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What an exciting year for DAC with record submissions in nearly every category. Most impressive is the increase in Designer and IP Track submissions, content that is helping to continue to evolve and improve the show. If you haven’t already registered, why not do so now?
A brief bit of background about the conference: DAC’s roots… Read More
Imec Technology Forumby Paul McLellan on 04-23-2015 at 7:00 amCategories: Events
I like to quiz people on which country is the one where the most leading edge research on semiconductors is done. People reflexively answer USA or maybe Taiwan or Japan. Nobody who doesn’t already know the answer would pick Belgium. After all the EU headquarters is there not because Belgium is important but because Belgium… Read More
There is a new stadium in town. No, not Levi’s Stadium where the 49ers play, that one is already a year old. There is Avaya Stadium over near San Jose airport. 1123 Coleman Avenue if you want to be precise. This is a purpose-built soccer stadium where the San Jose Earthquakes play. Their season just started in February.
But on … Read More
The connected car movement is in full bloom, making headlines in the trade media on how the cutting-edge electronics will transform the twenty-first century driving experience. However, a closer look at the Internet of cars juggernaut shows that safety and security of the networked vehicle are still a major stumbling block.… Read More
Last month I was on my way to write a detailed article on important aspects to look at while designing an SoC. This was important in the new context of modern SoCs that go much beyond the traditional power, performance and area (PPA) requirements. I had about 12-13 parameters in my list that I couldn’t cover in one go, so I put the write-up… Read More
DAC starts in San Francisco on June 8th. The kickoff keynote at 9.20am that morning is by Brian Otis of Google. He is a director at Google[x]. According to Wikipedia:Google X, stylized as Google[x], is a semi-secret facility run by Google dedicated to making major technological advancements. It is located about a half mile from … Read More
With today’s ArF based lithography using 193nm wavelength light, we are hard up against the limitations imposed by the Raleigh equation. Numerous clever things have been devised to maximize yield and reduce feature size. These include 2 beam lithography, multiple patterning, immersion litho processes to improve NA, thinner… Read More
The SPIE Advanced Lithography Conference is the world’s premier conference for patterning techniques utilized to manufacture semiconductors. At any given time during the conference there are multiple parallel sessions so it is impossible to see all of the papers presented. Prior to the conference I reviewed and blogged on … Read More
The final session of the SEMI Industry Strategy Symposium (The CxO Panel) was the most interesting for me because executives from three of the four most influential semiconductor companies were on the panel: Dr. Goeff Yeap of Qualcomm, Dr. Jack Sun from TSMC, and Mr. Mark Bohr of Intel. Who is fourth you ask? That would be Apple of … Read More
Paul McClellan and I are at the SEMI Industry Strategy Symposium this week in Half Moon Bay. Honestly there is too much to blog about here so I will have to pick the topics most interesting to me. The full capacity audience is also impressive. SEMI provides a list of attendees on their website which reads like “Who’s Who” of the semiconductor… Read More
Application-Specific Lithography: Sense Amplifier and Sub-Wordline Driver Metal Patterning in DRAM