Aug 25th in Fremont, CA – Hands on Calibre workshop: DRC, LVS, xRC, ERC, DFM

Aug 25th in Fremont, CA – Hands on Calibre workshop: DRC, LVS, xRC, ERC, DFM
by Daniel Payne on 08-18-2011 at 10:30 am

I’ve blogged about the Calibre family of IC design tools before:

Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is BetterRead More


August 11th – Hands-on Workshop with Calibre: DRC, LVS, DFM, xRC, ERC

August 11th – Hands-on Workshop with Calibre: DRC, LVS, DFM, xRC, ERC
by Daniel Payne on 08-06-2011 at 9:29 pm

I’ve blogged about the Calibre family of IC design tools before:

Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is BetterRead More


A Birds-Eye Overview of DRC+

A Birds-Eye Overview of DRC+
by Daniel Nenni on 06-13-2011 at 10:57 pm

The GlobalFoundries DRC+ platform is one of the most innovative DFM technologies and was well represented at #48DAC. In case you missed it, here is a reprint of a DRC+ overview from GFI just prior to #48DAC:

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DRC (Design Rule Constraints) are the fundamental principles in constraining VLSI (Very Large Scale Integration)… Read More


GLOBALFOUNDRIES 28nm Design Ecosystem!

GLOBALFOUNDRIES 28nm Design Ecosystem!
by Daniel Nenni on 06-01-2011 at 11:00 am

GLOBALFOUNDRIES will show off its 28nm design ecosystem at #48DAC next week in San Diego. The company will feature a full design ecosystem for its 28nm High-k Metal Gate (HKMG) technology, including silicon-validated flows, process design kits (PDKs), design-for-manufacturing (DFM), and intellectual property (IP) in partnership… Read More


Graphical DRC vs Text-based DRC

Graphical DRC vs Text-based DRC
by Daniel Payne on 05-01-2011 at 11:42 am

Introduction
IC designs go through a layout process and then a verification of that layout to determine if the layout layer width and spacing rules conform to a set of manufacturing design rules. Adhering to the layout rules will ensure that your chip has acceptable yields.
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At the 28nm node a typical DRC (Design Rule… Read More


DRC/DFM inside of Place and Route

DRC/DFM inside of Place and Route
by Daniel Payne on 03-31-2011 at 10:19 am

Intro
Image RemovedEarlier this month I drove to Mentor Graphics in Wilsonville, Oregon and spoke with Michael Buehler-Garcia, Director of Marketing and Nancy Nguyen, TME, both part of the Calibre Design to Silicon Division. I’m a big fan of correct-by-construction thinking in EDA tools and what they had to say immediately… Read More


New ERC Tools Catch Design Errors

New ERC Tools Catch Design Errors
by glforte on 02-11-2011 at 2:18 pm

A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan

Today’s IC designs are complex. They contain vast arrays of features and functionality in Read More


So, Why Not Just Write Better Rules?

So, Why Not Just Write Better Rules?
by glforte on 10-14-2010 at 4:00 pm

In my submission about TSMC making some DFM analysis steps mandatory at 45nm (see “TSMC’s DFM Announcement”), I ended with a question about why the foundries can’t just write better design rules (and rule decks) to make sure all designs yield well. Here’s my take on this complicated question.… Read More


So, Why Not Just Write Better Rules?

So, Why Not Just Write Better Rules?
by glforte on 10-14-2010 at 4:00 pm

In my submission about TSMC making some DFM analysis steps mandatory at 45nm (see “TSMC’s DFM Announcement”), I ended with a question about why the foundries can’t just write better design rules (and rule decks) to make sure all designs yield well. Here’s my take on this complicated question.… Read More