You are currently viewing SemiWiki as a guest which gives you limited access to the site. To view blog comments and experience other SemiWiki features you must be a registered member. Registration is fast, simple, and absolutely free so please,
join our community today!
DFM Industry Surveyby Beth Martin on 02-10-2012 at 1:28 pmCategories: EDA, Siemens EDA
As part of the DFM Conference at the SPIE Advance Lithography symposium, the DFM committee is conducting an informal survey on the current state of Design For Manufacturability in the Semiconductor Industry.
Please take this anonymous 16 question survey to identify critical Design for Manufacturability (DFM) issues facing… Read More
3D Standardsby Paul McLellan on 02-01-2012 at 5:06 pmCategories: Ansys, Inc., EDA
At DesignCon this week there was a panel on 3D standards organized by Si2. I also talked to Aveek Sarkar of Apache (a subsidiary of Ansys) who is one of the founding member companies of the Si2 Open3D Technical Advisory Board (TAB), along with Atrenta, Cadence, Fraunhofer Institute, Global Foundries, Intel, Invarian, Mentor, Qualcomm,… Read More
Next week there are two Apache, a subsidiary of Ansys, events. At DesignCon there are a couple of workshops on chip-package-system (CPS). In addition to Apache themselves, each of the two workshops has a number of representatives of leading edge companies doing semiconductor design. I already blogged about this in more detail… Read More
For the greater good of the semiconductor ecosystem, SemiWiki and Mentor Graphics present SemiWiki Seminars, a free seminar and software demonstration series addressing the latest innovations in IC design. SemiWiki Seminars discuss interesting new challenges and potential solutions aimed at increased circuit density … Read More
Looking at the huge gap between the revenue of semiconductor design and manufacturing (~$300B) and that of EDA tools, services and silicon IP combined (~6B) inspired me to look more deeply into the overall arena of semiconductors in today’s context and possibly decipher some trends which should emerge in near future. Although… Read More
Advanced process technologies for manufacturing computer chips enable more functionality, higher performance, and low power through smaller sizes. Memory bits on a chip are predicted to double every two years to keep up with the demand for increased performance.
To meet these new requirements for performance and power, memory… Read More
VLSI 2012 in Hyderabadby Paul McLellan on 01-06-2012 at 3:59 pmCategories: EDA
Atrenta will be on a panel session at VLSI 2012 next week in Hyderabad in the center of India. Since I had a development group there over a decade ago this is actually one of the few cities in India that I have visited. Beautiful but very hot at the time I was there.
Atrenta will be represented by Sathyam Pattanam the director of engineering… Read More
Joe Sawicki is the VP and General Manager at Mentor Graphics for the Design-to-Silicon Division where the Calibre product line is developed. We met today in Wilsonville, Oregon to review the challenges in IC design, processing and manufacturing.… Read More
During my annual holiday meal with one of my favorite EDA icons some rather bold predictions were made. On his side it was more of what he would LIKE to see happen, on my side it was more of what will HAVE to happen for the semiconductor ecosystem to thrive in the coming years.
Mike Gianfagna (Viva Italia!) spent 15+ years with RCA/GE Semiconductor… Read More
LVS Challenges at Advanced Nodes
Accurate, comprehensive device recognition, connectivity extraction, netlist generation and, ultimately, circuit comparison becomes more complex with each new process generation. As the number of layers and layer derivations increases the complexity of devices, especially Layout Dependent… Read More