SEMICON West 2019 – Day 1 – Imec

SEMICON West 2019 – Day 1 – Imec
by Scotten Jones on 07-15-2019 at 10:00 am

On Monday, July 8th Imec held a technology forum ahead of Semicon West. I saw the papers presented and interviewed three of the authors. The following is a summary of what I feel are the keys points of their research.

Arnaud Furnemont
Arnaud Furnemont’s talk was titled “From Technology Scaling to System Optimization”. Simple 2D … Read More


SPIE Advanced Lithography Conference – Imec and Veeco on EUV

SPIE Advanced Lithography Conference – Imec and Veeco on EUV
by Scotten Jones on 04-19-2019 at 12:00 pm

At the SPIE Advanced Lithography Conference Imec presented several papers on EUV and Veeco presented about etching for EUV masks. I had the opportunity to see the presentations and speak with some of the authors. In this article I will summarize the key issues around EUV based on this research.

EUV is ramping up into high volume 7nm… Read More


SPIE Advanced Lithography Conference – ASML EUV Update

SPIE Advanced Lithography Conference – ASML EUV Update
by Scotten Jones on 03-23-2019 at 12:00 am

At the SPIE Advanced Lithography Conference ASML gave an update on both the current 0.33NA system and the 0.55 high-NA system development. I saw the presentations and got to sit down with Mike Lercel (Director of Strategic Marketing).… Read More


LithoVision 2019 – Semiconductor Technology Trends and their impact on Lithography

LithoVision 2019 – Semiconductor Technology Trends and their impact on Lithography
by Scotten Jones on 03-01-2019 at 12:00 pm

I was asked to present at Nikon’s LithoVision event again this year. LithoVision is held the day before the SPIE Advanced Lithography Conference also in San Jose. The following is a write up of my talk.… Read More


SEMICON West – Leading Edge Lithography and EUV

SEMICON West – Leading Edge Lithography and EUV
by Scotten Jones on 08-13-2018 at 7:00 am

At SEMICON West I attended the imec technology forum, multiple Tech Spot presentations and conducted a number of interviews relevant to advanced lithography and EUV. In this article I will summarize what I learned plus make some comments on the outlook for EUV.… Read More


VLSIT Conference – imec on CFETs

VLSIT Conference – imec on CFETs
by Scotten Jones on 07-16-2018 at 12:00 pm

The 2018 VLSI Technology conference was held in Hawaii in June and is one of the premier conferences covering integrated circuit process technology and circuit design. The Complementary FET (CFET) is an emerging option to continue logic scaling into the next decade. At the conference imec, GLOBALFOUNDRIES, Tokyo Electron and… Read More


7nm, 5nm and 3nm Logic, current and projected processes

7nm, 5nm and 3nm Logic, current and projected processes
by Scotten Jones on 06-25-2018 at 7:00 am

There has been a lot of new information available about the leading-edge logic processes lately. Papers from IEDM in December 2017, VLSIT this month, the TSMC and Samsung Foundry forums, etc. have all filled in a lot of information. In this article I will summarize what is currently known.… Read More


IEDM 2017 – Leti Gate-All-Around Stacked-Nanowires

IEDM 2017 – Leti Gate-All-Around Stacked-Nanowires
by Scotten Jones on 02-12-2018 at 12:00 pm

At IEDM in December I had a chance to interview Thomas Ernst about the paper “Performance and Design Considerations for Gate-All-around Stacked-NanoWires FETs” by Leti and STMicroelectonics.

Leti published the first stacked nanowire in 2006, it was very new then, now stacked nanowire/nanosheets are starting… Read More


IEDM 2017 – imec Charting the Future of Logic

IEDM 2017 – imec Charting the Future of Logic
by Scotten Jones on 01-04-2018 at 12:00 pm

At the IEDM 2017, imec held an imec technology forum and presented several papers, I also had the opportunity to interview Anda Mocuta director of technology solutions and enablement. In this article I will summarize the keys points of what I learned about the future of logic. I will follow this up with a later article covering memory.… Read More