Atomic layer deposition (ALD) is a thin-film deposition method that continues to enable continuous advances in semiconductor device fabrication. Essentially, it involves exposing substrates sequentially to at least two different vapor phase atmospheres in which self-limiting reactions take place on the surface: the first… Read More
Author: Admin
Mastering Atomic Precision – ALD’s Role in Semiconductor Advancements
The Case for U.S. CHIPS Act 2
Despite murky goals and moving targets, the recent CHIPS Act sets the stage for long term government incentives.
Authored by Jo Levy and Kaden Chaung
On April 25, 2024, the U.S. Department of Commerce announced the fourth, and most likely final, grant under the current U.S. CHIPS Act for leading-edge semiconductor manufacturing.… Read More
Are you Aware about Risks Related to Soft Errors?
Soft errors change stored data and cause temporal malfunctions in electronic systems. This mainly occurs when radiation particles collide with semiconductor devices. Soft errors are a concern in all environments, whether in the atmosphere, in space, or on the ground.
Soft errors are critical in high-reliability applications… Read More
ASML High-NA EUV is Not Ready for High-Volume Production