Make plans for the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection and repair, mask business, extreme UV lithography, and emerging technologies.
Present your research in Monterey, 29 September – 3 October 2024. Call for papers opens in January
Join your technical
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Join your colleagues in San Diego
The event where the latest advances are shared by the optics and photonics community in optical engineering, nanotechnology, quantum science, and organic photonics.
Why attend Optics + Photonics?
Share the latest research
Gain access to thousands of presentations showcasing the latest breakthroughs
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Share your research, challenges, and breakthroughs with colleagues in San Jose
The call for papers is open. Submit your abstract and join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and … Read More
Share your work, insights, and breakthroughs. The 2024 call for papers is open.
SPIE Photonics West is the world’s largest photonics technologies event. Share your research in biomedical optics, biophotonics, industrial lasers, optoelectronics, microfabrication, MOEMS-MEMS, displays, quantum technologies—including… Read More
-We attended the SPIE lithography Conference in San Jose
-No significant news or announcements on EUV
-Focus on 500WPM target and High & Hyper NA rollout
-AMAT overblown Sculpta-Not exactly what its cracked up to be
We have been attending SPIE for many years now and are happy to see a return to pre Covid levels… Read More
The event for emerging technology in the semiconductor industry
Attend and hear research, challenges, and breakthroughs as you gather with colleagues in San Jose
Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor… Read More
You will find plenty to like at this important meeting, including over 2,000 presentations and the latest technical results within 48 conference topics. This is the best opportunity to connect face-to-face for discussions about optical engineering and applications, nanotechnology, quantum science, and organic photonics.… Read More
At this year’s SPIE Advanced Lithography conference, changes to EUV masks were particularly highlighted, as a better understanding of their behavior is becoming clear. It’s now confirmed that a seemingly symmetric EUV mask absorber pattern does not produce a symmetric image at the wafer, as a conventional DUV … Read More
-KLA has another great QTR in face of overwhelming demand
-Supply chain issues obliterated by backlog
-Longer term technology leadership concerns are increasing
-We see limited upside near term & remain cyclically cautious
Another great quarter- demand remains super strong
KLA’s performance remains great as does… Read More