While the SPIE Advanced Lithography conference is best known for IC manufacturing, computational lithography, mask preparation and other back-end topics, there is also a significant amount of interest in Design for Manufacturing (DFM) at the conference because some litho issues are best (or only) addressed by modifying the… Read More
Tag: spie
DFM Industry Survey
As part of the DFM Conference at the SPIE Advance Lithography symposium, the DFM committee is conducting an informal survey on the current state of Design For Manufacturability in the Semiconductor Industry.
Please take this anonymous 16 question survey to identify critical Design for Manufacturability (DFM) issues facing… Read More