Tag: tcad

Webinar: ML-Enhanced TCAD Calibration With 10x Reduction in Time to Results

Webinar: ML-Enhanced TCAD Calibration With 10x Reduction in Time to Results
by Admin on 09-30-2025 at 12:14 am

Date: Oct 15, 2025 | 5:00 PM PST

Featured Speakers:

  • Saurabh Suryavanshi, Product Manager, Synopsys
  • Youngkwon Cho, Senior Staff Engineer, Synopsys
  • Dipanjan Basu, Principal Engineer, Synopsys

Calibration is an essential part of enabling TCAD products usages inside Semiconductor fab. Synopsys has been leading the development

… Read More
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Simulating Gate-All-Around (GAA) Devices at the Atomic Level

Simulating Gate-All-Around (GAA) Devices at the Atomic Level
by Daniel Payne on 09-17-2025 at 10:00 am
Categories: EDA, Silvaco

GAA FET min

Transistor fabrication has spanned the gamut from planar devices o FinFET to Gate-All-Around (GAA) as silicon dimensions have decreased in the quest for higher density, faster speeds and lower power. Process development engineers use powerful simulation tools to predict and even optimize transistor performance for GAA devices.… Read More

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Silvaco’s Diffusion of Innovation: Ecosystem Investments Driving Semiconductor Advancements

Silvaco’s Diffusion of Innovation: Ecosystem Investments Driving Semiconductor Advancements
by Admin on 06-27-2025 at 8:00 am
Categories: EDA, Silvaco

Silvaco at a Glance 2025

In Silvaco’s June 2025 Tech Talk, “The Diffusion of Innovation: Investing in the Ecosystem Expansion,” Chief Revenue Officer Ian Chen outlined how strategic partnerships accelerate R&D in semiconductor design and digital twin modeling. As a leading provider of TCAD, EDA software, and SIP solutions,… Read More

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Silvaco at the 2025 Design Automation Conference #62DAC

Silvaco at the 2025 Design Automation Conference #62DAC
by Daniel Nenni on 06-16-2025 at 8:00 am
Categories: EDA, Events, Silvaco

62nd DAC SemiWiki

Please join us at the Design Automation Conference 2025 where we will highlight the company’s wide range of EDA products and semiconductor IP  targeting, Power Devices, Automotive, Memory, Displays, HPC, 5G / 6G, and IoT applications.

When: June 23 – 25, 2025, Exhibit Hours: 10:00 AM PDT – 6:00 PM PDT

Where: Moscone Center West,… Read More

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TCAD for 3D Silicon Simulation

TCAD for 3D Silicon Simulation
by Daniel Payne on 06-03-2025 at 10:00 am
Categories: EDA, Silvaco

Silvaco TCAD min

Semiconductor fabs aim to have high yields and provide processes that attract design firms and win new design starts, but how does a fab deliver their process nodes in a timely manner without having to run lots of expensive silicon through the line? This is where simulation and TCAD tools come into play, and to learn more about this… Read More

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Intel Foundry Delivers!

Intel Foundry Delivers!
by Daniel Nenni on 05-05-2025 at 10:00 am
Categories: Events, Foundries, Intel Foundry
7 Comments

Intel Foundry Direct Connect Hall 4 1024x576

Now that the dust has settled, I will give you my take on the Intel Foundry event. Some might call me a semiconductor event critic as I have attended hundreds of them over the last 40 years starting with the Design Automation Conference in 1984. Foundry events are my favorite because they really are the pulse of the semiconductor industry,… Read More

The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2025

The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2025
by Admin on 03-04-2025 at 8:21 pm

The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) provides an international forum for the presentation of leading-edge research and development results in the area of process and device simulation. SISPAD is one of the longest-running conferences devoted to technology computer-aided… Read More

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Understanding Sheath Behavior Key to Plasma Etch

Understanding Sheath Behavior Key to Plasma Etch
by Scott Kruger on 08-11-2022 at 10:00 am
Categories: EDA, Tech-X
1 Comment

Final Edit EtchingProcess Illustration

Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques.  Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More

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SISPAD – Cost Simulations to Enable PPAC Aware Technology Development

SISPAD – Cost Simulations to Enable PPAC Aware Technology Development
by Scotten Jones on 10-31-2021 at 10:00 am
Categories: Semiconductor Services, TechInsights
4 Comments

Slide11

I was invited to give a plenary address at the SISPAD conference in September 2021. For anyone not familiar with SISPAD it is a premiere TCAD conference. This year for the first time SISPAD wanted to address cost and my talk was “Cost Simulations to Enable PPAC Aware Technology Development”.

For many years the standard in technology… Read More

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Webinar on coping with the complexities of 3D NAND design

Webinar on coping with the complexities of 3D NAND design
by admin on 12-03-2019 at 10:00 am
Categories: EDA, Events

In order to beat Moore’s Law NAND Flash memories have moved from a planar topology to 3D construction. This allows for increased memory sized in much the same way a multistory building provides more building square footage on the same size building lot. Just like in building construction, adding a third dimension to the mix increases… Read More