Synopsys hosted a tutorial on the last day of DVCon USA 2022 on design/system dependability. Which here they interpret as security, functional safety, and reliability analysis. The tutorial included talks from DARPA, AMD, Arm Research and Synopsys. DARPA and AMD talked about general directions and needs, Arm talked about their… Read More


The Importance of Low Power for NAND Flash Storage
Even though we all know that reducing power consumption in NAND Flash Storage is a good idea, it is worthwhile to take a deeper dive into the underlying reasons for this. A white paper by Hyperstone, a leading developer of Flash controllers, discusses these topics providing useful insight into the problem and its solutions. The … Read More
Security Requirements for IoT Devices
Designing for secure computation and communication has become a crucial requirement across all electronic products. It is necessary to identify potential attack surfaces and integrate design features to thwart attempts to obtain critical data and/or to access key intellectual property. Critical data spans a wide variety… Read More
Designing a FinFET Test Chip for Radiation Threats
Much of the technology that goes into aerospace applications is some of the most advanced technology that exists. However, these same systems must also offer the highest level of reliability in what is arguably an extremely difficult environment. For semiconductors a major environmental risk in aerospace applications are … Read More
Bridging Analog and Digital worlds at high speed with the JESD204 serial interface
We are delighted to showcase our “Bridging Analog and Digital worlds at high speed with the JESD204 Serial Interface” webinar on April 20th, in case you missed the live webinar back in February 2022.
To meet the increased demand for converter speed and resolution, JEDEC proposed the JESD204 standard describing a new efficient … Read More
EUV Resist Absorption Impact on Stochastic Defects
Stochastic defects continue to draw attention in the area of EUV lithography. It is now widely recognized that stochastic issues not only come from photon shot noise due to low (absorbed) EUV photon density, but also the resist material and process factors [1-4].
It stands to reason that resist absorption of EUV light, which is … Read More
A Blanche DuBois Approach Won’t Resolve Traffic Trouble
Near the end of Tennessee Williams’ “A Streetcar Named Desire” the Blanche DuBois character, who has suffered a mental breakdown following an implied rape, tells the doctor and matron who have come to take her to the hospital: “Whoever you are – I have always depended on the kindness of strangers.” Sadly, this is the… Read More
Cadence and DesignCon – Workflows and SI/PI Analysis
DesignCon 2022 is back to a live conference, from Tuesday, April 5th through Thursday, April 7th, at the Santa Clara Convention Center.
Introduction
DesignCon is a unique gathering in our industry. Its roots incorporated a focus on complex design and analysis requirements of (long-reach) high-speed interfaces. Technical… Read More
Podcast EP69: Ayar Labs and the Future of Optical I/O
Dan is joined by Hugo Saleh, senior VP of commercial operations and managing director of Ayar Labs, UK. Hugo discusses the technology and application of optical I/O, its use and impact now and in the future.
The views, thoughts, and opinions expressed in these podcasts belong solely to the speaker, and not to the speaker’s employer,… Read More
DUV, EUV now PUV Next gen Litho and Materials Shortages worsen supply chain
-New PUV light source will push litho into Angstrom Era
-Rare earth elements shortages add to supply chain woes
-Could strategic wafer reserve releases lower memory pricing
-Can we cut off/turn off Russian access to chip equipment?
DUV, EUV and now “PUV” to become next generation lithography
Lithography is the locomotive… Read More
Intel’s Pearl Harbor Moment