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		The time is nigh for another meeting of the practitioners of the lithographic arts, dark and otherwise, at the SPIE Advanced Lithography symposium. 
I love this conference for the engagement you see, both in the sessions and in the hallways. People actually meet and talk and argue. There’s always interesting gossip, exciting technologies,… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		Cadence’s Signoff Summit will be held next  week, November 21 at Cadence in San Jose. 
 This is the first of a series of all-day Signoff Summits from  Cadence that focus on the multiple facets of design signoff. This first  summit will include keynote addresses plus sessions covering the  multiple solution components that comprise… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		One of the best things about being part of SemiWiki is the exposure to new technologies and the people behind them. SemiWiki now works with more than 35 companies and I get to spend time with each and every one of them. Much like I do, IROC Technologies works closely with the foundries and the top semiconductor companies so it was a pleasure… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		FinFETs are hot, carbon nanotubes are cool, and collaboration is the key to continued semiconductor scaling. These were the main messages at the 2013 Common Platform Technology Forum in Santa Clara. 
The collaboration message ran through most presenations, like the afternoon talk by Subi Kengeri of GLOBALFOUNDRIES and Joe Sawicki… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		Design For Manufacturing (DFM) is the art and science of making an IC design yield better in order to receive a higher ROI. Ian Smith, an AE from Mentor in the Calibre group presented a pertinent webinar, IP Scoring Using TSMC DFM Kits. I’ll provide an overview of what I learned at this webinar.… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		Wanna become the double patterning guru at your company? David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. For designers struggling to understand the complexity and nuances of double patterning,… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		In the embedded world that drives much of today’s ASIC innovation, there is no bigger name than ARM.  Not to enter the ARM vs. Intel fray, but it’s no exaggeration to say that ARM’s impact on SoCs is as great as Intel’s on the PC.  Few cutting edge SoCs are coming to market that do not include some sort of embedded… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		Have you seen the latest design rule manuals? At 28nm and 20nm design sign-off is no longer just DRC and LVS. These  basic components of physical verification are being augmented by an  expansive set of yield analysis and critical feature identification  capabilities, as well as layout enhancements, printability, and  performance… Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		
Yield, no topic is more important to the semiconductor ecosystem. After spending a significant part of my career on Design for Manufacturability (DFM) and Design for Yield (DFY), I’m seriously offended when semiconductor professionals make false and misleading statements that negatively affects the industry that … Read More 
	 
	
	
	
		
	
		
			
		
	
	
		
		
	
	
	
		Although design for manufacturing (DFM) tools and techniques have been around for several nodes, a lot of designers remain skeptical about their actual value, especially since many products still make it successfully to market without the use of DFM.… Read More