Double Patterning and Then The End of Lithography

Double Patterning and Then The End of Lithography
by Paul McLellan on 03-15-2012 at 8:00 am

I went to a couple more sessions at the Common Platform Technology Forum today, on 20nm double patterning and whatever will we do at 14nm. Basically, this is the end of planar transistors and the end of optical lithography. One session was by IBM scientists about process and one by Michael White of Mentor about double patterning. … Read More


Common Platform Technology Forum: Peering into the Future

Common Platform Technology Forum: Peering into the Future
by Paul McLellan on 03-10-2012 at 9:00 am

Next Wednesday is the Common Platform Technology Forum. “Common Platform” is a name that only a committee could have come up with, giving no clue as to what it actually is. As you probably know, there are various process clubs sharing the costs of technology development (TD) and one of them consists of IBM, Samsung and… Read More


Designing ARM Powered High Performance SoCs on 28nm and 20nm!

Designing ARM Powered High Performance SoCs on 28nm and 20nm!
by Daniel Nenni on 03-06-2012 at 9:17 am


Last week I had an interesting meeting with GLOBALFOUNDRIES executives Kevin Meyer and Mojy Chian. It certainly seems that GFI has turned a corner! I will be in Dresden next week for DATE 2012 and will also visit the GFI Fab there. 28nm and 20nm are on track so expect an aggressive implementation plan from GFI this year.… Read More


Semiconductors: A Decade of Invention… A World of Solutions

Semiconductors: A Decade of Invention… A World of Solutions
by Daniel Nenni on 02-17-2012 at 1:53 pm

Please join IBM, Samsung Electronics, Co., Ltd., and GLOBALFOUNDRIES at the 2012 Common Platform Technology Forum. The forum will showcase the alliance’s technological progress and how joint collaboration and innovation is setting the direction for industry-leading solutions to enable next-generation products. … Read More


AMD and GlobalFoundries?

AMD and GlobalFoundries?
by Daniel Nenni on 02-05-2012 at 1:00 pm

One thing I do as an internationally recognized semiconductor blogger is listen to the quarterly conference calls of companies that drive our industry. TSMC is always interesting, I really like the honesty and vision of Dr. Morris Chang. Cadence is good, I always want to hear what Lip-Bu Tan has to say. Oracle and Larry Ellison, Read More


What Will 2012 Bring The Semiconductor Ecosystem?

What Will 2012 Bring The Semiconductor Ecosystem?
by Daniel Nenni on 12-18-2011 at 4:30 pm

During my annual holiday meal with one of my favorite EDA icons some rather bold predictions were made. On his side it was more of what he would LIKE to see happen, on my side it was more of what will HAVE to happen for the semiconductor ecosystem to thrive in the coming years.

Mike Gianfagna (Viva Italia!) spent 15+ years with RCA/GE Semiconductor… Read More


GlobalFoundries Versus Samsung!

GlobalFoundries Versus Samsung!
by Daniel Nenni on 11-27-2011 at 7:00 pm

Some call it co-opetition (collaborative competition), some call it keeping your enemies close. Others call it for what it is, unfair competition and/or other types of legally actionable behavior. GlobalFoundries calls it“Fab Syncing”, which in reality will SINK their FABS!

“With this new collaboration, we are making one Read More


Global Semiconductor Alliance Ecosystem Summit Trip Report!

Global Semiconductor Alliance Ecosystem Summit Trip Report!
by Daniel Nenni on 10-10-2011 at 7:06 pm

Being an internationally recognized industry blogger (IRIB) does have its benefits, one of which is free invites to all of the cool industry conferences! The presentations are canned for the most part but you can learn a lot at the breaks and exhibits if you know the right questions to ask, which I certainly do.

The GSA Semiconductor
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Manufacturing Analysis and Scoring (MAS): GLOBALFOUNDRIES and Mentor Graphics

Manufacturing Analysis and Scoring (MAS): GLOBALFOUNDRIES and Mentor Graphics
by Daniel Payne on 09-05-2011 at 3:37 pm

Last week GLOBALFOUNDRIES and Mentor Graphics presented at the Tech Design Forum on how they collaborated on a third generation DFM flow. When I reviewed the slides of the presentation it really struck me on how the old thinking in DRC (Design Rule Checking) of Pass/Fail for layout rules had been replaced with a score represented… Read More


Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics

Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics
by Daniel Payne on 08-26-2011 at 11:17 am

calibre yield analyzer

Introduction
Mentor Graphics and GLOBALFOUNDRIES have been working together for several generations since the 65nm node on making IC designs yield higher. Michael Buehler-Garcia, director of Calibre Design SolutionsMarketing at Mentor Graphics spoke with me by phone today to explain how they are working with GLOBALFOUNDRIESRead More