DACis just 33 days away and who wouldn’t want a cool GoPro camerato play with? Your manager will certainly want you to first check out what’s new at DAC if your job involves getting to RTL signoff on time and within budget. The creative folks at Atrenta have figured out how to attract us with the offer of winning a GoPro camera,… Read More
Flynn Was Right: How a 2003 Warning Foretold Today’s Architectural PivotIn 2003, legendary computer architect Michael J. Flynn…Read More
Enabling RISC-V & AI Innovations with Andes AX45MPV Running Live on S2C Prodigy S8-100 Prototyping SystemQualifying an AI-class RISC-V SoC demands proving that…Read More
DAC News – A New Era of Electronic Design Begins with Siemens EDA AIAI is the centerpiece of DAC this year.…Read More
IC/Package/Board – Power, Noise and Reliability from ANSYS (Apache DA) at DAC
ANSYS acquired Apache Design Automation back in June 2011and three years later the name “Apache” is being subdued in favor of using just ANSYS. One thing that I noticed right away was a DACfocus on having actual ANSYS customers talk about their hands-on experience using the EDA tools. The following seven customers… Read More
Kurt Shuler: Arteris Presentation at EDPS 2014
The Electronic Design Process Symposium is an annual workshop run by the IEEE Computer Society of Silicon Valley and the IEEE Council on Electronic Design Automation. I presented there because it’s devoid of product marketing pitches, and is two days of discussion on technical and process issues in SoC design. My slides are here:… Read More
An AMS and RF IC Design Flow
The big three in EDA are well-know for offering AMS and RF IC design flows, but today you also have alternative EDA vendors available that have capable tools, yet are lessor known. This blog will present an overview of the AMS and RF IC design flowoffered by Silvaco, an EDA company with a strong history in TCAD tools like Utmost IV for… Read More
Designing Change into Semiconductor Techonomics
Every industry has famous thought leaders that can summarize where we’ve been and then paint a picture of where we’re headed towards in the future. Often they make statements that become industry expressions, like “Moore’s Law” or the “Internet of Things”. I think that if Synopsys… Read More
More knowledge, less time in FPGA-based prototyping
I recently published a post on LinkedIn titled “Sometimes, you gotta throw it all out” in reference to the innovation process and getting beyond good to better. A prime example has crossed my desk: the new ProtoCompiler software for Synopsys HAPS FPGA-based prototyping systems.
Last week, I spoke with Troy Scott, product marketing… Read More
Tanner EDA Helps Customer Productivity Engineering Increase Efficiency and Lower Cost with No Compromise in Performance
Tanner EDA is making waves at their customer’s sites as the mixed-signal design suite from Tanner EDA, Incentia Design Systems, Inc. and Aldec, Inc. helps ASIC Design House lower cost and increase efficiency with no compromise in performance. In today’s ‘always on’, Internet of Things connected world, the demand for high-performance,… Read More
Xilinx Quarterly Results: 20nm Prototypes
Xilinx announced their quarterly results last week. Because of their financial year not being aligned with their calendar year this is actually 4th quarter of their 2014 financial year. New Year’s Eve 2015 comes early for Xilinx. The results were very good. As Moshe Gavrielov, the CEO, said on the conference call:Xilinx… Read More
Carey Robertson: Reliability Checks in Advanced Nodes
Last week I had the pleasure of presenting at the Electronic Design Process Symposium (EDPS) workshop. This was my first time attending and I was very impressed. There were good presentations but I learned as much from the Q&A and the side conversations before/after/breakfast/lunch/etc. If you have the opportunity to attend,… Read More
FinFET & Multi-patterning Need Special P&R Handling
I think by now a lot has been said about the necessity of multi-patterning at advanced technology nodes with extremely low feature size such as 20nm, because lithography using 193nm wavelength of light makes printing and manufacturing of semiconductor design very difficult. The multi-patterning is a novel semiconductor manufacturing… Read More
Flynn Was Right: How a 2003 Warning Foretold Today’s Architectural Pivot