Yesterday Mentor announced their quarterly results. Since their financial year is not aligned with the calendar year, this was also the end of their fiscal 2015. The quarter was an all-time record with revenues of $439M and (non-GAAP) EPS of $1.09. The year was also an all-time record with revenues of $1.24B and EPS of $1.77. Half… Read More
Place & route in the 16/14nm era requires a new approach since it is significantly more complex. Of course, every process generation is more complex than the one before and the designs are bigger. But modern processes have new problems. The two biggest changes are FinFETs and double patterning.
FinFETs, as I assume you know,… Read More
In my career in semiconductor industry, I can recall, in the beginning there was emphasis on design completion with automation as fast as possible. The primary considerations were area and speed of completion of a semiconductor design. Today, with unprecedented increase in multiple functions on the same chip and density of the… Read More
Even though I live just 7 miles away from the Mentor Graphics corporate office in Oregon, I visited their DAC suite in San Francisco last week to get an update on Calibrefrom Michael White. The Calibre tools are used during IC verification and sign-off by performing DRC (Design Rule Checking) and LVS (Layout Versus Schematic).… Read More
I think by now a lot has been said about the necessity of multi-patterning at advanced technology nodes with extremely low feature size such as 20nm, because lithography using 193nm wavelength of light makes printing and manufacturing of semiconductor design very difficult. The multi-patterning is a novel semiconductor manufacturing… Read More
Most IC engineers learn best by hands-on experience when another more experienced person can show us what to do. If you cannot find that experienced person, then the next best thing is a video from an expert. I was surprised to find out that video was so important today that the #2 most viewed web site on the Internet was www.youtube.com… Read More
I met with Tom Quan of TSMC and Michael Beuler-Garcia of Mentor last week. Weirdly, Mentor’s newish buildings are the old Avant! buildings where I worked for a few weeks after selling Compass Design Automation to them. Odd sort of déja vu. Historically, TSMC has operated with EDA companies in a fairly structured way: TSMC … Read More
At advanced nodes, design rules are necessarily more complex and restrictive. Although most of the time you can find a way to live with them, sometimes it’s necessary to seek a waiver from the foundry for a particular design feature. This involves documenting the feature, the design rules in question and the conditions under which… Read More
Layout editing is a complex task, traditionally done manually by designers, and the layout design productivity largely depends on the designer’s skills and expertise. However, a good tool with features for ease of design is a must. Layout productivity has been an area of focus and various features are constantly being added in… Read More
I could have written the sequence of the title in reverse order, but no, design is the one which initiates the need of a particular flow and the flow needs support of EDA tools to satisfy that need. It’s okay if the design is small; some manual procedures and workarounds/scripts may be able to perform certain jobs. However, as the design… Read More
