Stochastic Model for Acid Diffusion in DUV Chemically Amplified Resists

Stochastic Model for Acid Diffusion in DUV Chemically Amplified Resists
by Fred Chen on 09-11-2023 at 8:00 am

Stochastic Model for Acid Diffusion in DUV Chemically Amplified Resists 1

Recent articles have focused much effort on studying the stochastic behavior of secondary electron exposure of EUV resists [1-4]. Here, we consider the implications of extending similar treatments to DUV lithography.

Basic Model Setup

As before, the model uses pixel-by-pixel calculations of absorbed photon dose, followed… Read More


ASML-Strong Results & Guide Prove China Concerns Overblown-Chips Slow to Recover

ASML-Strong Results & Guide Prove China Concerns Overblown-Chips Slow to Recover
by Robert Maire on 07-21-2023 at 8:00 am

ASML 2023 Results

-ASML reports better results & guide despite China restrictions
-Supports our view of China issues not that impactful longer term
-Industry recovery seems very far off with more delays
-ASML remains the best, most robust story in a weak industry

ASML reports nice beat despite China concerns

ASML reported revenues of Euro6.9B… Read More


AMAT- Trailing Edge & China Almost Offset Floundering Foundry & Missing Memory

AMAT- Trailing Edge & China Almost Offset Floundering Foundry & Missing Memory
by Robert Maire on 05-22-2023 at 8:00 am

Amat China

-AMAT reported inline resulted helped by trailing edge & China
-Memory remains at very low levels- Foundry remains uninspiring
-China seems to be buying anything they are allowed to buy
-The recovery is too far out & unknown to handicap

Quarter was OK and Guidance also OK

Revenue was $6.63B and EPS of $1.86 versus reduced… Read More


Curvilinear Mask Patterning for Maximizing Lithography Capability

Curvilinear Mask Patterning for Maximizing Lithography Capability
by Fred Chen on 05-09-2023 at 10:00 am

Curvilinear 1

Masks have always been an essential part of the lithography process in the semiconductor industry. With the smallest printed features already being subwavelength for both DUV and EUV cases at the bleeding edge, mask patterns play a more crucial role than ever. Moreover, in the case of EUV lithography, throughput is a concern, … Read More


ASML Wavering- Supports our Concern of Second Leg Down for Semis- False Bottom

ASML Wavering- Supports our Concern of Second Leg Down for Semis- False Bottom
by Robert Maire on 04-21-2023 at 8:00 am

Semiconductor False Bottom

-ASML weakness is evidence of deeper chip down cycle
-When ASML sneezes other chip equip makers catch a cold
-Will backlog last long enough? Will EUV demand hold up?
-“Unthinkable” event, litho cancelations, could shock industry

ASML has in line quarter but alarm bells ring on wavering outlook

ASML reported Euro6.7B… Read More


ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn

ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn
by Robert Maire on 01-26-2023 at 10:00 am

Robert Maire Bloomberg

-Demand far exceeds supply & much longer than any downturn
-Full speed ahead-$40B in solid backlog provides great comfort
-ASP increase shows strength- China is non issue
-In a completely different league than other equipment makers

Reports a good beat & Guide

Revenues were Euro6.4B with system sales making up Euro4.7B… Read More


Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects
by Fred Chen on 01-09-2023 at 10:00 am

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Stochastic defects in EUV lithography have been studied over the last few years. For years, the Poisson noise from the low photon density of EUV had been suspected [1,2]. EUV distinguishes itself from DUV lithography with secondary electrons functioning as intermediary agents in generating reactions in the resist. Therefore,… Read More


ASML- US Seeks to Halt DUV China Sales

ASML- US Seeks to Halt DUV China Sales
by Robert Maire on 07-10-2022 at 6:00 am

China Semiocnductor Ban DUV EUV

-If you can’t beat them, embargo them
-It has been reported US wants ASML to halt China DUV tools
-US obviously wants to kill, not just wound China chip biz
-Is this embargo the alternative to failed CHIPS act?
-Hard to say “do as I say, not as I do”- but US does anyway

First EUV ban now DUV ban? Are process & yieldRead More


DUV, EUV now PUV Next gen Litho and Materials Shortages worsen supply chain

DUV, EUV now PUV Next gen Litho and Materials Shortages worsen supply chain
by Robert Maire on 04-01-2022 at 8:00 am

EUV DUV Lithography

-New PUV light source will push litho into Angstrom Era
-Rare earth elements shortages add to supply chain woes
-Could strategic wafer reserve releases lower memory pricing
-Can we cut off/turn off Russian access to chip equipment?

DUV, EUV and now “PUV” to become next generation lithography

Lithography is the locomotive… Read More


Blur, not Wavelength, Determines Resolution at Advanced Nodes

Blur, not Wavelength, Determines Resolution at Advanced Nodes
by Fred Chen on 10-05-2021 at 10:00 am

Blur not Wavelength Determines Resolution at Advanced Nodes

Lithography has been the driving force for shrinking feature sizes for decades, and the most easily identified factor behind this trend is the reduction of wavelength. G-line (436 nm wavelength) was used for 0.5 um in the late 1980s [1], and I-line (365 nm wavelength) was used down to 0.3 um in the 1990s [2]. Then began the era of deep-ultraviolet… Read More