Samsung is Starting 7nm Production with EUV in June

Samsung is Starting 7nm Production with EUV in June
by Scotten Jones on 04-16-2018 at 12:00 pm

There is a report in the Seoul Economic Daily that Samsung has completed development of their 7nm process using EUV and that production will begin in June. What is claimed in the report is:

  • The process is installed in the Hwaseong S3 Fab
  • Samsung has more than 10 EUV systems installed
  • Production starts in June with Qualcomm, Xilinx,
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Leading Edge Logic Landscape 2018

Leading Edge Logic Landscape 2018
by Scotten Jones on 03-16-2018 at 2:00 pm

The most viewed blogs I write for SemiWiki are consistently blogs comparing the four leading edge logic producers, GLOBALFOUNDRIES (GF), Intel, Samsung (SS) and TSMC. Since the last time I compared the leading edge new data has become available and several new processes have been introduced. In this blog I will update the current… Read More


SPIE Advanced Lithography 2018 – EUV Status

SPIE Advanced Lithography 2018 – EUV Status
by Scotten Jones on 03-05-2018 at 7:00 am

This year the Advanced Lithography Conference felt very different to me than the last couple of years. I think it was Chris Mack who proclaimed it the year of Stochastics. EUV has dominated the conference for the last several years but in the past the conversation has been mostly centered on the systems, system power and uptime.

I … Read More


LithoVision 2018 The Evolving Semiconductor Technology Landscape and What it Means for Lithography

LithoVision 2018 The Evolving Semiconductor Technology Landscape and What it Means for Lithography
by Scotten Jones on 02-25-2018 at 5:00 pm

I was invited to present at Nikon’s LithoVision event held the day before the SPIE Advanced Lithography Conference in San Jose. The following is a write up of the talk I gave. In this talk I discuss the three main segments in the semiconductor industry, NAND, DRAM and Logic and how technology transitions will affect lithography.… Read More


IoT Designs Beginning to Shift to 7nm: Promises Upside for Cadence Physically-Aware Design Flow

IoT Designs Beginning to Shift to 7nm: Promises Upside for Cadence Physically-Aware Design Flow
by Mitch Heins on 01-29-2018 at 12:00 pm

Until recently, ICs at bleeding edge nodes like 7nm technology from foundries like TSMC were mostly targeted for high-performance-computing (HPC) and mobile applications or possibly high radix switches that needed the increased performance of advanced nodes. The momentum of Moore’s law and Moore-than-Moore saw foundries… Read More


IEDM 2017 – Controlling Threshold Voltage with Work Function Metals

IEDM 2017 – Controlling Threshold Voltage with Work Function Metals
by Scotten Jones on 01-26-2018 at 7:00 am

As I have said many times, IEDM is one of the premier conferences for semiconductor technology. On Sunday before the formal conference started I took the “Boosting Performance, Ensuring Reliability, Managing Variation in sub-5nm CMOS” short course. The second module in the course was “Multi-Vt Engineering… Read More


ISS 2018 – The Impact of EUV on the Semiconductor Supply Chain

ISS 2018 – The Impact of EUV on the Semiconductor Supply Chain
by Scotten Jones on 01-18-2018 at 8:00 am

I was invited to give a talk at the ISS conference on the Impact of EUV on the Semiconductor Supply Chain. The ISS conference is an annual gathering of semiconductor executives to review technology and global trends. In this article I will walk through my presentation and conclusions.… Read More


IEDM 2017 – imec Charting the Future of Logic

IEDM 2017 – imec Charting the Future of Logic
by Scotten Jones on 01-04-2018 at 12:00 pm

At the IEDM 2017, imec held an imec technology forum and presented several papers, I also had the opportunity to interview Anda Mocuta director of technology solutions and enablement. In this article I will summarize the keys points of what I learned about the future of logic. I will follow this up with a later article covering memory.… Read More


IEDM 2017 – Intel Versus GLOBALFOUNDRIES at the Leading Edge

IEDM 2017 – Intel Versus GLOBALFOUNDRIES at the Leading Edge
by Scotten Jones on 12-22-2017 at 9:00 am

As I have discussed in previous blogs, IEDM is one of the premier conferences to learn about the latest developments in semiconductor technology. … Read More


High Calibre Development Keeps Mentor on Top of the Game

High Calibre Development Keeps Mentor on Top of the Game
by Tom Simon on 12-07-2017 at 12:00 pm

One might be tempted to think that technology driven gains in computer performance might be enough to keep up with the needs of design and verification tools. We know that design complexity is increasing at a rate predicted by Moore’s Law. We also know that the performance of the computers used during IC development benefit from … Read More