Leading Edge Logic Landscape 2018

Leading Edge Logic Landscape 2018
by Scotten Jones on 03-16-2018 at 2:00 pm

The most viewed blogs I write for SemiWiki are consistently blogs comparing the four leading edge logic producers, GLOBALFOUNDRIES (GF), Intel, Samsung (SS) and TSMC. Since the last time I compared the leading edge new data has become available and several new processes have been introduced. In this blog I will update the current… Read More


LithoVision 2018 The Evolving Semiconductor Technology Landscape and What it Means for Lithography

LithoVision 2018 The Evolving Semiconductor Technology Landscape and What it Means for Lithography
by Scotten Jones on 02-25-2018 at 5:00 pm

I was invited to present at Nikon’s LithoVision event held the day before the SPIE Advanced Lithography Conference in San Jose. The following is a write up of the talk I gave. In this talk I discuss the three main segments in the semiconductor industry, NAND, DRAM and Logic and how technology transitions will affect lithography.… Read More


IEDM 2017 – Controlling Threshold Voltage with Work Function Metals

IEDM 2017 – Controlling Threshold Voltage with Work Function Metals
by Scotten Jones on 01-26-2018 at 7:00 am

As I have said many times, IEDM is one of the premier conferences for semiconductor technology. On Sunday before the formal conference started I took the “Boosting Performance, Ensuring Reliability, Managing Variation in sub-5nm CMOS” short course. The second module in the course was “Multi-Vt Engineering… Read More


IEDM 2017 Preview

IEDM 2017 Preview
by Scotten Jones on 10-20-2017 at 7:00 am

The 63rd annual IEDM (International Electron Devices Meeting) will be held December 2nd through 6th in San Francisco. In my opinion IEDM is one of, if not the premier conference on leading edge semiconductor technology. I will be attending the conference again this year and providing coverage for SemiWiki. As a member of the press… Read More


Standard Node Trend

Standard Node Trend
by Scotten Jones on 07-15-2017 at 4:00 pm

I have previously published analysis’ converting leading edge logic processes to “standard nodes” and comparing standard nodes by company and time. Recently updated details on the 7nm process node have become available and in this article, I will revisit the standard node calculations and trends.… Read More


Exclusive – GLOBALFOUNDRIES discloses 7nm process detail

Exclusive – GLOBALFOUNDRIES discloses 7nm process detail
by Scotten Jones on 07-08-2017 at 7:00 am

In a SemiWiki EXCLUSIVE – GLOBALFOUNDRIES has now disclosed the key metrics for their 7nm process. As I previously discussed in my 14nm, 16nm, 10nm and 7nm – What we know now blog GLOBALFOUNDRIES licensed their 14nm process from Samsung and decided to skip 10nm because they thought it would be a short-lived node. At … Read More


Samsung Details Foundry Roadmap

Samsung Details Foundry Roadmap
by Scotten Jones on 06-09-2017 at 10:00 am

Samsung recently held a meeting where they laid out a detailed roadmap for their foundry business. On Tuesday June 1st, Daniel Nenni and myself had an interview with Kelvin Low, senior director of foundry marketing and business development to discuss the details of Samsung’s plans.… Read More


It’s Time to Stop Thinking in Two Dimensions

It’s Time to Stop Thinking in Two Dimensions
by Tom Simon on 05-03-2017 at 12:00 pm

The first transistor was made of two electrodes, held in place by plastic, making contact with a piece of doped germanium. Ever since then, devices and their packaging have been performing a complicated and oftentimes intricate dance. Single transistor devices became integrated circuits, and along the way separate IC’s were… Read More


SPIE 2017 – imec papers and interview

SPIE 2017 – imec papers and interview
by Scotten Jones on 04-28-2017 at 12:00 pm

At the SPIE Advanced Lithography Conference imec published a number of papers on EUV, multi-patterning and other lithography issues. In addition to seeing several of the papers presented I had a chance to sit down with imec’s director of advanced patterning, Greg McIntyre. In this article I will summarize my discussions… Read More