The EDA & IP industry enjoys high growth for the Design IP segment, but a detailed analysis tool is missing. IPnest will address this need in 2017, expecting the IP vendors’ contribution! If we consider the results posted last March by the ESD Alliance, the EDA (and IP) industry is doing extremely well, as the global revenue has… Read More





SPIE 2017 ASML and Cadence EUV impact on place and route
As feature sizes have shrunk, the semiconductor industry has moved from simple, single-exposure lithography solutions to increasingly complex resolution-enhancement techniques and multi-patterning. Where the design on a mask once matched the image that would be produced on the wafer, today the mask and resulting image … Read More
Communication with Smart, Connected Devices and AI
I’ve lived and worked in Silicon Valley for 13 years, but since 1995 I’ve been in the Silicon Rainforest (aka Oregon) where the world’s number one semiconductor company Intel, has a large presence, along with dozens of smaller high-tech firms. In the past year I’ve started to attend events organized … Read More
Synchronizing Collaboration
Much though some of us might wish otherwise, distributed development teams are here to stay. Modern SoC design requires strength and depth in expertise in too many domains to effectively source from one site; competitive multi-national businesses have learned they can very effectively leverage remote sites by building centers… Read More
Calibre Can Calculate Chip Yields Correlated to Compromised SRAM Cells
It seems like I have written a lot about SRAM lately. Let’s face it SRAM is important – it often represents large percentages of the area on SOC’s. As such, SRAM yield plays a major role in determining overall chip yields. SRAM is vulnerable to defect related failures, which unlike variation effects are not Gaussian in nature. Fabrication… Read More
SPIE 2017: Irresistible Materials EUV Photoresist
Irresistible Materials (IM) is a spin-out of the University of Birmingham in the United Kingdom that has been doing research on Photoresist and Spin-On Carbon hard masks for 10 years, most recently with Nano-C on chemistry development. IM has developed a unique EUV photoresist and they are now looking for partners to help bring… Read More
TSMC Design Enablement Update
A couple of recent semiwiki articles reviewed highlights of the annual TSMC Technical Symposium recently held in Santa Clara (links here, here, and here). One of the captivating sessions at every symposium is the status of the Design Enablement for emerging technologies, presented at this year’s event by Suk Lee, Senior… Read More
Webinar: Chip-Package-System Design for ADAS
When thinking of ADAS from an embedded system perspective, it is tempting to imagine that system can be designed to some agreed margins without needing to worry too much about the details of the car environment and larger environment outside the car. But that’s no longer practical (or acceptable) for ADAS or autonomous systems.… Read More
The Driver in the Driverless Car
What is the likelihood that the people building Uber’s self-driving technologies did not know that their software was highly imperfect and could endanger lives if the cars were let loose on public streets? Or that employees of Theranos did not know that their equipment would produce inaccurate diagnostics?
San Francisco has … Read More
The Fate of Autonomous
The latest installment in the “Fast and Furious” franchise will debut bringing the concept of remote control of cars into the mainstream. Suffice it to say that remote control plays a major role in the script.
This will only be the latest chapter of a long-running effort to demonize autonomous vehicle technology in… Read More
Rapidus, IBM, and the Billion-Dollar Silicon Sovereignty Bet