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Outlook 2024 with Dr. Laura Matz CEO of Athinia

Outlook 2024 with Dr. Laura Matz CEO of Athinia
by Daniel Nenni on 02-12-2024 at 6:00 am

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Laura Matz is also the Science & Technology Officer of Merck KGaA, Darmstadt, Germany. She has always been a key contributor to the growth in semiconductor materials, driving a strong R&D presence to enable business growth.

Laura is a strong advocate for young talent in science and engineering. As a leader, she builds teams to find innovative solutions to the problems facing humanity and implement them with the discipline and rigor to create the greatest impact. In 2023, she joined SEMI Impact for Skills as a board member, a governance program to support upskilling and reskilling, to attract new talent, and to unlock EU and national/ regional funding. In addition, she is a board member of AIChE (American Institute of Chemical Engineers), a leading organization for chemical engineering professionals.

Laura has a Ph.D. in Analytical Chemistry from Washington State University and an undergraduate degree from the Indiana University of Pennsylvania.

Tell us a little bit about yourself and your company.
I have a dual role: CEO of Athinia and Chief Science & Technology Officer at Merck KGaA, Darmstadt, Germany.

Athinia is a secure data analytics platform for collaborating on relevant information from materials and equipment suppliers, device makers, and fabs in the semiconductor industry, with the goal of improving decision-making, minimizing quality deviations, and increasing efficiencies. With the proliferation of digital technologies, there is immense pressure on the semiconductor industry to produce with zero defects and deliver new innovations to market faster. The immense amounts of data produced today create opportunities for not only a single company but for the entire value chain to achieve excellence in production, innovation, and cost reduction. The challenge is that individual companies do not want to establish an isolated ecosystem given the prohibitive cost and time investments. The industry needs a standard in quality and manufacturing management, one based on a data ecosystem that allows for the secure and continuous sharing of data between many companies in the semiconductor industry. This is why we started Athinia.

What was the most exciting high point of 2023 for your company?
In 2023, Athinia expanded its industry collaboration platform, connecting material suppliers and device makers more deeply. This enlarged network through Athinia’s secure platform has led to greater transparency in the supply chain, heightened efficiency in operations, spurred innovation with shared knowledge, improved risk management, and fostered stronger business relationships. These developments have collectively boosted the industry’s capacity for technological advancement and market adaptability.

In 2023, Athinia achieved a significant milestone by fostering a novel industry collaboration. By integrating Tokyo Electron Limited (TEL) into Athinia’s data analytics platform, Athinia has expanded its network and created a secure platform for device makers and equipment suppliers to collaborate effectively. The collaboration has led to feasibility to further improve equipment performance, efficiency, and maintenance, created mutually benefits for both equipment and device makers. Athinia’s platform facilitates this by offering a secure environment for sharing insights, which adds value to the entire industry and sets a new standard for collaboration.

What was the biggest challenge your company faced in 2023?
The semiconductor industry is data extensive and large-scale organizations need to deal with vast amounts of data. To be able to derive insights from data that unlock efficiencies, shorten time to market, and improve quality, supply chain and sustainability, data needs to be shared across the value chain while ensuring stakeholders maintain control of their intellectual property. To enable successful data collaboration, unstructured content needs to be curated, data quality improved, and diverse sources integrated. However, many companies on the materials side do not employ data scientists.

How is your company’s work addressing this biggest challenge?
Athinia leverages Palantir Foundry for AI/ML and data analytics, focusing on integrating diverse data sources into a unified environment. This process involves effective ETL (Extract, Transform, Load) operations, data quality management, and building a reliable data foundation from various systems like manufacturing, quality control, and supply chain management. Using Foundry’s advanced AI/ML toolkit, Athinia develops and deploys models, with tools for no-code development and custom model creation via shared workspaces. These models drive operational insights, helping inform decisions through visualizations and actionable recommendations.

Palantir Foundry features walk-up usable applications such as Object Explorer, requiring minimal setup for immediate use and low maintenance. Foundry’s Workshop allows the creation of customized applications for specific workflows, with no/low-code builders for intuitive user interaction and minimal backend management. Its widget-driven interfaces cater to various skill levels, ensuring adaptability and scalability. Foundry’s open API architecture facilitates seamless integration with emerging technologies, while its decision orchestration layer bridges analytics with operational workflows, promoting continuous learning and adaptability.

Athinia is designed for scalability, handling increased data and model complexity without losing performance. It includes robust model governance and ethical AI practices, ensuring continuous model evaluation and responsible use with a human-in-the-loop approach. Collaboration is facilitated across teams, with an extensible architecture that integrates with other systems, turning data-driven insights into operational actions. Foundry enables Athinia to transform data into meaningful insights and actionable business outcomes, ensuring improved operational performance and yield.

In addition, Athinia is leveraging the strict data and security standards of the Foundry platform that are trusted by, e.g., the healthcare and defense industry. The Foundry platform’s robust security end-to-end architecture protects intellectual property and ensures customers always stay in control of their data. Customers own their data, Athinia has no access to it. With tailored and granular permissions, customers control who they share data with, how the data can be used, and for how long. Multi-level approval workflows ensure that data sharing follows your company’s data governance framework. Whenever parties are not willing to share raw process data, they have the possibility to obfuscate and normalize the data before it is being shared to protect sensitive data while maintaining its usefulness for advanced analytics such as machine learning.

What do you think the biggest growth area for 2024 will be, and why?
We are on the cusp of a revolution of AI adoption in all aspects of our global society. The drive for higher performance, enabling new AI solutions and faster AI insights for next-generation technologies in both memory and logic devices have never been more important. The material’s intelligence and development of advanced materials becomes really important in order to build a new generation of technologies. Over the next five years, the industry will experience a significant evolution in new nodes and facilities being built.

How is your company’s work addressing this growth?
Athinia is working with its customers to understand which materials will be needed, predict material ramps, accelerate qualification of materials with new production characteristics, and facilitate rapid innovation in the semiconductor industry through secure data sharing and advanced analytics enabling real-time insights.

Our secure data analytics platform processes diverse supplier data using machine learning to predict material performance. The platform offers real-time analytics for process monitoring and decision-making, with scalable data ingestion for adapting to growing data needs. Continuous improvement is achieved through a feedback loop, refining qualification models for efficiency. This results in a secure, adaptable, and sophisticated analytics platform that streamlines the materials qualification process.

The Athinia platform enables quick, informed decision-making, enhances collaborative research and development, and optimizes manufacturing processes. With predictive maintenance and digital twins, companies minimize downtime, and the platform’s robust security measures safeguard intellectual property. Athinia also aids in regulatory compliance and promotes sustainable manufacturing practices, supporting companies in staying competitive in a fast-paced market.

Furthermore, Athinia can enable tracking of the movement of materials and components throughout the supply chain. This transparency helps to ensure that all parts are legitimate and meet quality and emission requirements. By integrating data from all tiers of suppliers and establishing a unified ontology, Athinia helps customers gaining comprehensive visibility into key sustainability metrics like energy use, emissions, and waste generation, while still maintaining each node/tier intellectual property. Athinia’s real-time data processing and visualization capabilities allow continuous monitoring. Its AI/ML tools enable predictive analytics and scenario modeling, assisting in foreseeing and managing potential sustainability issues. The platform also aids in supplier assessments, regulatory compliance, and reporting. Additionally, the collaborative tools and machine learning insights drive continuous improvement and resilience in the supply chain, ensuring Athinia not only meets but also sets new industry benchmarks in sustainability. Athinia is founding member of the SEMI SCC, committed to working with high vertical sustainability via the value chain.

What conferences did you attend in 2023 and how was the traffic?
Athinia actively engaged with key semiconductor industry trends and developments. In 2023, Athinia participated in and presented pioneering data analytics examples at several industry conferences, including SEMICON West and CMC Critical Materials Council.

Will you attend conferences in 2024? Same or more?
I just came back from CES where I spoke on an AI panel in my role as Chief Science & Technology Officer at Merck KGaA, Darmstadt, Germany. Also in January, Athinia was recognized as the technology-enabled data collaboration platform at ISS in Half Moon Bay.

We will continue to intensively engage with key semiconductor industry trends and developments. Athinia is planning to attend the key semiconductor conferences to showcase the more recent industry innovation that resulted from data collaboration. We hope to see everyone at SEMICON West and other events.

Also Read:

Semiconductor Devices: 3 Tricks to Device Innovation

Investing in a sustainable semiconductor future: Materials Matter

Step into the Future with New Area-Selective Processing Solutions for FSAV


Podcast EP207: How Achronix is Enabling Multi-Die Design and a Chiplet Ecosystem with Nick Ilyadis

Podcast EP207: How Achronix is Enabling Multi-Die Design and a Chiplet Ecosystem with Nick Ilyadis
by Daniel Nenni on 02-09-2024 at 10:00 am

Dan is joined by Nick Ilyadis, vice president of product planning at Achronix. Prior to Achronix, Nick was vice president of portfolio and technology strategy at Marvell Semiconductor and vice president and group CTO at Broadcom. Nick has also held many engineering roles during his career, starting as a chip designer and moving up through management to lead both device and product engineering teams. Nick is passionate about technology and a prolific inventor with 75 issued patents across all aspects of wired and wireless communications.

Nick describes how Achronix FPGA technology is enabling new types of designs with a focus on AI enablement. The strategies used to develop multi-die, chiplet-based designs and the various ways Achronix is making new design approaches a reality through technology development and partnerships are also discussed.

The views, thoughts, and opinions expressed in these podcasts belong solely to the speaker, and not to the speaker’s employer, organization, committee or any other group or individual.


CEO Interview: Vincent Bligny of Aniah

CEO Interview: Vincent Bligny of Aniah
by Daniel Nenni on 02-09-2024 at 6:00 am

Imge 2

Vincent Bligny is a renowned expert in mixed-signal verification, particularly with transistor-level formal techniques. He spent 15 years in this industry, mainly within STMicroelectronics’ design and verification teams, allowing him to understand the challenges and opportunities of the EDA field.

 Tell us about your company?
Aniah is an EDA startup founded in the French Silicon Valley in Grenoble, in 2019, by Remi Moriceau and I. It relies on several years of joint academic research with the Ecole Normale Supérieure de Lyon (ens-lyon.fr) and the CEA (cea.fr). Aniah is now a 36-employee company, with headquarters in Grenoble, France and a branch office in Taïwan and in the USA in 2024.

What problems are you solving?
Aniah OneCheck detects transistor-level design errors that elude all other verification techniques and is applicable from early design phases to sign-off. We take a no-compromise approach to error detection as any error on Silicon may jeopardize the project’s time to market.

Aniah OneCheck has 4 unique advantages:

  • 100% coverage for the targeted transistor-level errors, including all power states – a chip using low-power design techniques will have 1000s of unique power states
  • A user-interface that targets all design engineers with instant learning curve. This interface is designed with highly efficient, batch-analysis capacity in mind
  • 1000 times faster than existing tools – a design with 20 million transistor is analyzed in just 2 seconds. Designs with billions of transistors can be analyzed in a few minutes.
  • Detection of conditional HiZ nets from IP to SoC scale. Our approach has a superior coverage with a comprehensive detection of purely analog errors. This feature extends to detection of DC-path, low-power ageing, and dynamic clocking issues.

Finally, one of our customers’ problems that we contribute to solving is the high energy cost of simulation for mixed-signal verification, estimated by one of our customers at 4 GWh per project.

The formal, rule-based verification done by Aniah OneCheck is intrinsically energy-efficient and leads to a significant reduction in the number of simulations that must be run in Spice or Fast-Spice.

What application areas are your strongest?
Aniah OneCheck has value for all types of IC design:

  • IP design: checking 100% of the operating modes, automated regression, in-depth verification and generation of Spice testbench and views
  • Analog designs: boost design efficiency with continuous checks. Automation of the design release process (checklists)
  • Mixed-signal ICs: check the consistency of IPs / analog / digital blocs across the full scale of operating modes. “Industrialize the top-level assembly stage” and ensure sign-off convergence.
  • Large-Scale SoC: validate IPs from external vendors before integration, check UPF electrical consistency during its development, secure tape-outs schedule.
    Most errors found by Aniah OneCheck in large-scale SoC “should have been found by digital-centric tools” or “shouldn’t be allowed by the implementation flow”, but our experience has been that Aniah OneCheck detects serious errors every time on digital circuits.

Our customers get the best efficiency and quality of results when using our flow bottom-up, which is 100% seamless as all setup from IP and macros can be directly injected in the IC analysis.

What keeps your customers up at night?
Based on public data from the Wilson research group study in 2020:

  • 68% of circuits require a redesign.
  • 85% of all circuits in production contain errors.

We help design teams avoid a most of these errors and relieve design engineers from the burden and stress of Silicon failures due to complex system assembly.

What does the competitive landscape look like and how do you differentiate?
Our #1 differentiation factor is coverage: customers who want the absolute best quality and detect errors in all types of circuitries love our solution.

Another differentiation factor is cost: some of our customers, who had spent more than 5 millions dollars on customization of standard EDA solutions over a decade, have been able to use our solution right out of the box – with the added value of superior productivity, thanks to a user interface purpose-build for the task.

A third key differentiator is runtime: with runtime in seconds for mixed-signal ICs, in minutes for billion-transistor SoC, our customers can go through all steps in the analysis, loop on errors fixes and set-up updates in less than a day.

Importantly, the scale of the IC has strictly no impact on coverage.

What new features/technology are you working on?
Our high-capacity, high-accuracy circuit analysis engine opens completely new possibilities, which we are very excited about:

  • Reliability modelling: provide a model of IC lifetime including oxide breakdown, EM and xBTI impact, with 2 key capacity: a. what-if analysis vs. mission profile and b. exhaustive detection of reliability hotspot to secure HTOL
  • IDDQ modelling across corner, temperature for test and industrialization engineers.
  • Virtual Lab for ISO 26262 standard for structural tests and functional safety

How do customers normally engage with your company? 
The most common entry process for our customers is “I’ve had a Silicon Bug – I don’t want that to happen ever again!”.

Our customers reach us through our sales network partners and in most cases, will engage in an evaluation. Aniah dedicates an AE engineer to each of our customers to ensure that OneCheck can be deployed throughout the design teams with the highest verification quality on all projects.

Our customers can purchase our solution for on-premises or SaaS deployment.

Also Read:

CEO Interview: Venkata Simhadri of MosChip

CEO Interview: Pat Brockett of Celera

CEO Interview: Islam Nashaat of Master Micro


Outlook 2024 with Anna Fontanelli Founder & CEO MZ Technologies

Outlook 2024 with Anna Fontanelli Founder & CEO MZ Technologies
by Daniel Nenni on 02-08-2024 at 10:00 am

ANNA (1)

I spoke with Anna again at the Chiplet Summit this week, we had previously spoken at DAC 2023. MZ is short for Monozukuri which is a Japanese term that translates to “making things” or “manufacturing.” In a broader sense, it refers to the art, science, and craftsmanship of creating products which fit chiplets quite well.

Anna Fontanelli has more than 25 years of expertise in managing complex R&D organizations/programs to give birth to innovative EDA technologies. Fontanelli is an expert in IC/package co-design and led Monozukuri in the launch of GENIO, bringing a holistic design environment for 2D, 2.5D and 3D multi-component systems.

Tell us a little bit about yourself and your company.
I’m the Founder and CEO of Monozukuri, S.pA. who takes its products and services to market under MZ Technologies brand.  Our mission is to conquer 2.5D & 3D design challenges by delivering innovative, ground-breaking EDA software solutions and methodologies. Our technology redefines the co-design of heterogeneous microelectronic systems by providing an improved level of automation in three-dimensional interconnect optimization.

What was the most exciting high point of 2023 for your company?
We reached a huge milestone when an internationally respected System/ASIC company adopted our GENIOTM 1.7 fully-integrated EDA co-design tool.  They adopted a full-suite license and are targeting a next generation product family based on heterogeneous advanced system-in-package technology.

What was the biggest challenge your company faced in 2023?
People.  We are moving into a global expansion and are finding the availability of business development and account service pros who truly understand the needs of the marketplace are few and far between. We’re looking for people who are technically-sophisticated and sufficiently business savvy to help advanced technology IC companies take on their challenges.

How is your company’s work addressing this biggest challenge?
We’re recruiting like crazy.  We’re reaching out to industry contacts and we’re advertising on EDA websites.

What do you think the biggest growth area for 2024 will be, and why?
Clearly, Heterogeneous die integration challenges are going to do nothing but increase this year.  Yield, cost of design, and time-to-market are going to become paramount.

How is your company’s work addressing this growth?
We’re going to address some of most vexing advanced systems challenges: Helping designers deliver energy-efficiency improvement … that is performance per mW … and latency reduction.  We’re enabling a design approach that integrates signal and power integrity with thermal analysis for simulation-aware system interconnect optimization. This will allow technology-aware architecture exploration, 3D floor planning and system interconnect optimization to enable early up feasibility analysis without starting any physical implementation.

What conferences did you attend in 2023 and how was the traffic?
We attended DAC, where we had some very good exploratory meetings and we presented papers at DATE and the IEEE EDAPS 2023 Hybrid Conference. We’re not really worried about a lot of traffic per se. We offer a very specific value proposition, so the quality of the attendance is more important than the quantity.

Will you attend conferences in 2024? Same or more?
We’ll more than likely add Chiplet Summit to our conference attendance.

Additional questions or final comments?
2024 going to be all about chiplets, packaging and systems integration.  The most demanding IC systems today combine multiple components such as chiplets, memory and ASICs.  The package poses the challenge of handling, updating & optimizing complex interconnects in a 3D space. Present-day 3D chiplet architecture demands die stacking and silicon-to-silicon vertical communications capabilities using a mix-and-match “LEGO-like” assembly.  This new chiplet packaging requires new tools, new methodologies, and new flows.

Also Read:

CEO Interview: Anna Fontanelli of MZ Technologies

What ChatGPT has to say about the Chiplet Summit

Chiplet Summit 2024 Preview


SOITEC Pushes Substrate Advantages for Edge Inference

SOITEC Pushes Substrate Advantages for Edge Inference
by Bernard Murphy on 02-08-2024 at 6:00 am

FD SOI power min

You might not immediately see a connection between semiconductor substrate choices and inference at the edge. These technology layers seem worlds apart and yet SOITEC have a point. Edge AI has rapidly evolved from simple CNNs to now complex reinforcement learning systems and transformer based LLMs. Even when shrunk to edge footprints, these architectures are still very demanding in performance and power, challenging metrics for any edge device. Optimizing power especially requires dedicated investment all the way from architecture down to process. Product designers can’t afford to leave anything on the table, which means that the substrate on which circuits are built is just as important as other considerations.


The need for low power

There are many different types of intelligent edge device, but they uniformly need to run on little to no power. Edge devices commonly run on batteries or even without a battery, harvesting power from sunlight or ambient wireless energy. For consumer devices we expect to need to recharge every few days, but we don’t expect adding a smart voice command interpreter to push recharges to twice a day.

Conversely, we expect remote intelligent devices, for agriculture, grid, wildfire detection or infrastructure monitoring to be able to run for years before maintenance. Acceptable recharge rates for consumer devices would be completely unacceptable for remote or widely deployed IoT products .

AI in a car runs off the battery but now there are a lot more demands on those batteries from multiple ADAS sensors, intelligent entertainment options, navigation and driver monitoring systems. Adding to these multiple power demands cannot reduce a 300-mile range for an EV to 200-miles. Intelligent products must be as close as possible to invisible in the car power envelope.

And then there are competitive considerations. Inference AI is now commonly measured against inferences per watt per second. AI at the edge is a hugely competitive field so this metric must be optimized in every direction – inference rate (in frames per second for example) at the smallest possible power consumption.

The advantage of SOI technologies

I have written before about SiC substrates to enable power electronics for EVs and EV charging stations. SOITEC offerings also include SOI (silicon on insulator), POI (piezoelectric on insulator), and GaN (gallium nitride). Each builds on an insulation layer immediately below a thin semiconductor layer on which devices are patterned. This structure eliminates (or largely eliminates) the leakage through bulk silicon, a challenge which became limiting for mainstream semiconductor processes.

Other technologies have been developed, such as FinFET, to reduce leakage though in different ways. However those processes are more complex, resulting in higher wafer costs and therefore unit device costs.

Architects and firmware designers can also minimize leakage by turning off sections of a chip when not active. This method is effective, but design requires great care to ensure that dependencies between different aspects of functionality in the chip can be cleanly separated. If shortly after turning off a powered-down section it must turn on again to service some overlooked requirement, no power is really saved. Worse still, powering down and powering back up takes time, first in delays to turn off to allow time for dependent functions to complete. And later when turning back on to first recover to the same internal state in the function right before it powered down. All this overhead adds latency and reduces true performance for the device.

SOI technologies with inherently very low leakage can more fully exploit conventional sleep modes such as clock gating and DVFS than can non-SOI technologies. These techniques result in much simpler and lower latency demands on transitions between sleep and wake modes. And because the process is less complex than other advanced processes, SOI is intrinsically more efficient in inferences/watt/$.

Interested? You can learn more HERE.


2024 Outlook with Cristian Amitroaie, Founder and CEO of AMIQ EDA

2024 Outlook with Cristian Amitroaie, Founder and CEO of AMIQ EDA
by Daniel Nenni on 02-07-2024 at 10:00 am

AMIQ EDA DVT Eclipse

SemiWki has been working with AMIQ EDA for more than four years now and it has been quite the education. AMIQ EDA is a company that specializes in providing development and verification solutions for digital design and verification teams in the semiconductor industry. They offer a range of products and services aimed at improving productivity, efficiency, and quality in the design and verification process.

AMIQ EDA’s tools are widely used by semiconductor companies, design houses, and verification teams worldwide to streamline their development and verification processes, reduce time-to-market, and ensure the reliability of their designs.

Tell us a little bit about your company.
 We are an EDA company providing software tools targeting both chip design and chip verification. Our tools enable engineers to increase the speed and quality of new code development, simplify debugging and legacy code maintenance, accelerate language and methodology learning, improve testbench reliability, extract automatically accurate documentation, and implement best coding practices.

What was the most exciting high point of 2023 for your company?
As my co-founders mentioned in an interview with you in July, 2023 was the twentieth anniversary of AMIQ, consisting of AMIQ EDA and AMIQ Consulting. Although lots of great things happened last year, our celebration stands out the most. We have wonderful customers, and we are honored that they have been so supportive for more than two decades.

What was the biggest challenge your company faced in 2023?
There were really three challenges:

  • Continuing to provide strong customer support as our user base increased significantly
  • Maintaining quality as the number of our products, features, and use models grew
  • Hiring the right people to deliver on our product evolution, quality, and support

How is your company’s work addressing this biggest challenge?
For customer support, we’re investing in leveraged assets such as more intuitive user interfaces, more detailed documentation, and demo movies showing how to use our tools. We increased our investment in product quality by growing our QA team and enhancing our regression test suites. On the hiring side, we’ve found that an extensive internship program is a great way to find and train the best engineers.

What do you think the biggest growth area for 2024 will be, and why?
Our Design and Verification Tools (DVT) Integrated Development Environment (IDE) will remain our flagship product, but use of our other tools has been growing rapidly. Our Verissimo SystemVerilog linter has been widely adopted as people realize that the minimal code checking done by other tools is insufficient for enduring quality and correctness. We’re also seeing increased interest in our Specador documentation generator.

How is your company’s work addressing this growth?
We’re always adding more features to DVT IDE, in parallel on both the Visual Studio (VS) Code and Eclipse platforms. Verissimo is evolving at a rapid pace as we offer dozens of new rules every year, many of them suggested by our users. In addition, we have a major new release of Specador offering more ways to autogenerate high-quality documentation from user code.

What conferences did you attend in 2023 and how was the traffic?
We were glad to be able to return to in-person events last year. We exhibited at the Design Automation Conference (DAC) in the U.S., the Design and Verification Conference (DVCon) in the U.S. and Europe, and ChipEX in Israel. Traffic was generally quite good, although I doubt that we will ever get back to the “good old days” of bigger travel budgets and no pandemic concerns.

Will you attend conferences in 2024? Same or more?
At this point, we are planning to attend the same events. For us, conferences are less about generating new leads and more about connecting face-to-face with our users. We’re always prepared to show demos of new features and provide on-the-spot customer support. It’s great to see old friends and meet new ones, so I think that conferences will continue to be important for us.

Additional questions or final comments?
2023 was a truly great year for AMIQ EDA, and I have every expectation that 2024 will be outstanding as well. We’ll continue to be very busy enhancing our products and keeping up with new versions of the many standards we support. I’ll keep you updated with our regular chats. Thank you for the chance to share our thoughts.

Also Read:

Using Linting to Write Error-Free Testbench Code

AMIQ: Celebrating 20 Years in Consulting and EDA

A Hardware IDE for VS Code Fans


Application-Specific Lithography: Avoiding Stochastic Defects and Image Imbalance in 6-Track Cells

Application-Specific Lithography: Avoiding Stochastic Defects and Image Imbalance in 6-Track Cells
by Fred Chen on 02-07-2024 at 6:00 am

Application Specific Lithography

The discussion of any particular lithographic application often refers to imaging a single pitch, e.g., 30 nm pitch for a 5nm-family track metal scenario. However, it is always necessary to confirm the selected patterning techniques on the actual use case. The 7nm, 5nm, or 3nm 6-track cell has four minimum pitch tracks, flanked by larger width lines for ground and power rails. Figure 1 shows how a uniform 30 nm pitch exposure would lead to aggravated stochastic defect locations. When the illumination gives rise to fewer diffraction orders, a valley appears where we expect the rail peak, while image intensity imbalance occurs among the four inner trenches when more diffraction orders are included [1].

Figure 1. 30 nm pitch 6-track cell with exposed trenches (0.33NA EUV). The illumination angle (left) strongly affects both the optical image (center) and the expected stochastic defect location (right). The red circles indicate the stochastic defect hot spot locations.

When using a more absorbing metal oxide resist, unexposed trenches can be patterned. However, the aggravated stochastic defect locations are still present, and the image imbalance is worse, with pitch walking also evident (Figure 2).

Figure 2. 30 nm pitch 6-track cell with unexposed trenches (0.33NA EUV). The illumination angle (left) strongly affects both the optical image (center) and the expected stochastic defect location (right). The red circles indicate the stochastic defect hot spot locations. Red arrows indicate pitch walking (shift of peak positions).

The High-NA EUV system does not change the outcome [1], and is also not available. To avoid the above issues, the only one-mask solutions for patterning four 30 nm pitch tracks with the two large rails would be EUV Self-Aligned Double Patterning (SADP) and DUV Self-Aligned Quadruple Patterning (SAQP), starting with the same core cell pitch. The EUV-DUV difference of complexity and cost far exceeds the SAQP-SADP difference of processing complexity and cost, since SAQP has already long matured on mature tools [2,3]. The expected spacer layout and arrangement for the SAQP approach are shown in Figure 3.

Figure 3. Spacer layout and arrangement for DUV SAQP for the 6-track cell. The blue and red lines would be cut or trimmed separately.

The SAQP would then be followed by applying a cut mask at least twice, each time on alternating lines. The same dual cut mask approach has been applied as part of the well-known Self-Aligned Litho-Etch-Litho-Etch (SALELE) approach used with EUV, which uses four EUV masks in total [4]. The LELE EUV masks may also be substituted by DUV LELE with SADP at lower cost, though up to 4 extra DUV masks may be needed [5].

References

[1] F. Chen, “6-Track Cell Imaging in Low-NA and High-NA EUV Lithography,” https://www.youtube.com/watch?v=Z9MQuKrqLYw

[2] L-A. Ragnarsson et al., “The Environmental Impact of CMOS Logic Technologies,” 2022 EDTM.

[3] L. Liebmann et al., The daunting complexity of scaling to 7NM without EUV: Pushing DTCO to the extreme,” Proc. SPIE 9427, 942702 (2015).

[4] R. Venkatesan et al., Direct print EUV patterning of tight pitch metal layers for Intel 18A process technology node,” Proc. SPIE 12292, 1229202 (2022).

[5] F. Chen, https://www.linkedin.com/pulse/extension-duv-multipatterning-toward-3nm-frederick-chen; F. Chen, https://www.linkedin.com/pulse/beol-mask-reduction-using-spacer-defined-vias-cuts-frederick-chen

This article first appeared in LinkedIn Pulse: Application-Specific Lithography: Avoiding Stochastic Defects and Image Imbalance in 6-Track Cells

Also Read:

Non-EUV Exposures in EUV Lithography Systems Provide the Floor for Stochastic Defects in EUV Lithography

Application-Specific Lithography: Sense Amplifier and Sub-Wordline Driver Metal Patterning in DRAM

Is Intel cornering the market in ASML High NA tools? Not repeating EUV mistake


2024 Outlook with Thomas Gerner Nørgaard, Founder Comcores

2024 Outlook with Thomas Gerner Nørgaard, Founder Comcores
by Daniel Nenni on 02-06-2024 at 10:00 am

TGN Head View

SemiWiki has been working with Comcores for two years. They are very active in the semiconductor ecosystem and highly regarded.

Comcores specializes in providing digital intellectual property (IP) solutions and design services for communication and networking technologies. They focus on developing and delivering IP cores, which are pre-designed and pre-verified building blocks of digital systems, to help companies accelerate their product development in areas such as wireless communication, networking, and digital signal processing.

Comcores’ offerings often include IP cores for technologies like Ethernet, optical networking, 5G, and other communication standards. These cores are designed to be integrated into system-on-chip (SoC) solutions, helping companies reduce development time and costs while still meeting the requirements of modern communication systems.

Tell us a little bit about yourself and your company:
My name is Thomas Nørgaard, and I am a serial entrepreneur, with a keen interest in advanced technology. I founded Comcores in 2014, after my first venture Radiocomp. At Comcores, we are driven by creating technologies to enable the future. Our focus is to develop digital IP components & solutions that help reduce the barrier to developing new solutions by easy access to complex technology, lowering the total cost of integrating such functionality into new projects and providing the convenience of using a quality proven, interoperability tested and silicon agnostic solution.

What was the most exciting high point of 2023 for your company?
2023 was a very active and exciting year for us at Comcores. We worked on new complex projects within Time Sensitive Networking solutions and launched the new JESD204D IP. We are proud to be leading these areas and look forward to working with our customers in integrating these complex technologies.

What was the biggest challenge your company faced in 2023?
The continuous development of the TSN standards has been a difficult area to prioritize from a product development perspective for us. There are many standards and many profiles to account for and we want to make sure that our Ethernet switching solutions are meeting the latest profiles and features within this domain. Likewise, the software orchestration of these systems has been an area of intensive research.

How is your company’s work addressing this biggest challenge?
Comcores has launched multiple streams of development to meet the many profiles of TSN under development and has invested in expanding our teams with engineers having expertise in this field. To orchestrate these systems Comcores also has developed its first version of a Centralized Network Controller to handle the QoS policies in the TSN networks.

What are your expectations for 2024 and your plans for the trends?
2024 will hold a lot of exciting product launches that will contribute to anchoring our status as a leader of IP solutions in our respective areas. Ethernet Solutions is a particular area of interest where we will launch many new solutions with an enhanced content of software. Likewise, we will continue to launch support for new standards and features within JESD, Ethernet, MIPI and eCPRI. We have a lot to look forward to in 2024, and we see it being a fantastic year. We are perfectly poised to support our customers in developing their new solutions and help mature them.

About Comcores
We are a key supplier of digital IP Cores and solutions with a focus on EthernetWireless and Chip-to-chip interfaces. We offer both  Stand-Alone IP components and Ethernet systems for ASIC & FPGA. Our solutions can be customized to meet your design specifications. By purchasing our IPs you drastically reduce your product cost, risk, and time to market. We enable you to focus on your competences.

We pride ourselves on providing the best-in-class, quality IP components and systems to ASIC, FPGA, and System vendors. Our core competence is the development and thorough validation of the IPs. 

Comcores, headquartered north of Copenhagen in Kgs. Our long-term background in mobile communication and being a first-mover in remote radio heads along with expertise in wireless networks gives us a solid foundation for understanding the complex requirements of modern communication tasks.

This know-how coupled with 40+ dedicated coworkers / employees/ professionals help us define and build state-of-the-art high-quality solutions.

Also Read:

WEBINAR: Understanding TSN and its use cases for Aviation, Aerospace and Defence

JESD204D: Expert insights into what we Expect and how to Prepare for the upcoming Standard

WEBINAR: O-RAN Fronthaul Transport Security using MACsec


proteanTecs Addresses Growing Power Consumption Challenge with New Power Reduction Solution

proteanTecs Addresses Growing Power Consumption Challenge with New Power Reduction Solution
by Mike Gianfagna on 02-06-2024 at 6:00 am

proteanTecs Addresses Growing Power Consumption Challenge with New Power Reduction Solution

proteanTecs is a unique company, delivering electronics visibility from within. Its core mission is to enable the electronics industry to continue to scale. The company achieves this goal by first embedding on-chip monitors, called Agents, during the design process to generate deep data on the chip’s profiling, health, and performance. Machine-learning algorithms process this on-chip data throughout the device’s lifecycle, in both test and mission modes. Users gain deep data analytics with actionable insights and alerts on a cloud-based platform with edge applications on the automated test equipment (ATE) or embedded on the board itself.

It’s well-known that power optimization is a huge and growing problem across many markets, so the application of this unique technology to this problem holds great promise. Read on to learn how proteanTecs is addressing the power consumption challenge.

Overview of the Power Reduction Solution

Recently, proteanTecs announced a new power reduction solution aimed at high-performance markets. Using its proven technology, chip makers and system operators can now optimize power and performance without the risk of system failure. This unique capability uses on-chip telemetry, machine learning and predictive analytics to enable workload-aware system-on-chip (SoC) power reduction during production testing and in-field operations. 

For in-field power savings, proteanTecs introduced AVS Pro™,  a real-time application for functional-workload aware adaptive voltage scaling (AVS). Based on timing margin Agents, AVS Pro leverages excessive guard-bands to reduce power while guaranteeing failure prevention. This capability is silicon-proven in leading-edge technologies and has enabled customers to reduce power consumption by an average of 8-14%.

For power reduction during production, proteanTecs offers prediction-based VDDmin optimization per individual chip and system, with deep data analytics for process grading. These applications are deployed on the tester with advanced analysis on the proteanTecs cloud platform. Partnering with leading ATE vendors, parametric power and performance visibility for inline decision making is enabled.

The technology finds application across a broad range of reliability-critical markets, such as cloud computing, mobile, telecommunications and automotive. The figure below provides an overview of how the pieces fit together.

Case Study of Use in a Real Design

Results in a real design project are the most compelling proof for any new optimization technology. proteanTecs has made a detailed case study available to demonstrate impact. Some key details and achievements disclosed in this case study include:

  • The customer is a fabless chipmaker making 5nm networking chips for datacenters
  • The challenge faced by this customer was high power consumption due to excessive voltage guard-bands
  • Using proteanTecs AVS Pro, power optimization with a safety-net was achieved in real-time
  • The result was a 12.5% dynamic power reduction which translates into more than $5M per year energy cost savings for hyperscale cloud vendors
  • An 11% performance increase was also achieved because of a higher utilization rate per system

There is more to this impressive story. You can download a complete copy of the case study here.

To Learn More about proteanTecs AVS Pro

Application-specific power performance optimization based on chip telemetry embodies many moving parts to realize the complete solution. The proteanTecs’ AVS Pro application monitors the margin to timing failure of millions of real paths, in real time, under real workloads, to reduce voltage to the lowest point that still allows error-free functionality. It also provides an inherent safety-net to prevent failures when events like voltage drops occur, while enabling fast frequency and voltage scaling.

The company has published a comprehensive white paper that dives into the details of how its technologies are combined to deliver these results. The piece covers the power, performance, reliability equilibrium that can be achieved with properly developed guard bands. The various approaches to dynamic power management are also discussed. The AVS Pro solution is explained in detail to illustrate how significant power reduction can be achieved. You can download your copy of this very informative white paper here.

Calculate Your Savings

If you visit the power reduction solution web page, there is a calculator to help you estimate the improvements that are possible for CPU, GPU and AI accelerator chips in the datacenter. If power optimization is a concern for a current or next design, I highly recommend you check out the savings that are possible. 

Also Read:

Fail-Safe Electronics For Automotive

Building Reliability into Advanced Automotive Electronics

Unlocking the Power of Data: Enabling a Safer Future for Automotive Systems


2024 Outlook with Toshio Nakama of S2C

2024 Outlook with Toshio Nakama of S2C
by Daniel Nenni on 02-05-2024 at 10:00 am

Precision Chip Strategy, PCS

Tell us a little bit about yourself and your company.
I am Toshio Nakama, the founder and CEO of S2C and a strong advocate of FPGA accelerated ASIC/SoC design methodology. I first started my career at Altera as an FAE and served in technical and sales management roles at Aptix Corporation. I co-founded S2C in Silicon Valley in 2003 and established R&D and manufacturing teams in Shanghai, China in 2004.

S2C is a leading global supplier of digital EDA solutions for today’s innovative SoC and ASIC designs, now with the second largest share of the global prototyping market. S2C has been successfully delivering rapid SoC prototyping solutions for 20 years.

With over 600 customers, including 6 of the world’s top 10 semiconductor companies, our world-class engineering team and customer-centric sales team are experts at addressing our customer’s SoC and ASIC verification needs. S2C has offices and sales representatives in the US, Europe, mainland China, Hong Kong, Korea and Japan.

What was the most exciting high point of 2023 for your company?
Our 20th Anniversary! An exciting time for the company. Also, new products coming including OminiArk emulation, PegaSim simulation, and Claryti debugger

What was the biggest challenge your company faced in 2023?
New applications  and new technologies are coming quickly. In terms of new applications, the industry is experiencing growth in various areas, including market expansion and the emergence of technologies like RISC-V, Chiplet, and AI. New technology trends, including fresh architectures, evolving standards, changing requirements, and innovative ideas, continue to push the industry ahead.

How is your company’s work addressing this biggest challenge?
Delivering solutions tailored to meet customer demands for new technologies and applications. Collaborating with environmentally conscious partners to create a mutually beneficial ecosystem.

What do you think the biggest growth area for 2024 will be, and why?
New applications and technologies will be the primary growth area in 2024. Chiplets and AI specifically and newly developed IP such as RISC-V and the many variations. We are also seeing growth in the ARM ecosystem. With software being a barrier for systems companies prototyping is even more important so software can be developed in concert with hardware. 2024 will definitely be a growth year.

How is your company’s work addressing this growth?
The recently introduced S2C Precision Chip Strategy:

Heterogeneous verification method accelerates large-scale digital circuit, boosting user productivity. By seamlessly combining various products line, S2C empowers designers to tackle complex challenges more efficiently, ultimately leading to more robust and optimized designs cyclical.

Parallel Drive & Shift-left Method. S2C assists our valued customers in two crucial aspects of their projects: designing the right chip and designing the chip right.

What conferences did you attend in 2023 and how was the traffic?
We were very active in conferences around the world. DAC and DVCon are a long tradition with our company. We are also participating in RISC-V conferences and other regional events. In 2024 we expect even more conference activity around the world with much higher attendance. It should be a very big growth year for S2C and the semiconductor industry.

Final Comment?
Thank you very much for this opportunity. SemiWiki  is a valued partner we look forward to seeing you again at DVCon Next month.

Also Read:

Prototyping Chiplets from the Desktop!

S2C’s FPGA Prototyping Accelerates the Iteration of XiangShan RISC-V Processor

ViShare’s Rapid Market Entry with FPGA-Based Prototyping Solution from S2C