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As transistor dimensions shrink to follow Moore’s Law, the functionality of the gate used to switch on or off the current is actually being degraded by the short channel effect (SCE) [1-5]. Moreover, the simultaneous reduction of voltage aggravates the degradation, as will be discussed below.
A Practical Lower Limit of… Read More
We started working with Felx Logix more than eight years ago and let me tell you it has been an interesting journey. Geoff Tate was our second CEO Interview so this is a follow up to that. The first one garnered more than 15,000 views and I expect more this time given the continued success of Flex Logix pioneering the eFPGA market, absolutely.… Read More
I had the opportunity to attend a ClioSoft webinar recently on the topic of IP traceability. ClioSoft provides a broad range of tools for design data management and IP reuse. Entitled The New Trend in IP Traceability that IP Developers and Design Managers Rely On, the webinar was presented by Karim Khalfan, director of applications… Read More
The DVCon conference and exhibition finished up in California just as the impact of the COVID-19 pandemic was ramping up in March, but at least they finished the conference by altering the schedule a bit. Umesh Sisodia, CEO at CircuitSutra Technologies presented at DVCON on the topic, Using High-Level Synthesis to Migrate Open… Read More
I wrote last year about Eta Compute and their continuously tuned dynamic voltage-frequency scaling (CVFS). That piece was mostly about the how and why of the technology, that in self-timed circuits (a core technology for Eta Compute) it is possible to continuously vary voltage and frequency, whereas in conventional synchronous… Read More
Bring digital technology solutions to bear on more of our toughest societal problems
“We are all in this together”. The world faces 250,000 COVID-19 deaths, each a tragic human story. The pandemic will bring a litany of “lessons learned” including lack of preparedness, slow response and uneven recovery. The rapid… Read More
Spacer-defined patterning is an expected requirement for advanced semiconductor patterning nodes with feature sizes of 25 nm or less. As the required gaps between features go well below the lithography tool’s resolution limit, the use of cut exposures to separate features is used more often, especially in chips produced… Read More
There is an adage that says that quality is not something that can be slapped on at the end of the design or manufacturing process. Ensuring quality requires careful thought throughout development and production. Arguably this adage is more applicable to the topic of Design for Test (DFT) than almost any other area of IC development… Read More
I managed a few meetings at DVCon this year in spite of the Coronavirus problems. One of these was with Lu Dai Chairman of Accellera. I generally meet with Lu each year to get an update on where they are headed, and he had some interesting new topics to share.
Membership and headcount remain pretty stable. Any changes (at the associate… Read More
I have been watching the trend for quite some time now that many advanced FinFET designs today are actually 2.5D systems in package. All of these 2.5D silicon interposer-based designs have high-bandwidth memory (HBM) stacks on board. Often there are multiple memory stacks in both 4-high and 8-high configurations. If you follow… Read More
The Quantum Threat: Why Industrial Control Systems Must Be Ready and How PQShield Is Leading the Defense