ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn

ASML – Powering through weakness – Almost untouchable – Lead times exceed downturn
by Robert Maire on 01-26-2023 at 10:00 am

Robert Maire Bloomberg

-Demand far exceeds supply & much longer than any downturn
-Full speed ahead-$40B in solid backlog provides great comfort
-ASP increase shows strength- China is non issue
-In a completely different league than other equipment makers

Reports a good beat & Guide

Revenues were Euro6.4B with system sales making up Euro4.7B… Read More


Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects
by Fred Chen on 01-09-2023 at 10:00 am

Secondary Electron Blur Randomness as the Origin of EUV Stochastic Defects

Stochastic defects in EUV lithography have been studied over the last few years. For years, the Poisson noise from the low photon density of EUV had been suspected [1,2]. EUV distinguishes itself from DUV lithography with secondary electrons functioning as intermediary agents in generating reactions in the resist. Therefore,… Read More


ASML- US Seeks to Halt DUV China Sales

ASML- US Seeks to Halt DUV China Sales
by Robert Maire on 07-10-2022 at 6:00 am

China Semiocnductor Ban DUV EUV

-If you can’t beat them, embargo them
-It has been reported US wants ASML to halt China DUV tools
-US obviously wants to kill, not just wound China chip biz
-Is this embargo the alternative to failed CHIPS act?
-Hard to say “do as I say, not as I do”- but US does anyway

First EUV ban now DUV ban? Are process & yieldRead More


DUV, EUV now PUV Next gen Litho and Materials Shortages worsen supply chain

DUV, EUV now PUV Next gen Litho and Materials Shortages worsen supply chain
by Robert Maire on 04-01-2022 at 8:00 am

EUV DUV Lithography

-New PUV light source will push litho into Angstrom Era
-Rare earth elements shortages add to supply chain woes
-Could strategic wafer reserve releases lower memory pricing
-Can we cut off/turn off Russian access to chip equipment?

DUV, EUV and now “PUV” to become next generation lithography

Lithography is the locomotive… Read More


Blur, not Wavelength, Determines Resolution at Advanced Nodes

Blur, not Wavelength, Determines Resolution at Advanced Nodes
by Fred Chen on 10-05-2021 at 10:00 am

Blur not Wavelength Determines Resolution at Advanced Nodes

Lithography has been the driving force for shrinking feature sizes for decades, and the most easily identified factor behind this trend is the reduction of wavelength. G-line (436 nm wavelength) was used for 0.5 um in the late 1980s [1], and I-line (365 nm wavelength) was used down to 0.3 um in the 1990s [2]. Then began the era of deep-ultraviolet… Read More


ASML- A Semiconductor Market Leader-Strong Demand Across all Products/Markets

ASML- A Semiconductor Market Leader-Strong Demand Across all Products/Markets
by Robert Maire on 07-25-2021 at 6:00 am

asml logo 20120410 1

– Strong demand across logic/memory & leading/trailing edge
– Customers want units fast-no time to test
– The main question is can ASML ramp to meet demand?

Revenue & Earnings low due to systems being rushed to customers
ASML reported Euro 4B in sales and Euro 1B in net income which while within guidance… Read More


Stochastic Origins of EUV Feature Edge Roughness

Stochastic Origins of EUV Feature Edge Roughness
by Fred Chen on 07-11-2021 at 10:00 am

Stochastic Origins of EUV Feature Edge Roughness

Due to the higher energy of EUV (13.3-13.7 nm wavelength) compared to ArF (193 nm wavelength) light, images produced by EUV are more susceptible to photon shot noise.

Figure 1. (Left) 40 nm dense (half-pitch) line image projected onto wafer at 35 mJ/cm2; (Right) 20 nm dense (half-pitch) line image projected onto wafer at 70 mJ/cm2.Read More


Contrast Reduction vs. Photon Noise in EUV Lithography

Contrast Reduction vs. Photon Noise in EUV Lithography
by Fred Chen on 05-30-2021 at 6:00 am

Contrast Reduction vs. Photon Noise in EUV Lithography

The stochastic behavior of images formed in EUV lithography has already been highlighted by a number of authors [1-3]. How serious it appears depends on the pixel size with which the photons are bunched. Generally, though, for features of around 20 nm or less, even 1 nm can have at least a +/- 15% gradient across it, which is still a

Read More

SPIE 2021 – ASML DUV and EUV Updates

SPIE 2021 – ASML DUV and EUV Updates
by Scotten Jones on 03-17-2021 at 10:00 am

SPIE DUV 2021 ASML NXT4 DryWet Presentation final noWPD2 Page 42

At the SPIE Advanced Lithography Conference held in February, ASML presented the latest information on their Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) exposure systems. I recently got to interview Mike Lercel of ASML to discuss the presentations.

DUV

Despite all the attention EUV is getting, most layers are still… Read More


ASML – Strong DUV Throwback While EUV Slows- Logic Dominates Memory

ASML – Strong DUV Throwback While EUV Slows- Logic Dominates Memory
by Robert Maire on 01-24-2021 at 6:00 am

ASML SMIC TSMC EUV DUV

ASML has good quarter driven by DUV & Logic (@72%)
– SMIC & other major customer slow EUV plans
– Logic (read that as TSMC) remains key demand led driver
– We are happy memory remains muted given cyclical potential

A very solid quarter with a continued road to growth
The quarter came in at Euro4,254B… Read More