At TSMC’s Open Innovation Platform (OIP) Ecosystem Forum, Mentor made technical presentations on four different topics, two of them co-presented with TSMC and LSI Corporation. Those presentations are described below with links to downloadable pdf presentation files.
Finding and Fixing Double Patterning Errors in… Read More
Winner, Winner, Chicken Dinner!
I have no idea if chicken was actually on the menu, but on December 12, Calibre RealTime picked up its thirdindustry award, this time the 2012 Elektra Award for Design Tools and Development Software from the European Electronics Industry. Calibre RealTime came out on top in a group full of prestigious finalists, including ByteSnap,… Read More
IP Scoring Using TSMC DFM Kits
Design For Manufacturing (DFM) is the art and science of making an IC design yield better in order to receive a higher ROI. Ian Smith, an AE from Mentor in the Calibre group presented a pertinent webinar, IP Scoring Using TSMC DFM Kits. I’ll provide an overview of what I learned at this webinar.… Read More
Double Patterning Tutorial
Double patterning at 20nm is one of those big unavoidable changes that it is almost impossible to know too much about. Mentor’s David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. There is… Read More
Yield Analysis and Diagnosis Webinar
Sign up for a free webinar on December 11 on Accelerating Yield and Failure Analysis with Diagnosis.
The one hour presentation will be delivered via webcast by Geir Eide, Mentor’s foremost expert in yield learning. He will cover scan diagnosis, a software-based technique, that effectively identifies defects in digital logic… Read More
Double Patterning Exposed!
Wanna become the double patterning guru at your company? David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. For designers struggling to understand the complexity and nuances of double patterning,… Read More
GLOBALFOUNDRIES and Mentor Develop Methods to Identify Critical Features in IC Designs
Since the beginning of the semiconductor industry, improving the rate of yield learning has been a critical factor in the success silicon manufacturing. Each fab has dedicated yield teams that look at the yield of wafers manufactured the previous day and attempt to find the root cause of any unexpected “excursions.” In earlier… Read More
Mentor and NXP Demonstrate that IJTAG Can Reduce Test Setup Time for Complex SoCs
The creation of test patterns for mixed signal IP has been, to a large extent, a manual effort. To improve the process used to test, access, and control embedded IP, a new IEEE P1687 standard is being defined by a broad coalition of IP vendors, IP users, major ATE companies, and all three major EDA vendors. This new standard, also called… Read More
Test and Diagnosis at ISTFA
Finding and debugging failures on integrated circuits has become increasingly difficult. Two sessions at ISTFA (International Symposium for Testing and Failure Analysis) on Thursday address the current best practices and research directions of diagnosis.
The first was a tutorial this morning by Mentor Graphics luminary… Read More
Creating Plug-and-Play IP Networks in Large SoCs with IEEE P1687 (IJTAG)
Until now, the integration and testing of IP blocks used in large SOCs has been a manual, time consuming design effort. A new standard called IEEE P1687 (or “IJTAG”) for IP plug-and-play integration is emerging to simplify these tasks. EDA tools are also emerging to support the new standard. Last week mentor announcedTessent IJTAG,… Read More