RedHawk: On to the Future

RedHawk: On to the Future
by Paul McLellan on 05-01-2012 at 6:00 am

For many, maybe most, big designs, Apache’s RedHawk is the signoff tool for analyzing issues around power: electromigration, power supply droop, noise, transients and so on. But the latest designs have some issues: they are enormous (so you can’t just analyze them naively any more than you can run a Spice simulation… Read More


Designing for Reliability

Designing for Reliability
by Paul McLellan on 04-08-2012 at 8:06 pm

Analyzing the operation of a modern SoC, especially analyzing its power distribution network (PDN) is getting more and more complex. Today’s SoCs no longer operate on a continuous basis, instead functional blocks on the IC are only powered up to execute the operation that is required and then they go into a standby mode, … Read More


Power Issues for Chip and Board: webinar

Power Issues for Chip and Board: webinar
by Paul McLellan on 03-10-2012 at 4:24 pm

Last month Brian Bailey at EDN moderated an interesting webinar about power issues. Unusually, it combined two different domains: doing things by modeling and actually taking measurements off real chips and boards. The two participants were Arvind Shanmugavel from the Apache subsidiary of Ansys, and Randy White from Tektronix.… Read More


Power to the Drones

Power to the Drones
by Paul McLellan on 02-14-2012 at 6:01 pm

Unmanned systems are becoming indispensable to military forces and are used across all of land, sea and air. The generic name for such unmanned systems is UXS, usually UAS (air), UGS (ground) or UUS (underwater). The UAS is the most visible, both due to military strikes and the views of Japan after the Tsunami when areas were unreachable… Read More


Chip-Package-System workshops

Chip-Package-System workshops
by Paul McLellan on 01-17-2012 at 4:30 pm

Chips, packages and circuit boards (systems, hence CPS) used to be three separate domains with their own tools that barely interacted at all. If you were lucky, reassigning a pin on a package wouldn’t have to be done manually in all 3 places. But now, from a signal integrity, noise, power point of view these three domains must… Read More


Challenges in 3D-IC and 2½D Design

Challenges in 3D-IC and 2½D Design
by Paul McLellan on 12-09-2011 at 5:18 pm

3D IC design and what has come to be known as 2½D IC design, with active die on a silicon interposer, require new approaches to verification since the through silicon vias (TSVs) and the fact that several different semiconductor processes may be involved create a new set of design challenges

The power delivery network is a challenge… Read More


Nvidia’s Chris Malachowsky on "Watt’s next"

Nvidia’s Chris Malachowsky on "Watt’s next"
by Paul McLellan on 12-06-2011 at 12:31 pm

The video and slides of the CEDA lunch from a month or two ago are now (finally) up here. Chris Malachowsky presented “Watt’s next.” Chris is one of the founders of nVidia and is currently its senior VP of research. He started by talking a bit about the nVidia product line but moved on to talking about supercomputers… Read More


Apache on the Road

Apache on the Road
by Paul McLellan on 10-19-2011 at 2:01 pm

There are lots of places that Apache is going to popping up in the next few weeks.

Firstly, Andrew Yang will deliver the keynote on October 24th at the Electrical Performance of Electronic Packaging and Systems (EPEPS) in San Jose. He will be talking about “Chip-Package-System convergence: bridging multiple disciplings… Read More


2.5D and 3D designs

2.5D and 3D designs
by Paul McLellan on 09-07-2011 at 1:54 pm

Going up! Power and performance issues, along with manufacturing yield issues, limit how much bigger chips can get in two dimensions. That, and the fact that you can’t manufacture two different processes on the same wafer, mean that we are going up into the third dimension.

The simplest way is what is called package-in-package… Read More


20nm SoC Design

20nm SoC Design
by Paul McLellan on 08-25-2011 at 12:48 am

There are a large number of challenges at 20nm that didn’t exist at 45nm or even 32nm.

The biggest issues are in the lithography area. Until now it has been possible to make a reticle using advanced reticle enhacement technology (RET) decoration and have it print. Amazing when you think that at 45nm we are making 45nm features… Read More