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Q2FY24TessentAI 800X100
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DRC/DFM inside of Place and Route

DRC/DFM inside of Place and Route
by Daniel Payne on 03-31-2011 at 10:19 am

Intro
Earlier this month I drove to Mentor Graphics in Wilsonville, Oregon and spoke with Michael Buehler-Garcia, Director of Marketing and Nancy Nguyen, TME, both part of the Calibre Design to Silicon Division. I’m a big fan of correct-by-construction thinking in EDA tools and what they had to say immediately caught my… Read More


Dawn at the OASIS, Dusk for GDSII

Dawn at the OASIS, Dusk for GDSII
by Beth Martin on 03-28-2011 at 1:53 pm

For an industry committed to constant innovation, changes in any part of the design flow are only slowly adopted, and only when absolutely necessary. Almost 10 years ago, it became clear that shrinking process technologies would bring a massive growth of layout and mask data—rougly 50% per node. This avalanche of data seriously… Read More


Evolution of Lithography Process Models, Part II

Evolution of Lithography Process Models, Part II
by Beth Martin on 03-24-2011 at 3:56 pm

In part I of this series, we looked at the history of lithography process models, starting in 1976. Some technologies born in that era, like the Concorde and the space shuttle, came to the end of their roads. Others did indeed grow and develop, such as the technologies for mobile computing and home entertainment. And lithography … Read More


Getting Real Time Calibre DRC Results

Getting Real Time Calibre DRC Results
by Daniel Payne on 03-10-2011 at 10:00 am

Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.

The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:

  • Read a schematic or use Schematic Driven Layout
Read More

With EUVL, Expect No Holiday

With EUVL, Expect No Holiday
by Beth Martin on 03-02-2011 at 1:12 pm

For a brief time in the 1990s, when 4X magnification steppers suddenly made mask features 4X larger, there was a period in the industry referred to as the “mask vendor’s holiday.” The party ended before it got started with the arrival of sub-wavelength lithography, and we all trudged back to the OPC/RET mines. Since then, the demands… Read More


Wally Rhines DvCon 2011 Ketnote: From Volume to Velocity

Wally Rhines DvCon 2011 Ketnote: From Volume to Velocity
by Daniel Nenni on 02-23-2011 at 1:49 pm

Abstract:
There has been a remarkable acceleration in the adoption of advanced verification methodologies, languages and new standards. This is true across all types of IC design and geographic regions. Designers and verification engineers are surprisingly open to new approaches to keep pace with the relentless rise in design… Read More


Evolution of process models, part I

Evolution of process models, part I
by Beth Martin on 02-23-2011 at 1:15 pm

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Thirty five years ago, in 1976, the Concorde cut transatlantic flying time to 3.5 hrs, Apple was formed, NASA unveiled the first space shuttle, the VHS vs Betamax wars started, and Barry Manilow’s I Write the Songs saturated the airwaves. Each of those advances, except perhaps Barry Manilow, was the result of the first modern-era,… Read More


Mentor Graphics to Participate in SemiWiki.com Social Media Platform

Mentor Graphics to Participate in SemiWiki.com Social Media Platform
by admin on 02-17-2011 at 8:16 am


San Jose, Calif., [DATE], 2011 – SemiWiki.com today announced that Mentor Graphics, a world leader in electronic hardware and software design solutions, will participate in the SemiWiki.com global social media platform aimed at facilitating mass communication for electronic design professionals through Web 2.0 technologies.… Read More


New ERC Tools Catch Design Errors

New ERC Tools Catch Design Errors
by glforte on 02-11-2011 at 2:18 pm

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A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan

Today’s IC designs are complex. They contain vast arrays of features and functionality in Read More


DRC+, DFM, CMP, Variablility

DRC+, DFM, CMP, Variablility
by Daniel Payne on 02-10-2011 at 12:42 pm

When I worked at Intel as a circuit design engineer I could talk directly with the technology development engineers to understand how to really push my DRAM designs and get the smallest possible memory cell layout that would still yield well, provide fast access time, and long refresh cycles.

(United States Patent 6661699. Inventor:… Read More