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Hazard Detection Using Petri Nets. Innovation in Verification

Hazard Detection Using Petri Nets. Innovation in Verification
by Bernard Murphy on 08-24-2022 at 6:00 am

Innovation New

Modeling and verifying asynchronous systems is a constant challenge. Petri net models may provide an answer. Paul Cunningham (GM, Verification at Cadence), Raúl Camposano (Silicon Catalyst, entrepreneur, former Synopsys CTO and now Silvaco CTO) and I continue our series on research ideas. As always, feedback welcome.

The

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EDA Product Mix Changes as Hardware-Assisted Verification Gains Momentum

EDA Product Mix Changes as Hardware-Assisted Verification Gains Momentum
by Lauro Rizzatti on 08-23-2022 at 10:00 am

Semiwiki Hero Image Lauro Rizzatti

The Design Automation Conference, as always, is a good barometer on the state of EDA and my area of interest, verification. The recent DAC offered plenty of opportunities to check on trends and the status quo.

Remarkably, exhibitors and attendees were upbeat about the chip design landscape despite concerns about supply chain … Read More


WEBINAR: A Revolution in Prototyping and Emulation

WEBINAR: A Revolution in Prototyping and Emulation
by Daniel Nenni on 08-23-2022 at 6:00 am

MimicPro Picture

This webinar will introduce to you a revolutionary new way to do prototyping and emulation at best-in-class performance, productivity, and pricing by unifying the hardware and a new software stack so one system is capable of prototyping and delivering essential emulation functionality.

Register Here

The speed of Moore’s law… Read More


An EDA AI Master Class by Synopsys CEO Aart de Geus

An EDA AI Master Class by Synopsys CEO Aart de Geus
by Daniel Nenni on 08-19-2022 at 8:00 am

Aart de Geus White House

I consider Dr. Aart de Geus one of the founding fathers of EDA and one of the most interesting people in the semiconductor industry. So it is not a surprise that Aart was chosen to attend the CHIPs Act signing at the White House.

Here is his current corporate bio:

Since co-founding Synopsys in 1986, Dr. Aart de Geus has expanded Synopsys… Read More


UVM Polymorphism is Your Friend

UVM Polymorphism is Your Friend
by Bernard Murphy on 08-17-2022 at 6:00 am

Polymorphism min

Rich Edelman of Siemens EDA recently released a paper on this topic. I’ve known Rich since our days together back in National Semi. And I’ve always been impressed by his ability to make a complex topic more understandable to us lesser mortals. He tackles a tough one in this paper – a complex concept (polymorphism) in a complex domain… Read More


Delivering 3D IC Innovations Faster

Delivering 3D IC Innovations Faster
by Kalar Rajendiran on 08-16-2022 at 6:00 am

System Technology Co Optimization STCO

3D IC technology development started many years ago well before the slowing down of Moore’s law benefits became a topic of discussion. The technology was originally leveraged for stacking functional blocks with high-bandwidth buses between them. Memory manufacturers and other IDMs were the ones to typically leverage this … Read More


ARC Processor Summit 2022 Your embedded edge starts here!

ARC Processor Summit 2022 Your embedded edge starts here!
by Synopsys on 08-15-2022 at 10:00 am

ARC Summit 2022

As embedded systems continue to become more complex and integrate greater functionality, SoC developers are faced with the challenge of developing more powerful, yet more energy-efficient devices. The processors used in these embedded applications must be efficient to deliver high levels of performance within limited power… Read More


Digital Twins Simplify System Analysis

Digital Twins Simplify System Analysis
by Dave Bursky on 08-15-2022 at 6:00 am

Siemens Digital Twin SemiWiki

The ability to digitally replicate physical systems has been used to model hardware operations for many years, and more recently, digital twining technology has been applied to electronic systems to better simulate and troubleshoot the systems. As explained by Bryan Ramirez, Director of Industries, Solutions & Ecosystems,… Read More


Understanding Sheath Behavior Key to Plasma Etch

Understanding Sheath Behavior Key to Plasma Etch
by Scott Kruger on 08-11-2022 at 10:00 am

Final Edit EtchingProcess Illustration

Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques.  Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More


WEBINAR: Design and Verify State-of-the-Art RFICs using Synopsys / Ansys Custom Design Flow

WEBINAR: Design and Verify State-of-the-Art RFICs using Synopsys / Ansys Custom Design Flow
by Synopsys on 08-11-2022 at 8:00 am

Synopsys Ansys RF Flow Webinar

The design and characterization of RF circuits is a complex process that requires an RF designer to overcome a variety of challenges. Not only do they face the complexities posed by advanced semiconductor processes and the need to meet the demanding requirements of modern wireless standards, designers must also account for electromagnetic… Read More