattish… Read More


EUV – So late to the party it may already be over!

EUV – So late to the party it may already be over!
by Robert Maire on 09-29-2015 at 12:00 pm

Stocks in the semiconductor equipment space continue to fall only this time along with the broad market. We had recently pointed out that LRCX was the last to fall among the large cap companies in the space but now the question becomes when have they fallen enough to say its over, and which stocks have more to fall……

ASMLRead More


EUV: the view from imec

EUV: the view from imec
by Paul McLellan on 06-23-2015 at 7:00 pm

I’m at the 2015 imec technology forum (ITF) in Brussels the next few days. One of the presentations today was by Peter Wennink, the CEO of ASML. The thing that most interested me in his presentation is what the status of EUV is today. ASML is the only company developing EUV steppers so what they think is important. On the other … Read More


Extending EUV Lithography

Extending EUV Lithography
by Scotten Jones on 06-12-2015 at 1:00 pm

I have previously written about SPIE day 1 and 2 so I want to wrap up my coverage with some impressions from days 3 and 4. My single biggest take away from the conference is that EUV has made tremendous progress in the last 12 months. Last year the mood of the conference was in my opinion pessimistic with respect to EUV, this year the mood… Read More


Imec Technology Forum

Imec Technology Forum
by Paul McLellan on 04-23-2015 at 7:00 am

I like to quiz people on which country is the one where the most leading edge research on semiconductors is done. People reflexively answer USA or maybe Taiwan or Japan. Nobody who doesn’t already know the answer would pick Belgium. After all the EU headquarters is there not because Belgium is important but because Belgium… Read More


Life Without EUV: SPIE Day 2

Life Without EUV: SPIE Day 2
by Scotten Jones on 03-29-2015 at 11:00 pm

I previously published a summary of day 1 of SPIE and I wanted to follow up with observations from successive days.

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies.Serving more than 256,000 constituents from approximately 155 countries, the not-for-profit Read More


EUV Makes Progress and Other Observations From SPIE

EUV Makes Progress and Other Observations From SPIE
by Scotten Jones on 02-26-2015 at 1:00 pm

The SPIE Advanced Lithography Conference is the world’s premier conference for patterning techniques utilized to manufacture semiconductors. At any given time during the conference there are multiple parallel sessions so it is impossible to see all of the papers presented. Prior to the conference I reviewed and blogged on … Read More


ASML ASyMptotic progress- When will we get to EUV?

ASML ASyMptotic progress- When will we get to EUV?
by Robert Maire on 02-24-2015 at 5:30 pm

  • ASML making progress – but is it fast enough?
  • ASML has missed 10nm , can it catch 7nm? An economic question
  • Day one at SPIE- Better tone than last year but still cautious

1000 simulated wafers versus 700 simulated
At the opening of the SPIE conference ASML announced that TSMC had reached 1000 wafers a day “exposed”
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SPIE Advanced Lithography Preview

SPIE Advanced Lithography Preview
by Scotten Jones on 02-20-2015 at 1:00 pm

Next week is the SPIE Advanced Lithography Conference in San Jose, the premier conference for advanced lithography used to produce state-of-the-art semiconductors. Last year I blogged after the conference about some of the key points I heard at the conference and this year I plan to do the same.

Last year’s blog is available HERERead More