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By Carey Robertson, Director of Product Marketing, Mentor Graphics
IC physical verification requires a number of different types of checking, the most familiar being design rule checking (DRC), layout vs. schematic (LVS) checking, and parasitic extraction combined with circuit simulation. Fundamentally, it does not matter… Read More
I’ve blogged about the Calibre family of IC design tools before:
Smart Fill replaced Dummy Fill Approach in a DFM Flow
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
EDA companies and foundries must closely collaborate in order to deliver IC tool flows that work without surprises at the 40nm and 28nm nodes.
Tomorrow in San Jose you can attend this 4th annual event hosted by TSMC along with Mentor Graphics and other EDA and IP companies.
Here are some of the topics that will interest IC designers… Read More
Will Rogers said that an economist’s guess is liable to be as good as anyone’s, but with advanced-node optical lithography, I might have to disagree. Unlike the fickle economy, the distorting effects of the mask and lithographic system are ruled by physics, and so can be modeled.
In this installment, I’ll talk about two critical… Read More
DFM closure is a growing issue these days even at the 45nm node, and IC designers at ST-Ericsson have learned that transitioning from dummy fill to SmartFill has saved them time and improved their DFM score.
The SOC
ST-Ericsson designed an SOC for mobile platforms called the U8500 and their foundry choice was a 45nm node at STMicroelectronics… Read More
3D ICs complicate silicon testing, but solutions exist now to many of the key challenges. – by Stephen Pateras
The next phase of semiconductor designs will see the adoption of 3D IC packages, vertical stacks of multiple bare die connected directly though the silicon. Through-silicon vias (TSV) result in shorter and thinner… Read More
Memory designers need to predict the timing, current and power of their designs with high accuracy before tape-out to ensure that all the design goals will be met. Extracting the parasitic values from the IC layout and then running circuit simulation is a trusted methodology however the accuracy of the results ultimately depend… Read More
Last week GLOBALFOUNDRIES and Mentor Graphics presented at the Tech Design Forum on how they collaborated on a third generation DFM flow. When I reviewed the slides of the presentation it really struck me on how the old thinking in DRC (Design Rule Checking) of Pass/Fail for layout rules had been replaced with a score represented… Read More
The CEO panel at the 2nd GTC wasn’t especially enlightening. The theme was that going forward will require cooperation for success and everyone was really ready to cooperate.
The most interesting concept was Aart talking about moving from what he called “scale complexity” aka Moore’s law to what he … Read More
Introduction
Mentor Graphics and GLOBALFOUNDRIES have been working together for several generations since the 65nm node on making IC designs yield higher. Michael Buehler-Garcia, director of Calibre Design SolutionsMarketing at Mentor Graphics spoke with me by phone today to explain how they are working with GLOBALFOUNDRIES… Read More
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[navigation_id] =>
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[_relations:protected] => Array
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[_options:protected] => Array
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[_deleted:protected] =>
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[_whenSaveable:protected] => Array
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[_cascadeSave:protected] => Array
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[_behaviors:protected] =>
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[populated:protected] => 1
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