Standard Node Trend

Standard Node Trend
by Scotten Jones on 07-15-2017 at 4:00 pm

I have previously published analysis’ converting leading edge logic processes to “standard nodes” and comparing standard nodes by company and time. Recently updated details on the 7nm process node have become available and in this article, I will revisit the standard node calculations and trends.… Read More


SPIE 2017 – ASML Interview and Presentations

SPIE 2017 – ASML Interview and Presentations
by Scotten Jones on 04-19-2017 at 7:00 am

At the SPIE Advanced Lithography conference I sat down with Mike Lercel, Director of Strategic Marketing for ASML for an update. ASML also presented several papers at the conference and I attended many of these. In this article, I will discuss my interview with Mike and summarize the ASML presentations.… Read More


SPIE 2017 ASML and Cadence EUV impact on place and route

SPIE 2017 ASML and Cadence EUV impact on place and route
by Scotten Jones on 04-13-2017 at 7:00 am

As feature sizes have shrunk, the semiconductor industry has moved from simple, single-exposure lithography solutions to increasingly complex resolution-enhancement techniques and multi-patterning. Where the design on a mask once matched the image that would be produced on the wafer, today the mask and resulting image … Read More


Intel Manufacturing Day: Nodes must die, but Moore’s Law lives!

Intel Manufacturing Day: Nodes must die, but Moore’s Law lives!
by Scotten Jones on 03-29-2017 at 4:00 pm

Yesterday I attended Intel’s manufacturing day. This was the first manufacturing day Intel has held in three years and according to Intel their most in depth ever.

Nodes must die
I have written several articles comparing process technologies across the leading-edge logic producers – GLOBALFOUNDRIES, Intel, Samsung… Read More


An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes

An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes
by Scotten Jones on 02-28-2017 at 12:00 pm

At the ISS Conference in January, An Steegen EVP of Semiconductor Technology & Systems at imec gave a talk entitled “Patterning Options for Advanced Technology Nodes”. I was present for her talk and had the opportunity to have a follow up interview with An.… Read More


EUV is NOT Ready for 7nm!

EUV is NOT Ready for 7nm!
by Daniel Nenni on 02-27-2017 at 8:00 am

The annual SPIE Advanced Lithography Conference kicked off last night with vendor sponsored networking events and such. SPIE is the international society for optics and photonics but this year SPIE Advanced Lithography is all about the highly anticipated EUV technology. Scotten Jones and I are at SPIE so expect more detailedRead More


The post election Semicap bubble just burst in one day

The post election Semicap bubble just burst in one day
by Robert Maire on 12-04-2016 at 12:00 pm

Back to a more normal reality… Market gets”De-Fanged”… Where to from here? The “Icarus” Effect… Much of the market, and especially Tech & “FANG” (Facebook, Amazon, Netflix & Google) stocks gave back most all of their post election day gains in one session.Read More


AMAT LRCX and EUV Economics

AMAT LRCX and EUV Economics
by Robert Maire on 11-23-2016 at 7:00 am

Lam & Applied talked about “sustainable” growth Both expect share gains & growth in a flattish market. We examine the “new, lower, cyclicality”. Although Applied and Lam are fierce competitors , coming at things from different directions, they sounded awfully similar last week.
Read More


EUV transition comes into focus

EUV transition comes into focus
by Robert Maire on 11-04-2016 at 12:00 pm

We attended ASML’s analyst day in New York on Halloween. We were very impressed with the quality, content and clarity of the presentations and thought it was one of the best strategic positioning presentations we have seen in the semi industry. We also had an opportunity to meet with several members of senior management afterRead More


What is the impact of missing the 7NM node with EUV?

What is the impact of missing the 7NM node with EUV?
by Robert Maire on 10-23-2016 at 12:00 pm

ASML reported a quarter that was slightly below expectations coming in at Euro 1.815B in revenues and Euro 0.93 EPS. Orders were a bit soft at Euro 1.4B but well within the normal quarterly variation of a lumpy business. Euro 28M was lost in a currency adjustment associated with the Hermes acquisition.

The guidance for Q4 was between… Read More