Last quarter we said that AMAT got its mojo back and it appears to have even picked up speed going into the end of a strong year.
The display business which had been less than reliable in years past has come up with back to back home runs. Applied is growing both its top and bottom line at well above the sluggish market rates and is clearly… Read More
On Tuesday morning at SEMICON I had the opportunity to sit down with Harry Levinson, Sr. Director of Technology Research and Sr. Fellow at Global Foundries and Michael Lercel, Director of Strategic Marketing at ASML to discuss the state of lithography.
I opened the discussion with a question about how we are going to address lithography… Read More
Stocks will likely be flattish on reduced news (KLAM, AMAT, UTEK, INTC, ASML & Hermes). From a Wall St perspective, this year will likely be one of the quietest Semicons in a while as all three major players, AMAT, LRCX & KLAC have no scheduled investor events. … Read More
Cheap versus year ago but expensive on fundementals – Net negative for KLAC/LRCX & AMAT. ASML bought Hermes Microvision for much the same reason as the Cymer acquisition – to support EUV. ASML could have made a counter offer for KLAC (as we had suggested previously) but this obviously would have been much more expensive… Read More
For me personally EUV has been something of a roller coaster ride over the last several years. I started out a strong believer in EUV but then at the SPIE Advanced Lithography Conference in 2014 TSMC gave a very negative assessment of EUV, and there was a SEMATECH paper on high NA EUV that struck me as extremely unlikely to succeed. I … Read More
SPIE Days 3 and 4:
Anna Lio of Intel presented EUV resists: What’s next?
Intel wants to insert EUV at 7nm but it has to be ready and economical. Critical Dimension Uniformity (CDU), Line Width Roughness (LWR) and edge placement/stochastics are all stable on 22nm, 14nm and 10nm pilot lines.… Read More
Day 1 of the SPIE conference featured a number of customer updates on the status of their EUV programs. On Tuesday morning we got to hear ASML’s update on their work.… Read More
Today is the first day of the SPIE Advanced Lithography Conference and Extreme Ultraviolet (EUV) updates were a big focus.… Read More
On Tuesday evening December 8[SUP]th[/SUP] at IEDM, Coventor held a panel discussion entitled the “The last half nanometer”. Coventor is a leading provider of simulation software used to design processes. This is my third year attending the Coventor panel discussion at IEDM and they are always excellent with very strong panels… Read More
When I first moved to Oregon in 1978 the largest industry was forestry, but then the endangered Spotted Owl was found and that put an end to many forestry companies and decimated the economy of many rural cities. Strangely enough it turns out that the Spotted Owl was found in great numbers across multiple states, so it never should’ve… Read More