The way we are seeing technology progression these days is unprecedented. It’s just about six months ago, I had written about the intense collaboration between ANSYSand TSMCon the 16nm FinFET based design flow and TSMC certifying ANSYS tools for TSMC 16nm FF+ technology and also conferring ANSYS with “Partner of the Year” award.… Read More
Tag: electromigration
Silvaco Swallows Invarian
Yesterday, Silvaco announced that it has acquired Invarian Inc. Details of the transaction were not disclosed.
Who is Invarian? They are a recognized leader in block-level to full-chip sign-off analysis for complex, high-performance ICs. Their unique methodology utilizes a parallel architecture and concurrent power-voltage-thermal… Read More
Analyzing Power Nets Early and Often, a New White Paper
One of the big challenges in designing ICs today is designing a robust power net capable of delivering necessary current levels to all areas of the die. Getting it wrong can, of course, lead to circuit failures that range from non-functional silicon, through intermittent performance and functional problems, to early EM-driven… Read More
ANSYS Talks About Multi Physics for Thermal Analysis at DesignCon
ANSYS makes a big deal of being a multi-physics company. Still it has taken them a while to fully integrate Apache. Nevertheless it seems like there is a compelling argument for combining technologies to solve SOC design problems. Frankly most chip designers would be hard pressed to think of a reason for using computational fluid… Read More
Analyzing Power Nets
One of the big challenges in a modern SoC is doing an accurate analysis of the power nets. Different layers of metal have very different resistance characteristics (since they vary so much in width and height). Even vias can cause problems due to high resistance. Typically power is distributed globally on high-level metal layers,… Read More
Full-Chip Electromigration Analysis
I’ll never forget debugging my first DRAM chip at Intel, peering into a microscope and watching the aluminum interconnect actually bubble and dissolve as the voltage was increased, revealing the destructive effects of Electromigration (EM) failure. That was back in 1980 using 6 um, single level metal technology, so imagine… Read More
ANSYS Tools Shine at FinFET Nodes!
In the modern semiconductor ecosystem we are seeing rapid advancement in technology breaking past once perceived limits; 28nm, 20nm, 16-14nm, 10nm and we are foreseeing 7nm now. Double and multi-patterning are already being seen along with complex FinFET structures in transistors to gain the ultimate advantages in PPA from… Read More
Cadence Completes Power Signoff Solution with Voltus-Fi
You probably remember Cadence introduced Voltus towards the end of last year at their signoff summit. This was aimed at digital designers. Prior to that they had announced Tempus, their static timing analysis tool. More recently they announced Quantus QRC extraction. All of these tools that end in -us have been re-architected… Read More
Intel & Ansys Enable 14nm Chip Production
In the semiconductor industry, it feels great to hear about the process technology shrinking to lower nodes along with innovative transistor structures that offer major gains in PPA (Power, Performance and Area). However, it requires huge investment of capital, time and effort from foundries to conceptualize, prototype and… Read More
FinFET Based Designs Made Easy & Reliable
Although semiconductor manufacturing has taken off with FinFET based process technology which provides lucrative payoffs on performance improvement, power reduction and area saving in devices for high density and high performance SoC demand of modern era, apprehensions remain about its reliability due to reduced noise … Read More