How Magwel is Tapping Tried and True Business Strategy in Targeting ESD

How Magwel is Tapping Tried and True Business Strategy in Targeting ESD
by Tom Simon on 11-02-2015 at 12:00 pm

Often when a company starts out it takes a while for it to find the sweet spot in the marketplace. Very often it is feedback from existing customers and business success that can help point the way for small companies as they grow. This is just as true in EDA as it is in retailing or consumer products. For instance, Mentor Graphics, though… Read More


A Key Partner in the Semiconductor Ecosystem

A Key Partner in the Semiconductor Ecosystem
by Pawan Fangaria on 05-19-2015 at 5:00 pm

Often we hear about isolated instances of excellence from various companies in the semiconductor industry which contribute significantly in building the overall ecosystem. While the individual excellence is essential, it’s rather more important how that excellence is utilized in a larger way by the industry to create a ‘value… Read More


Will your next SoC fail because of power noise integrity in IP blocks?

Will your next SoC fail because of power noise integrity in IP blocks?
by Daniel Payne on 04-14-2015 at 5:00 pm

By the time that your SoC comes back from the fab and you plugin it into a socket on a board for testing, it’s a little late in the cycle to start thinking about reliability concerns like: dynamic voltage drop, noise coupling, EM (Electro-Migration), self-heating, thermal analysis and ESD (Electro-Static Discharge). They… Read More


ANSYS Enters the League of 10nm Designs with TSMC

ANSYS Enters the League of 10nm Designs with TSMC
by Pawan Fangaria on 04-09-2015 at 7:00 pm

The way we are seeing technology progression these days is unprecedented. It’s just about six months ago, I had written about the intense collaboration between ANSYSand TSMCon the 16nm FinFET based design flow and TSMC certifying ANSYS tools for TSMC 16nm FF+ technology and also conferring ANSYS with “Partner of the Year” award.… Read More


Silvaco Swallows Invarian

Silvaco Swallows Invarian
by Paul McLellan on 03-20-2015 at 7:00 am

Yesterday, Silvaco announced that it has acquired Invarian Inc. Details of the transaction were not disclosed.

Who is Invarian? They are a recognized leader in block-level to full-chip sign-off analysis for complex, high-performance ICs. Their unique methodology utilizes a parallel architecture and concurrent power-voltage-thermal… Read More


Analyzing Power Nets Early and Often, a New White Paper

Analyzing Power Nets Early and Often, a New White Paper
by Paul McLellan on 02-22-2015 at 7:00 am

One of the big challenges in designing ICs today is designing a robust power net capable of delivering necessary current levels to all areas of the die. Getting it wrong can, of course, lead to circuit failures that range from non-functional silicon, through intermittent performance and functional problems, to early EM-driven… Read More


ANSYS Talks About Multi Physics for Thermal Analysis at DesignCon

ANSYS Talks About Multi Physics for Thermal Analysis at DesignCon
by Tom Simon on 01-27-2015 at 9:00 am

ANSYS makes a big deal of being a multi-physics company. Still it has taken them a while to fully integrate Apache. Nevertheless it seems like there is a compelling argument for combining technologies to solve SOC design problems. Frankly most chip designers would be hard pressed to think of a reason for using computational fluidRead More


Analyzing Power Nets

Analyzing Power Nets
by Paul McLellan on 01-21-2015 at 7:00 am

One of the big challenges in a modern SoC is doing an accurate analysis of the power nets. Different layers of metal have very different resistance characteristics (since they vary so much in width and height). Even vias can cause problems due to high resistance. Typically power is distributed globally on high-level metal layers,… Read More


Full-Chip Electromigration Analysis

Full-Chip Electromigration Analysis
by Daniel Payne on 10-10-2014 at 7:00 am

I’ll never forget debugging my first DRAM chip at Intel, peering into a microscope and watching the aluminum interconnect actually bubble and dissolve as the voltage was increased, revealing the destructive effects of Electromigration (EM) failure. That was back in 1980 using 6 um, single level metal technology, so imagine… Read More


ANSYS Tools Shine at FinFET Nodes!

ANSYS Tools Shine at FinFET Nodes!
by Pawan Fangaria on 09-30-2014 at 4:00 pm

In the modern semiconductor ecosystem we are seeing rapid advancement in technology breaking past once perceived limits; 28nm, 20nm, 16-14nm, 10nm and we are foreseeing 7nm now. Double and multi-patterning are already being seen along with complex FinFET structures in transistors to gain the ultimate advantages in PPA from… Read More