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How ST-Ericsson Improved DFM Closure using SmartFill

How ST-Ericsson Improved DFM Closure using SmartFill
by Daniel Payne on 10-07-2011 at 2:38 pm

DFM closure is a growing issue these days even at the 45nm node, and IC designers at ST-Ericsson have learned that transitioning from dummy fill to SmartFill has saved them time and improved their DFM score.

The SOC
ST-Ericsson designed an SOC for mobile platforms called the U8500 and their foundry choice was a 45nm node at STMicroelectronicsRead More


Testing, testing… 3D ICs

Testing, testing… 3D ICs
by Beth Martin on 10-06-2011 at 7:01 pm

3D ICs complicate silicon testing, but solutions exist now to many of the key challenges. – by Stephen Pateras

The next phase of semiconductor designs will see the adoption of 3D IC packages, vertical stacks of multiple bare die connected directly though the silicon. Through-silicon vias (TSV) result in shorter and thinner… Read More


Memory Cell Characterization with a Fast 3D Field Solver

Memory Cell Characterization with a Fast 3D Field Solver
by Daniel Payne on 09-29-2011 at 12:07 pm

Memory designers need to predict the timing, current and power of their designs with high accuracy before tape-out to ensure that all the design goals will be met. Extracting the parasitic values from the IC layout and then running circuit simulation is a trusted methodology however the accuracy of the results ultimately depend… Read More


Manufacturing Analysis and Scoring (MAS): GLOBALFOUNDRIES and Mentor Graphics

Manufacturing Analysis and Scoring (MAS): GLOBALFOUNDRIES and Mentor Graphics
by Daniel Payne on 09-05-2011 at 3:37 pm

Last week GLOBALFOUNDRIES and Mentor Graphics presented at the Tech Design Forum on how they collaborated on a third generation DFM flow. When I reviewed the slides of the presentation it really struck me on how the old thinking in DRC (Design Rule Checking) of Pass/Fail for layout rules had been replaced with a score represented… Read More


I love you, you love me, we’re a happy family…

I love you, you love me, we’re a happy family…
by Paul McLellan on 08-31-2011 at 8:00 pm

The CEO panel at the 2nd GTC wasn’t especially enlightening. The theme was that going forward will require cooperation for success and everyone was really ready to cooperate.

The most interesting concept was Aart talking about moving from what he called “scale complexity” aka Moore’s law to what he … Read More


Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics

Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics
by Daniel Payne on 08-26-2011 at 11:17 am

calibre yield analyzer

Introduction
Mentor Graphics and GLOBALFOUNDRIES have been working together for several generations since the 65nm node on making IC designs yield higher. Michael Buehler-Garcia, director of Calibre Design SolutionsMarketing at Mentor Graphics spoke with me by phone today to explain how they are working with GLOBALFOUNDRIESRead More


Mentor catapults Calypto

Mentor catapults Calypto
by Paul McLellan on 08-26-2011 at 10:36 am

Mentor has transferred its Catapult (high level synthesis) product line, including the people, to Calypto. Terms were not disclosed but apparently it is a non-cash deal. Calypto gets the product line. Mentor gets a big chunk of ownership of Calypto. So maybe the right way to look at this is as a partial acquisition of Calypto.

It … Read More


Aug 25th in Fremont, CA – Hands on Calibre workshop: DRC, LVS, xRC, ERC, DFM

Aug 25th in Fremont, CA – Hands on Calibre workshop: DRC, LVS, xRC, ERC, DFM
by Daniel Payne on 08-18-2011 at 10:30 am

I’ve blogged about the Calibre family of IC design tools before:

Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is BetterRead More


OPC Model Accuracy and Predictability – Evolution of Lithography Process Models, Part III

OPC Model Accuracy and Predictability – Evolution of Lithography Process Models, Part III
by Beth Martin on 08-15-2011 at 7:00 am

Wyatt Earp probably wasn’t thinking of OPC when he said, “Fast is fine, but accuracy is everything,” but I’ll adopt that motto for this discussion of full-chip OPC and post-OPC verification models.

Accuracy
is the difference between the calibrated model prediction and the calibration wafer result. Accuracy depends on several… Read More


Best EDA company for work life balance?

Best EDA company for work life balance?
by Daniel Payne on 08-10-2011 at 1:25 pm

What was the first EDA company name that came to your mind after reading that title?

At Forbes magazine they rated both Mentor Graphics and Synopsys in the top 25 best companies for work life balance.

That’s quite an honor for both Mentor and Synopsys so I can say that EDA dominated the list this year.

Here are some of the factors… Read More