Low Energy Electrons Set the Limits for EUV Lithography

Low Energy Electrons Set the Limits for EUV Lithography
by Fred Chen on 03-25-2020 at 6:00 am

Low Energy Electrons Set the Limits for EUV Lithography

EUV lithography is widely perceived to be the obvious choice to replace DUV lithography due to the shorter wavelength(s) used. However, there’s a devil in the details, or a catch if you will.

Electrons have the last word
The resist exposure is completed by the release of electrons following the absorption of the EUV photon.… Read More


Changes Coming at the Top in Semiconductor Equipment Ranking

Changes Coming at the Top in Semiconductor Equipment Ranking
by Robert Castellano on 12-10-2018 at 12:00 pm

Semiconductor equipment vendor ranking, which didn’t change much between 2016 and 2017, is undergoing a makeover, as Lam Research, ASML, and Tokyo Electron (TEL) are switching places and top-ranked Applied Materials is getting closer to losing its number one ranking.

Since the 1990s, Applied Materials has been the market leader… Read More


SEMICON West – Leading Edge Lithography and EUV

SEMICON West – Leading Edge Lithography and EUV
by Scotten Jones on 08-13-2018 at 7:00 am

At SEMICON West I attended the imec technology forum, multiple Tech Spot presentations and conducted a number of interviews relevant to advanced lithography and EUV. In this article I will summarize what I learned plus make some comments on the outlook for EUV.… Read More