The Chronicle of TSMC CoWoS

The Chronicle of TSMC CoWoS
by Daniel Nenni on 01-28-2026 at 10:00 am

Chronical of CoWoS

As semiconductor scaling slowed and system performance became increasingly constrained by data movement rather than raw compute, advanced packaging emerged as a decisive lever. Among these technologies, TSMC’s CoWoS (Chip-on-Wafer-on-Substrate) represents a turning point in how high-performance systems are architected, manufactured, and scaled. Its evolution mirrors the industry’s shift from transistor-centric progress to system-level optimization.

At its core, CoWoS is a 2.5D integration technology. Logic dies and memory stacks are placed side by side on a silicon interposer, which is then mounted onto an organic substrate. The silicon interposer enables wiring densities far beyond what organic substrates can support, with metal line pitches in the low single-digit microns. Through-silicon vias pass signals and power vertically through the interposer, connecting it to the package substrate below.

The technical motivation for CoWoS was bandwidth density. Traditional off-package memory interfaces, such as DDR, rely on relatively long traces and limited I/O counts, resulting in high power consumption and latency. In contrast, CoWoS allows logic dies to interface with HBM stacks using thousands of parallel connections. Modern CoWoS implementations support memory bandwidth exceeding 3–5 TB/s per package, with energy efficiency measured in a few picojoules per bit, orders of magnitude better than conventional memory systems.

Early CoWoS deployments paired a single large logic die with two to four HBM stacks. Over time, the technology scaled aggressively. Interposer sizes expanded beyond 800–900 mm², pushing reticle and yield limits. Advanced packages now routinely integrate six to eight HBM stacks, each consisting of 8–12 DRAM dies bonded using TSVs and microbumps. Signal integrity across these short interposer traces allows operation at several gigabits per second per pin with minimal equalization overhead.

Manufacturing CoWoS is fundamentally different from traditional back-end packaging. Interposer fabrication resembles front-end wafer processing, using silicon wafers with multiple redistribution layers. TSV formation, wafer thinning, and precise die placement introduce yield sensitivities not seen in simpler packages. Assembly tolerances are tight: microbump pitches around 40 µm (and shrinking) require sub-micron alignment accuracy. Thermal management is equally critical, as large logic dies and dense memory stacks generate heat in close proximity.

As demand grew, CoWoS evolved beyond its original role as a memory enabler. The rise of chiplet-based architectures turned the interposer into a system fabric. Multiple logic dies, compute tiles, I/O dies, accelerators, could be interconnected with wide, low-latency links. This enabled designers to overcome reticle size limits while improving yield and design flexibility. CoWoS became a platform for heterogeneous integration rather than a single-purpose solution.

The AI acceleration boom of the 2020s elevated CoWoS from a niche capability to a strategic bottleneck. Training large neural networks requires massive parallel compute tightly coupled to enormous memory bandwidth. In many leading accelerators, performance scaling is limited less by transistor count than by HBM availability and interposer capacity. As a result, CoWoS production capacity became as strategically important as advanced logic nodes, with packaging throughput directly constraining system shipments.

Technically, CoWoS continues to push boundaries. Interposer routing layers have increased, power delivery networks have been reinforced to handle hundreds of watts per package, and mechanical designs have improved to manage warpage and stress. Variants have emerged to balance cost and performance, while coexistence with newer technologies such as hybrid bonding and 3D stacking is shaping next-generation systems.

Bottom Line: The chronicle of CoWoS is ultimately the story of how packaging became architecture. It demonstrated that performance, power efficiency, and scalability increasingly depend on microns of interconnect and millimeters of proximity. In an era where monolithic scaling alone can no longer carry progress, CoWoS stands as a defining example of how integration, not just miniaturization, drives the future of computing.

CONTACT TSMC

Also Read:

TSMC’s CoWoS® Sustainability Drive: Turning Waste into Wealth

TSMC’s 6th ESG AWARD Receives over 5,800 Proposals, Igniting Sustainability Passion

TSMC based 3D Chips: Socionext Achieves Two Successful Tape-Outs in Just Seven Months!


TSMC’s CoWoS® Sustainability Drive: Turning Waste into Wealth

TSMC’s CoWoS® Sustainability Drive: Turning Waste into Wealth
by Daniel Nenni on 01-25-2026 at 12:00 pm

TSMC's CoWoS® Sustainability

In a significant example of how high-tech manufacturing can embrace environmental stewardship without compromising operational excellence, Taiwan Semiconductor Manufacturing Company has launched a sustainability initiative within its advanced packaging operations that both reduces waste and generates meaningful economic value. This drive, centered on TSMC’s CoWoS® (Chip on Wafer on Substrate) advanced packaging technology, demonstrates how innovation in recycling and circular practices can transform manufacturing byproducts into valuable resources resulting in annual green benefits of approximately NT$700+ million ($22M+ USD), alongside substantial carbon reduction.

At the heart of this sustainability effort is the repurposing of scrap or “waste” wafers, silicon discs produced and later deemed unsuitable during front-end production. Traditionally, such wafers are discarded once they fail to meet performance or quality specs. However, these silicon substrates still contain high-grade material and structural integrity valuable for secondary uses. Recognizing this, TSMC’s Materials Supply Chain Management Organization, in collaboration with its Advanced Packaging Technical Board and external suppliers, developed a specialized processing technology that turns scrap wafers into dummy dies, components essential in the CoWoS packaging process to maintain structural stability.

Dummy Dies and CoWoS®

To understand the significance of this initiative, one must appreciate the role of dummy dies in advanced semiconductor packaging. In CoWoS® technology, multiple active chips are stacked and integrated onto an interposer and substrate to create powerful multi-chip modules for high-performance computing, AI accelerators, and networking devices. During this process, dummy dies are inserted to fill space, balance mechanical stress, and maintain uniform thermal and electrical profiles. These are typically cut from brand-new wafers, which makes them a non-trivial fraction of packaging consumption—especially as demand for CoWoS® scales with burgeoning markets like AI, cloud computing, and advanced graphics.

Instead of using all new wafers to produce these dummy dies, TSMC’s cross-functional team developed a rigorous recycling methodology for scrap wafers. This involves selection, grinding, cleaning, and precision inspection to ensure recycled wafers meet the same strict quality requirements as newly sourced material. After processing, these recycled wafers are cut into dummy dies that are functionally and structurally suitable for CoWoS® assembly. This innovation not only salvages silicon that would otherwise go to waste, but also significantly shifts material sourcing dynamics toward sustainability.

Economic, Environmental, and Operational Impact

Early reports on the initiative’s outcomes have been compelling. As of late 2025, recycled wafers re-manufactured into dummy dies have been deployed across multiple advanced backend facilities, including Advanced Backend Fab 3, Fab 5, and Fab 6. The result is an estimated reduction of 10,205 metric tons of carbon emissions annually, underscoring a meaningful contribution toward TSMC’s broader climate goals. On the financial front, TSMC anticipates that this reuse of scrap wafers will generate a green benefit amounting to NT$746 million per year surpassing the NT$700 million mark cited in sustainability narratives.

This initiative exemplifies a practical circular economy model within semiconductor manufacturing: instead of viewing scrap material as waste to be disposed of at environmental cost, it becomes a resource to be refined and reintegrated into production. Beyond direct savings and emissions reductions, there are supply-chain ripple effects that encourage vendors and partners to invest in recycling technologies, improve material lifecycle tracking, and innovate in waste valorization.

TSMC’s approach aligns with its broader Environmental, Social, and Governance (ESG) strategy, which emphasizes resource circularity, energy efficiency, and environmental protection across its global operations. The company has consistently integrated sustainable practices—such as waste recycling programs and comprehensive environmental management—into its long-term operational blueprint.

Looking Forward

Looking ahead, TSMC plans to further expand the scope of recycled wafer use across different packaging technologies and processes, potentially including InFO (Integrated Fan-Out) packaging and beyond. By continually optimizing these techniques and extending collaboration across its supply chain, the company seeks to maximize resource efficiency while maintaining the highest product quality standards, a hallmark of its global leadership in semiconductor manufacturing.

Bottom line: TSMC’s CoWoS® sustainability drive encapsulates how bold environmental action and industrial innovation can work hand-in-hand, turning what was once waste into wealth economically and ecologically alike.

Also Read:

TSMC’s 6th ESG AWARD Receives over 5,800 Proposals, Igniting Sustainability Passion

TSMC based 3D Chips: Socionext Achieves Two Successful Tape-Outs in Just Seven Months!

Why TSMC is Known as the Trusted Foundry


Addressing Silent Data Corruption (SDC) with In-System Embedded Deterministic Testing

Addressing Silent Data Corruption (SDC) with In-System Embedded Deterministic Testing
by Daniel Nenni on 01-01-2026 at 10:00 am

Siemens Broadcom TSMC OIP2025 SemiWiki

Silent Data Corruption (SDC) represents a critical challenge in modern semiconductor design, particularly in high-performance computing environments like AI data centers. As highlighted in a collaborative presentation by Broadcom Inc. and Siemens EDA at the 2025 TSMC OIP event, SDC occurs when hardware defects cause erroneous computations without triggering detectable errors, leading to subtle yet devastating failures. In one customer experiment involving a 54-day training run on 16,384 GPUs, 419 unexpected interruptions were reported, with 6 attributed directly to SDC. Though rare, accounting for about 1.4% of fails, these incidents can disrupt mission-critical operations, such as AI model training, where reliability is paramount.

The presentation underscores the industry-wide nature of SDC, driven by shrinking process nodes and increasing chip complexity. Defects that evade manufacturing tests may manifest in-field due to aging, voltage fluctuations, or thermal stress. Traditional testing methods fall short here, as they require device removal for diagnostics, which is impractical in deployed systems. To combat this, the teams advocate for in-system testing capabilities that allow periodic checks without downtime. Running ATPG patterns directly in the field detects latent defects that could precipitate SDC, ensuring system integrity. For AI applications, this means integrating test suites that can be executed routinely, preventing costly interruptions. Moreover, new patterns tailored to SDC can be deployed remotely, extending device lifespan without physical intervention.

Siemens’ In-System Test (IST) solution emerges as a key enabler. Built on the Streaming Scan Network (SSN), IST interfaces with embedded deterministic test (EDT) structures to deliver ATPG patterns efficiently. The IST controller drives the SSN’s parallel interface, supporting high-bandwidth data transfer via protocols like APB or AXI. In Broadcom’s implementation, IST was adapted for an EDT-based design with a Streaming Scan Host at the chip level. The controller resides at the top level, loading patterns into local SRAM via an on-chip CPU. Block-level EDT patterns, originally for production testing, are retargeted to IST inputs, allowing selective testing of targeted blocks while maintaining functional operation elsewhere.

Implementation brought several design challenges to the fore. Functional isolation is paramount: “functional” blocks (e.g., CPU subsystems) must remain active to load and execute IST operations, while “targeted” blocks switch to scan mode for testing. This requires isolating scan inputs to prevent interference. All functional block inputs that could disrupt IST, such as interrupts or AXI signals, must be held in a “quiet” state. Outputs from targeted blocks, which toggle during capture, are gated to avoid propagating noise. Broadcom addressed this by inserting isolation blocks and enabling Test Data Registers for control.

Clock splitting posed another hurdle. Broadcom’s methodology places On-Chip Clock controllers (OCC) at the chip top due to custom clocking. Functional blocks need free-running clocks, but targeted ones require OCC activation for scan shifts. Solutions included branching pre-OCC clocks for functional paths or adding secondary OCCs for targeted branches, ensuring synchronized yet independent clock domains.

Verification and Static Timing Analysis added complexity. Typically, STA modes separate functional and Design-for-Test (DFT) paths, but IST demands a hybrid “merged” mode where some blocks are functional and others in DFT. The Siemens tool provides verification collaterals like transaction files, C code, and SystemVerilog tasks for Design Verification (DV) environments. Testing occurs on post-DFT netlists, incorporating boot sequences, which extends runtime. Close collaboration between DV and DFT teams was essential for deliverables and debugging handshakes.

Results from the APB-based IST implementation demonstrate feasibility. With a 32-bit wide subordinate interface and SSN data bus, hardware overhead was modest: the IST Controller (ISTC) added 200 flops and 5,000 normalized combinational logic units, while SSH contributed 1,000 flops and 30,000 units. Five intest modes were run for 2,500 patterns, using 2 MB on-chip SRAM (about 0.5 million 32-bit words). Pattern storage ranged from 165,000 to 260,000 words per mode, with counts of 22-35 patterns. Overall, ~1.9 million 32-bit words were managed, with 4 loads per mode, showcasing efficient compression and bandwidth utilization.

Bottom line: The collaboration between Broadcom and Siemens highlights IST’s role in mitigating SDC through in-field testing. Despite challenges in isolation, clocking, and verification, the solution was successfully implemented and verified in DFT and DV setups. Future efforts will extend to AXI-based IST, promising broader adoption. This approach not only enhances reliability in AI and hyperscale environments but also reduces field failures, underscoring the value of embedded deterministic testing in next-generation silicon.

Also Read:

Podcast EP323: How to Address the Challenges of 3DIC Design with John Ferguson

3D ESD verification: Tackling new challenges in advanced IC design

Signal Integrity Verification Using SPICE and IBIS-AMI


TSMC’s 6th ESG AWARD Receives over 5,800 Proposals, Igniting Sustainability Passion

TSMC’s 6th ESG AWARD Receives over 5,800 Proposals, Igniting Sustainability Passion
by Daniel Nenni on 01-01-2026 at 6:00 am

TSMC ESG Award Ceremony 2025

Taiwan Semiconductor Manufacturing Company has once again demonstrated its leadership in corporate sustainability with the successful conclusion of its 6th ESG AWARD, which attracted more than 5,800 proposals from employees across the organization. The overwhelming response reflects not only TSMC’s strong internal engagement but also the growing momentum of environmental, social, and governance (ESG) values within the global semiconductor industry.

Launched as a platform to encourage employee participation in sustainable innovation, the ESG AWARD has become one of TSMC’s most influential internal initiatives. The sixth edition recorded a significant increase in submissions compared to previous years, highlighting how sustainability has evolved from a corporate objective into a shared mission embraced by employees at all levels. Proposals covered a wide range of topics, including energy efficiency, carbon reduction, water resource management, waste minimization, supply chain responsibility, workplace well-being, and community engagement.

TSMC emphasized that the award is not merely a competition, but a catalyst for turning ideas into action. Many past award-winning proposals have been successfully implemented across fabs and offices, delivering measurable environmental and social benefits. These include innovations in energy-saving manufacturing processes, circular economy practices for materials reuse, and digital solutions to enhance operational transparency and governance. By empowering employees to contribute ideas directly linked to real-world impact, TSMC reinforces a culture where sustainability is embedded into daily operations.

The strong participation in the 6th ESG AWARD also reflects the broader pressures and responsibilities facing semiconductor manufacturers today. As demand for advanced chips grows alongside global digital transformation, the industry’s environmental footprint has come under increasing scrutiny. High energy consumption, water usage, and complex supply chains pose challenges that require both technological innovation and organizational commitment. TSMC’s approach demonstrates how internal engagement can play a crucial role in addressing these challenges proactively.

According to TSMC, proposals submitted this year showed greater maturity and cross-functional collaboration than in previous editions. Many teams combined technical expertise with ESG thinking, proposing solutions that balance productivity, cost efficiency, and sustainability. This shift suggests that ESG considerations are no longer treated as separate from core business goals, but rather as integral to long-term competitiveness and resilience.
The award process includes rigorous evaluation criteria, focusing on innovation, feasibility, scalability, and alignment with TSMC’s sustainability strategy. Selected proposals receive recognition and resources to support further development and implementation. This mechanism not only motivates employees but also accelerates the company’s progress toward its ESG targets, including net-zero ambitions and responsible supply chain management.

Beyond internal impact, the ESG AWARD sends a strong signal to stakeholders, including customers, investors, and partners. It highlights TSMC’s commitment to transparency, accountability, and continuous improvement in ESG performance. In an era where ESG metrics increasingly influence investment decisions and customer trust, such initiatives strengthen TSMC’s reputation as a responsible industry leader.

The enthusiasm generated by the 6th ESG AWARD underscores a key lesson for global corporations: sustainability thrives when employees are empowered to participate meaningfully.

Bottom Line: By transforming ESG from a top-down directive into a bottom-up movement, TSMC has ignited a passion that extends beyond awards and recognition. As the company looks ahead, the ideas and energy unleashed by this year’s record-breaking participation are expected to play a vital role in shaping a more sustainable future for both TSMC and the semiconductor industry as a whole.

Also Read:

TSMC based 3D Chips: Socionext Achieves Two Successful Tape-Outs in Just Seven Months!

Why TSMC is Known as the Trusted Foundry

TSMC’s Customized Technical Documentation Platform Enhances Customer Experience


TSMC based 3D Chips: Socionext Achieves Two Successful Tape-Outs in Just Seven Months!

TSMC based 3D Chips: Socionext Achieves Two Successful Tape-Outs in Just Seven Months!
by Daniel Nenni on 12-31-2025 at 6:00 am

Synopsys Socionext 3d IC

Socionext’s recent run of rapid 3D-IC tape-outs is a noteworthy milestone for the industry with two successful tape-outs in just seven months for complex, multi-die designs aimed at AI and HPC workloads. That pace of iteration highlights how advanced packaging, richer EDA toolchains, and closer foundry-ecosystem collaboration are turning what used to be multi-year projects into achievable, repeatable engineering cycles.

At the heart of this acceleration are three interlocking trends: face-to-face 3D stacking that shrinks inter-die latency, process-node specialization across dies (e.g., TSMC N3 compute plus TSMC N5 I/O), and EDA/IP/cloud toolchains purpose-built for multi-die flows. Socionext’s taped-out designs reportedly combine an N3 compute die with an N5 I/O die using TSMC’s SoIC-X 3D stacking, a configuration that reduces interconnect distance and power while increasing bandwidth versus traditional 2D or 2.5D approaches.

Speeding a 3D-IC from concept to tape-out requires more than just clever floorplanning. Mechanical and thermal challenges (warpage, delamination, and heat removal), stringent reliability checks, and new timing/IR signoff flows make multi-die design complex. Socionext’s achievement illustrates how tightly integrated IP (PHYs, SerDes), 3D-aware design rules, and cloud-enabled EDA can remove bottlenecks: by automating design-rule checks for stacked interfaces, enabling distributed compute for large signoff runs, and providing pre-verified IP blocks that support high-speed interconnects. The company itself and partners emphasize that combining proven IP with AI-augmented EDA flows shortened development cycles and improved first-pass quality.

From a product perspective, 3D stacking supports an attractive value proposition for AI and HPC: put logic where it matters, optimize each die on the best process node for that function, and connect them with ultra-dense interfaces to reach system-level PPA (power, performance, area) that 2D designs cannot match. For vendors like Socionext — which target consumer SoCs as well as data-center accelerators — the ability to deliver working 3D-ICs rapidly opens new architectural options (heterogeneous dies, separable I/O fabrics, and modular chiplet ecosystems). Recent Socionext materials also show the company expanding 3DIC and 5.5D packaging support and promoting configurable chiplet building blocks to simplify system assembly.

Industry partnerships are central to this story. Socionext’s work with EDA and IP suppliers, and collaboration within the TSMC OIP ecosystem, demonstrate that 3D-IC success depends on an end-to-end supply chain: foundry stacking capabilities, packaging houses that can handle F2F and 5.5D substrates, EDA tools that understand multi-die timing and thermal behavior, and IP that is 3D-aware. The Synopsys writeup covering Socionext’s timeline explicitly credits the use of Synopsys’ 3D-enabled IP, AI-powered EDA flows, and cloud solutions as instrumental in hitting multiple tape-outs quickly.

What does this mean for the broader market? Faster, repeatable 3D tape-outs lower the barrier to entry for companies wanting to pursue heterogeneous integration. They also pressure incumbents to adopt modular approaches and to invest in multi-die verification and manufacturing readiness. However, scaling from tape-out to high-yield mass production remains the next big hurdle: yields, test strategies, and supply-chain throughput for advanced packaging will determine whether such rapid tape-out cycles translate into volume shipments and cost-effective products.

Bottom line: Socionext’s two tape-outs in seven months are more than a marketing sound bite, they’re a signal that the multi-die era is maturing. With the right mix of IP, EDA, foundry packaging, and ecosystem collaboration, complex 3D systems can move from experimental demos to production-grade devices on timelines that were hard to imagine just a few years ago.

Also Read:

Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium

TSMC Kumamoto: Pioneering Japan’s Semiconductor Revival

AI-Driven DRC Productivity Optimization: Revolutionizing Semiconductor Design


Why TSMC is Known as the Trusted Foundry

Why TSMC is Known as the Trusted Foundry
by Daniel Nenni on 12-26-2025 at 6:00 am

TSMC Ivey Fab

Taiwan Semiconductor Manufacturing Company (TSMC) is widely regarded as the world’s most trusted semiconductor foundry, a reputation built over decades through technological leadership, business model discipline, operational excellence, and reliability. In an industry where trust is as critical as transistor density, TSMC has become the backbone of the global digital economy.

First and foremost, TSMC’s pure-play foundry model is the foundation of its trustworthiness. Unlike integrated device manufacturers (IDMs) such as Intel and Samsung, which design and manufacture their own chips, TSMC does not compete with its customers. It manufactures chips exclusively for third parties and has maintained a strict firewall between customer designs. This neutrality reassures customers, from Apple and NVIDIA to AMD, Qualcomm, and countless startups, that their intellectual property will not be used against them. Over time, this consistency has created deep confidence across a vast ecosystem, making TSMC the default manufacturing partner for the world’s most valuable chip designers.

Second, TSMC’s technological leadership reinforces that trust. The company has consistently been first, or decisively best, to mass-produce advanced process nodes such as 7nm, 5nm, and 3nm at high yields. In semiconductor manufacturing, reliability is not just about innovation, but about delivering that innovation at scale, on schedule, and with predictable silicon. TSMC’s ability to translate cutting-edge research into stable, high-volume production has made it indispensable for customers whose product cycles depend on certainty. When companies commit billions of dollars to a chip design, they need confidence that the foundry can deliver exactly as promised and TSMC has repeatedly proven it can.

Third, manufacturing excellence and yield consistency distinguish TSMC from competitors. Advanced chips are extraordinarily complex, and small variations can destroy profitability or product viability. TSMC’s laser focus on process control, defect reduction, and continuous improvement results in industry-leading yields. High yields mean lower costs for customers, faster ramp-ups, and fewer surprises after tape-out. This operational discipline is a major reason customers trust TSMC with their most advanced and sensitive designs.

Fourth, TSMC has built a reputation for strong intellectual property protection and confidentiality. Semiconductor designs represent years of research and billions in investment. TSMC has demonstrated, across thousands of customers, that it can securely handle highly confidential data without leaks or misuse. This trust is reinforced by TSMC’s internal culture, strict access controls, and long-standing customer relationships. In an era of increasing cyber and industrial espionage, this reliability is invaluable.

Fifth, TSMC’s scale and ecosystem integration create trust through inevitability. The company has invested hundreds of billions of dollars in fabrication plants, equipment, and talent, creating manufacturing capabilities that few others can match. Its close collaboration with equipment suppliers (such as ASML and Applied Materials), EDA vendors (Synopsys, Cadence, Siemens EDA), and IP companies (Synopsys, Arm, Analog Bits) also known as the Grand Alliance allows customers to design within a mature, silicon-proven and well-supported ecosystem. This reduces risk and shortens time-to-market, further cementing TSMC as the safest choice.

Sixth, TSMC’s long-term strategic thinking strengthens customer confidence. The company invests aggressively ahead of demand, often years before returns are guaranteed. This willingness to absorb risk ensures that capacity is available when customers need it, even during industry upcycles or shortages. During recent global chip shortages, TSMC’s capacity planning and prioritization reinforced its image as a stable, responsible industry steward.

Finally, TSMC’s global credibility and governance matter. While geopolitical risks exist, TSMC has demonstrated transparency, regulatory compliance, and cooperation with governments and customers worldwide. Its expansion into the United States, Japan, and Europe reflects a commitment to supply chain resilience and global trust.

Bottom line: TSMC is the trusted foundry not because of a single advantage, but because of a rare combination: neutrality, technological supremacy, manufacturing reliability, IP protection, scale, and long-term vision. In an industry where failure is catastrophic and trust is earned slowly, TSMC has become the gold standard and the cornerstone of modern semiconductor manufacturing.

Also Read:

TSMC’s Customized Technical Documentation Platform Enhances Customer Experience

A Brief History of TSMC Through 2025

Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium


TSMC’s Customized Technical Documentation Platform Enhances Customer Experience

TSMC’s Customized Technical Documentation Platform Enhances Customer Experience
by Daniel Nenni on 12-24-2025 at 10:00 am

TSMC Online 2025

Taiwan Semiconductor Manufacturing Company, the world’s leading dedicated semiconductor foundry, has long prioritized customer-centric innovation to maintain its competitive edge in a rapidly evolving industry. TSMC is known as “The Trusted Foundry” for this reason.

Amid increasing complexity in chip design and manufacturing, driven by advanced nodes like 3nm and beyond, TSMC recognized the need for more efficient digital tools to support its global clientele. In response, the company upgraded its flagship customer self-service portal, TSMC-Online™, transforming it into a sophisticated Customized Technical Documentation Platform that significantly enhances user experience and operational efficiency.

Launched with upgrades beginning in April 2021, this platform embodies TSMC’s philosophy of being “Everyone’s Foundry.” The core objective was to address challenges posed by escalating technology and design intricacies, where customers from fabless designers to major tech giants require seamless access to vast amounts of technical data. Previously, navigating extensive documentation and production updates often demanded significant time and occasional support from TSMC’s customer service teams. The revamped TSMC-Online™ introduces a customer-oriented architecture, creating a truly customized service environment that empowers users to manage information as if operating their own fabrication facility.

Key enhancements revolve around three innovative methods:

A standard operation interface, personalized workspace, and intelligent guidance service. The standard operation interface provides a unified, intuitive layout that simplifies navigation across diverse functions, reducing learning curves and minimizing errors. Users benefit from consistent workflows, whether querying process design kits (PDKs), foundation IPs, or real-time wafer status updates.

The personalized workspace stands out as a hallmark of customization. Customers can tailor their dashboards with widgets aligned to specific roles and project stages—such as design verification, tape-out preparation, or manufacturing monitoring. For instance, engineers focused on advanced packaging like 3DFabric™ can prioritize relevant tools, while those in automotive applications highlight AEC-Q100 qualified resources. This flexibility accommodates varied stakeholder needs within a single organization, streamlining collaboration and boosting productivity.

Complementing these is the intelligent guidance service, which leverages smart features like contextual tutorials, animated walkthroughs, and real-time assistance modules. Previously, over half of users reportedly sought external help for document-related tasks due to platform complexity. Now, embedded animations and AI-driven prompts enable self-guided exploration, allowing instant access to tutorials without waiting for support, crucial across time zones.

Security remains paramount, with robust confidential information protection mechanisms ensuring sensitive data, including proprietary designs and production metrics, stays secure. Customers gain comprehensive visibility into the entire lifecycle, from design enablement through wafer manufacturing to shipment, fostering trust and operational transparency.

The impact has been profound. By January 2023, TSMC-Online™ averaged over 3,000 daily logins, reflecting high adoption and reliance. This digital collaboration tool accelerates product success by shortening time-to-market, reducing dependency on manual interventions, and enabling innovative outcomes in high-growth sectors like mobile, high-performance computing, AI, automotive electronics, and IoT.

TSMC’s commitment extends beyond this platform; it integrates with broader initiatives like the Open Innovation Platform® (OIP), which includes ecosystems for EDA tools, IPs, and cloud-based design environments. However, the Customized Technical Documentation Platform within TSMC-Online™ directly tackles day-to-day pain points, exemplifying how digital transformation can elevate service quality in semiconductor manufacturing.

Bottom Line: In an era where speed and precision define success, TSMC’s platform not only optimizes customer experience but also strengthens partnerships. By continuing to refine these tools, TSMC reinforces its role as a trusted enabler of global technological advancement, ensuring customers can focus on innovation while the foundry handles the complexities.

Also Read:

Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium

TSMC Formally Sues Ex-SVP Over Alleged Transfer of Trade Secrets to Intel

TSMC Kumamoto: Pioneering Japan’s Semiconductor Revival


A Brief History of TSMC Through 2025

A Brief History of TSMC Through 2025
by Daniel Nenni on 12-22-2025 at 10:00 am

About TSMC 2025

Taiwan Semiconductor Manufacturing Company, the world’s largest dedicated semiconductor foundry, has transformed from a modest startup into a global technology powerhouse. Founded on February 21, 1987, by Morris Chang, a veteran of Texas Instruments, TSMC pioneered the “pure-play” foundry model. This innovative approach separated chip design from manufacturing, allowing fabless companies to outsource production without competing directly with integrated device manufacturers (IDMs).

Historically, IDMs dominated the industry before the 1980s rise of specialization. Companies like Intel pioneered this model, optimizing processes for proprietary designs. Major IDMs today include Intel, Samsung Electronics, Texas Instruments, Infineon, STMicroelectronics, and Renesas.

Chang, recruited by Taiwan’s government to head the Industrial Technology Research Institute (ITRI), envisioned TSMC as a neutral partner. Initial capital came from the Taiwanese government (48%), Philips (28%, with technology transfer), and private investors. Located in Hsinchu Science Park, TSMC’s early focus was on mature processes like 1-micron CMOS, serving fabless startups.

The 1990s brought rapid growth. TSMC went public on the Taiwan Stock Exchange in 1994 and listed ADRs on the NYSE in 1997, the first Taiwanese company to do so. Technological milestones included 0.5-micron in 1994, 0.35-micron copper interconnects, and overseas ventures like WaferTech in the U.S. (1996). Despite challenges like the 1997 Asian financial crisis and 1999 earthquake, revenue soared, reaching over 50% foundry market share by 2000.

Entering the 2000s, TSMC advanced to 0.13-micron (2002) and 90nm (2004), powering the PC and mobile booms. The Open Innovation Platform (OIP) launched in 2008 fostered ecosystem partnerships. Leadership saw Chang retire briefly (2005-2009) before returning amid the global financial crisis. By 2010, revenue hit $13.9 billion, with nodes like 28nm ramping.

The 2010s marked dominance in advanced nodes. Co-CEOs Mark Liu and C.C. Wei took over in 2013, with Chang as chairman until 2018. Breakthroughs included 16nm FinFET (2015), 10nm (2017), 7nm with EUV (2019), and capturing Apple’s A-series chips from Samsung. Revenue reached $45 billion by 2020, market share ~55%. Geopolitical tensions emerged, including U.S. sanctions halting Huawei shipments.

The 2020s accelerated amid COVID shortages and AI surge. 5nm (2020), 4nm (2021), and 3nm (2022) debuted, powering Apple’s M-series and Nvidia’s GPUs. In 2025, 2nm (N2) entered mass production late in the year, offering 10-15% speed gains or 25-30% power savings over 3nm, using gate-all-around transistors. A16 (1.6nm) is slated for 2026/2027 with backside power delivery.

Global expansion diversified risks. Arizona’s Fab 21 began N4 production in Q4 2024, with yields matching Taiwan. By 2025, investment swelled to $165 billion for six fabs, two packaging sites, and R&D—third fab groundbreaking in April for N2/A16. Japan’s JASM (Kumamoto) started mature nodes in 2024, expanding to advanced. Germany’s ESMC (Dresden) progresses for automotive/specialty.

Financially, TSMC is thriving on AI demand. Q3 2025 revenue grew 30% YoY, with 72% foundry share. TTM revenue ~$88 billion, market cap ~$1.5 trillion. Advanced nodes (<7nm) drive ~74% wafer revenue.

Bottom Line: TSMC’s “trusted foundry” status stems from IP protection, neutrality, and innovation. From 1987’s vision to 2025’s AI linchpin, it powers global tech while navigating geopolitics. With C.C. Wei as CEO, TSMC targets net-zero by 2050 and continued leadership in the angstrom era.

Also Read:

Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium

TSMC Kumamoto: Pioneering Japan’s Semiconductor Revival

TSMC’s Customized Technical Documentation Platform Enhances Customer Experience


AI-Driven DRC Productivity Optimization: Insights from Siemens EDA’s 2025 TSMC OIP Presentation

AI-Driven DRC Productivity Optimization: Insights from Siemens EDA’s 2025 TSMC OIP Presentation
by Daniel Nenni on 12-09-2025 at 10:00 am

AI Driven DRC Productivity Optimization Siemens AMD TSMC

 

In the rapidly evolving semiconductor industry, Design Rule Checking (DRC) remains a critical bottleneck in chip design workflows. Siemens EDA’s presentation at the 2025 TSMC Open Innovation Platform Forum, titled “AI-Driven DRC Productivity Optimization,” showcases how artificial intelligence is revolutionizing this process. Delivered by David Abercrombie, Sr. Director of Calibre Product Management at Siemens EDA, alongside AMD experts Stafford Yu and GuoQin Low, the talk highlights collaborative advancements with TSMC and AMD to enhance productivity across understanding, fixing, debugging, and collaboration in DRC sign-off.

The presentation opens with an overview of Siemens EDA’s new AI Workflow System, designed to boost the entire EDA ecosystem. This system integrates knowledge capture, next-gen debug platforms, AI debug assistance, and automated fixing, ultimately optimizing DRC sign-off. Central to this is the Siemens EDA AI System, an open, secure platform deployable on-premises or in the cloud. It features a GenAI interface, a knowledge base, and a data lake that amalgamates Siemens EDA data, Calibre-specific data, and customer inputs. Powered by LLMs, ML models, and data query APIs, it enables intelligent solutions across tools like Calibre, Aprisa, and Solido. Key benefits include a single installation process, flexibility for customer integrations, and support for assistants, reasoners, and agents. This infrastructure ensures AI tools are hosted on customer hardware, maintaining data security while accelerating workflows.

A major focus is on boosting user understanding through AI Docs Assistant and Calibre RVE Check Assist. The AI Docs Assistant allows users to query Siemens EDA tool documentation via browser or integrated GUIs, providing instant answers with RAG-generated citations. It supports specific tools and versions, includes company documentation, and collects feedback for continuous improvement. Integrated with Calibre’s Results Viewing Environment (RVE) and Vision AI, it streamlines access to knowledge. Complementing this, Calibre RVE Check Assist leverages TSMC’s Design Rule Manual (DRM) data, embedding precise rule descriptions and specialized images directly into the RVE. This enhances designers’ comprehension of rule checks, improving debugging experiences and productivity. Additionally, RVE Check Assist User Notes facilitate in-house knowledge sharing: designers capture fixing suggestions and images in RVE, storing them in a central database within the EDA AI Datalake. This shared repository allows organization-wide review, enhancing DRC-fixing flows by leveraging collective expertise.

Shifting to automated fixing, the presentation details Calibre DesignEnhancer, an analysis-based tool for sign-off DRC-clean modifications on post-routed designs. It includes modules like DE Via, which maximizes via insertion to reduce IR drop and boost robustness, and DE Pge, which enhances power grids by adding Calibre nmDRC-clean interconnects for better EM and IR performance. The engine supports LEF/DEF formats and outputs incremental, full, or ECO DEF files, integrating seamlessly with Place-and-Route tools. Its infrastructure handles simple and complex metal rules, such as spacing (M.S., V#.S.), enclosure (M.EN., V.EN.), and forbidden patterns (EFP.M., EFP.V.), considering connectivity and rule dependencies. Examples illustrate fixes like expanding or trimming edges to resolve end-to-end spacing violations, demonstrating its precision in layout contexts.

For debugging, Calibre Vision AI addresses full-chip integration challenges, such as handling billions of violations with sluggish navigation and limited perspectives. It enables “shift left” strategies, identifying issues early for Calibre-clean resolutions. Features include intelligent debug via check grouping (e.g., bad via arrays or fill overlaps), full-chip analysis at 20x speed (reducing 71GB databases to 1.4GB with instant loading), and cross-team collaboration through bookmarks, ASCII RDB exports, and HTML reports. Integration with the Siemens EDA AI System adds natural language capabilities for tool operations, data reasoning, and knowledge access.

AMD’s testimonial underscores real-world impact: on a design with 600 million errors across 3400 checks, Vision AI grouped them into 381 signals, enabling 2x faster root-cause analysis. Heatmaps revealed systematic issues like fill overlaps with clock cells or missing CM0 in breaker cells, compressing cycle times.

Bottom line: This collaboration between Siemens EDA, TSMC, and AMD exemplifies AI’s transformative role in DRC. By boosting workflows, understanding, fixing, debugging, and collaboration, these tools promise significant productivity gains, potentially shortening design cycles and improving chip reliability. As semiconductor nodes advance, such innovations are essential for maintaining competitive edges in high-stakes industries.

Also Read:

An Assistant to Ease Your Transition to PSS

Accelerating SRAM Design Cycles: MediaTek’s Adoption of Siemens EDA’s Additive AI Technology at TSMC OIP 2025

Why chip design needs industrial-grade EDA AI


Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium

Cerebras AI Inference Wins Demo of the Year Award at TSMC North America Technology Symposium
by Daniel Nenni on 12-07-2025 at 2:00 pm

Cerebras TSMC OIP 2025

This is a clear reminder of how important the semiconductor ecosystem is and how closely TSMC works with customers. The TSMC Symposium started 30 years ago and I have been a part of it ever since.  This event is attended by TSMC’s top customers and partners and is the #1 semiconductor networking event of the year, absolutely.

Cerebras Systems, the pioneer in wafer-scale AI acceleration, today announced that its live demonstration of the CS-3 AI inference system received the prestigious Demo of the Year award at the 2025 TSMC North America Technology Symposium in Santa Clara.

The winning demonstration showcased the Cerebras CS-3, powered by the industry’s largest chip, the 4-trillion-transistor Wafer-Scale Engine 3 (WSE-3), delivering real-time, multi-modal inference on Meta’s Llama 3.1 405B model at over 1,800 tokens per second for a single user, and sustaining over 1,000 tokens per second even under heavy concurrent multi-user workloads. Running entirely in memory with no external DRAM bottlenecks, the CS-3 processed complex reasoning, vision-language, and long-context tasks with sub-200-millisecond latency performance previously considered impossible at this scale.

TSMC’s selection committee, composed of senior executives and technical fellows, cited three decisive factors:
  1. Unprecedented single-chip performance on frontier models without multi-node scaling
  2. True real-time interactivity on models larger than 400 billion parameters
  3. Seamless integration of TSMC’s most advanced 5 nm technology with Cerebras’ revolutionary wafer-scale architecture

During the live demo, the CS-3 simultaneously served dozens of concurrent users running Llama 3.1 405B with 128k context windows, answering sophisticated multi-turn questions, generating images from text prompts via integration with Flux.1, and performing real-time document analysis—all while maintaining conversational latency indistinguishable from smaller cloud-based models.

“Wafer-scale computing was considered impossible for fifty years, and together with TSMC we proved it could be done,” said Dhiraj Mallick, COO, Cerebras Systems. “Since that initial milestone, we’ve built an entire technology platform to run today’s most important AI workloads more than 20x faster than GPUs, transforming a semiconductor breakthrough into a product breakthrough used around the world.”

“At TSMC, we support all our customers of all sizes—from pioneering startups to established industry leaders—with industry-leading semiconductor manufacturing technologies and capacities, helping turn their transformative idea into realities,” said Lucas Tsai, Vice President of Business Management, TSMC North America. “We are glad to work with industry innovators likes Cerebras to enable their semiconductor success and drive advancements in AI.”

The CS-3’s memory fabric provides 21 petabytes per second of bandwidth and 44 gigabytes of on-chip SRAM—equivalent to the memory of over 3,000 GPUs—enabling entire 405B-parameter models to reside on a single processor. This eliminates the inter-GPU communication overhead that plagues traditional GPU clusters, resulting in dramatically lower latency and up to 20x higher throughput per dollar on large-model inference.

The recognition comes as enterprises increasingly demand cost-effective, low-latency access to frontier-scale models. Independent benchmarks published last month by Artificial Analysis confirmed the CS-3 as the fastest single-accelerator system for Llama 3.1 70B and 405B inference, outperforming NVIDIA H100 and Blackwell GPU clusters on both tokens-per-second and time-to-first-token metrics.

TSMC’s annual symposium attracts thousands of engineers and executives from across the semiconductor ecosystem. The Demo of the Year award has previously gone to groundbreaking advancements in 3 nm and 2 nm process technology; this year marks the first time an AI systems company has claimed the honor.

Cerebras is now shipping CS-3 systems to customers in healthcare, finance, government, and scientific research. The company also announced general availability of Cerebras Inference Cloud, offering developers instant API access to Llama 3.1 405B at speeds up to 1,800 tokens/second—the fastest publicly available inference for models of this scale.

Bottom line: With this award from TSMC, Cerebras solidifies its position as the performance leader in generative AI inference, proving that wafer-scale computing has moved from bold vision to deployed reality.

Also Read:

TSMC Kumamoto: Pioneering Japan’s Semiconductor Revival

AI-Driven DRC Productivity Optimization: Revolutionizing Semiconductor Design

Exploring TSMC’s OIP Ecosystem Benefits

Breaking the Thermal Wall: TSMC Demonstrates Direct-to-Silicon Liquid Cooling on CoWoS®