IMEC is a technology research center located in Belgium that is one of the premier semiconductor research centers in the world today. The IMEC Technology Forum (ITF) is a two-day event attended by approximately 1,000 people to showcase the work done by IMEC and their partners.… Read More
Tag: euv
IMEC Technology Forum (ITF) – Moving the Electronics Industry Forward
IMEC is a technology research center located in Belgium that is one of the premier semiconductor research centers in the world today. The IMEC Technology Forum (ITF) is a two-day event attended by approximately 1,000 people to showcase the work done by IMEC and their partners.
Gary Patton is the Chief Technical Officer and Senior… Read More
IMEC Technology Forum (ITF) – EUV When, Not If
For me personally EUV has been something of a roller coaster ride over the last several years. I started out a strong believer in EUV but then at the SPIE Advanced Lithography Conference in 2014 TSMC gave a very negative assessment of EUV, and there was a SEMATECH paper on high NA EUV that struck me as extremely unlikely to succeed. I … Read More
SPIE – Interview with Greg Mcintyre of IMEC
One of the things I really like about major technical conferences is the opportunity to meet with people for networking and interviews. On Wednesday at the Advanced Lithography Conference I had the opportunity to interview Greg Mcinttyre, the director of advanced patterning at IMEC.
IMEC researchers are the first author on 32… Read More
Intel EUV Photoresist Progress and ASML High NA EUV
SPIE Days 3 and 4:
Anna Lio of Intel presented EUV resists: What’s next?
Intel wants to insert EUV at 7nm but it has to be ready and economical. Critical Dimension Uniformity (CDU), Line Width Roughness (LWR) and edge placement/stochastics are all stable on 22nm, 14nm and 10nm pilot lines.… Read More
ASML and IMEC EUV Progress
Day 1 of the SPIE conference featured a number of customer updates on the status of their EUV programs. On Tuesday morning we got to hear ASML’s update on their work.… Read More
TSMC and Intel on the Long Road to EUV
Today is the first day of the SPIE Advanced Lithography Conference and Extreme Ultraviolet (EUV) updates were a big focus.… Read More
5nm Chips? Yes, but When?
For any invention, technical proof of concept or prototyping happens years ahead of the invention being infused into actual products. When we talk about 5nm chip manufacturing, a test chip was already prototyped in last October, thanks to Cadence and Imec. Details about this chip can be found in a blog at Semiwiki (link is given … Read More
Coventor ASML IMEC: The last half nanometer
On Tuesday evening December 8[SUP]th[/SUP] at IEDM, Coventor held a panel discussion entitled the “The last half nanometer”. Coventor is a leading provider of simulation software used to design processes. This is my third year attending the Coventor panel discussion at IEDM and they are always excellent with very strong panels… Read More
EUV sees further delays?
Headwinds which will likely continue into 2016…
ASML reported revenues of 1.55B Euros with EPS of 0.75 Euros more or less in line with expectations. Orders were the weak spot, falling to 904M Euros versus the previous Q2 orders of 1.523B Euros. The company guided Q4 revenues to be down about 10% to 1.4B Euros below current flattish… Read More