Deep-ultraviolet (DUV) immersion lithography remains a critical patterning technology for advanced semiconductor manufacturing. Using a 193 nm ArF exposure system with water between the projection lens and wafer, immersion lithography increases numerical aperture and enables smaller features than dry exposure. However,… Read More
The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and get business done. Find these technology solutions and more:
• Photoresist, EUV, and other specialty materials
• E-beam lithography systems
• Precision cleaning, contamination, transport… Read More
Companies offer an inside look into their portfolio of products and services. Find top suppliers, explore product and company capabilities, and build partnerships that will advance your work.
The 2027 Photonics West Exhibition covers two locations at The Moscone Center: the lower levels of North and South… Read More
Join your colleagues in Monterey for the premier worldwide photomask conference
We invite you to explore the latest advances and breakthroughs at this annual conference in Monterey, California. Connect with leading scientists and engineers and discover new work across photomasks, patterning, metrology, materials, inspection
Join your colleagues in Monterey for the premier worldwide photomask conference
We invite you to explore the latest advances and breakthroughs at this annual conference in Monterey, California. Connect with leading scientists and engineers and discover new work across photomasks, patterning, metrology, materials, inspection
Join your colleagues in San Diego for the latest research and insights.
You’re invited to explore the latest advances and breakthroughs at this dynamic annual conference taking place in beautiful Southern California. Connect with leading researchers and scientists as they share new work in optical engineering, nanotechnology,
Chris Mack, the CTO of Fractilia, recently wrote of the “Stochastics Resolution Gap,” which is effectively limiting the manufacturability of EUV despite its ability to reach resolution limits approaching 10 nm in the lab [1,2]. As researchers have inevitably found, … Read More
-We attended the SPIE lithography Conference in San Jose
-No significant news or announcements on EUV
-Focus on 500WPM target and High & Hyper NA rollout
-AMAT overblown Sculpta-Not exactly what its cracked up to be
We have been attending SPIE for many years now and are happy to see a return to pre Covid levels… Read More
At this year’s SPIE Advanced Lithography conference, changes to EUV masks were particularly highlighted, as a better understanding of their behavior is becoming clear. It’s now confirmed that a seemingly symmetric EUV mask absorber pattern does not produce a symmetric image at the wafer, as a conventional DUV … Read More
-KLA has another great QTR in face of overwhelming demand
-Supply chain issues obliterated by backlog
-Longer term technology leadership concerns are increasing
-We see limited upside near term & remain cyclically cautious
KLA’s performance remains great as does… Read More
