iDRM Brings Design Rules to Life!

iDRM Brings Design Rules to Life!
by Pawan Fangaria on 05-11-2013 at 8:00 pm

Much awaited, automatic tool for DRM (Design Rule Manual) and DRC (Design Rule Check) deck creation is here now! I am particularly excited to know about this because I had been hearing for its need (in different context) from the designers with whom I was working to improve their design productivity through the use of our EDA tools… Read More


Prototyping Over 100 Million ASIC Gates Capacity

Prototyping Over 100 Million ASIC Gates Capacity
by Daniel Payne on 05-10-2013 at 12:42 pm

Most SoCs today are being prototyped in FPGA hardware before committing to costly IC fabrication. You could just design and build your own FPGA prototyping system, or instead choose something off the shelf and then concentrate on your core competence of SoC design.

Thanks to the FPGA vendors like Xilinx we now have FGPA prototyping… Read More


Forte CEO on Design and Verification Complexity

Forte CEO on Design and Verification Complexity
by Daniel Nenni on 05-10-2013 at 9:00 am

Sean Dart’s first DAC (Las Vegas) was as a customer in 1989. Designs were hitting 15,000 gates back then so he was looking for better schematic editors and simulators for gate level design. Fast forward 25 years and Sean’s customers are doing 15,000,000 gate subsystems and that number is growing steadily every year.… Read More


Modern SoC designs require a placement- and routing-aware ECO solution to close timing

Modern SoC designs require a placement- and routing-aware ECO solution to close timing
by Jamie Chen on 05-09-2013 at 9:30 pm

As an applications engineer for over 15 years supporting physical design tools that enable implementation closure, I have seen the complexity of timing closure grow continuously from one process node to the next. At 28nm, the number of scenarios for timing sign-off has increased to the extent that is way beyond the number that … Read More


Improving Design Practices for an Image Sensor IDM

Improving Design Practices for an Image Sensor IDM
by klujan on 05-07-2013 at 8:30 pm

With nearly twenty five years in business, Tanner EDA Application Engineers have seen a wide range of support requests. One consistent topic area is around design data management and design reuse. In one recent instance, our customer, an IDM who produces imaging sensors for infrared vision systems, called on Tanners AE team for… Read More


Customer Stories at DAC#50

Customer Stories at DAC#50
by Daniel Nenni on 05-05-2013 at 8:10 pm

When you think Apache Design you probably think Low Power Design and what stuffed animal will they give away at DAC. The other thing you should think about is how the top semiconductor companies around the world use Apache products for leading edge semiconductor design. Demos are fine, but there is nothing like talking directly … Read More


A Tale of Two Events, Make that Three, Wait…How about Four?

A Tale of Two Events, Make that Three, Wait…How about Four?
by Camille Kokozaki on 05-05-2013 at 8:05 pm

It is increasingly apparent that Kurzweil’s Singularity is sure getting near, if it is not here already 32 years too soon. Not a week goes by without missing or needing to attend a key conference, seminar, symposium, summit, with each having parallel streams, panels, exhibits, demos, social networking. Not only are we informed,… Read More


Challenges of 20nm IC Design

Challenges of 20nm IC Design
by Daniel Payne on 04-29-2013 at 11:38 am

Designing at the 20nm node is harder than at 28nm, mostly because of the lithography and process variability challenges that in turn require changes to EDA tools and mask making. The attraction of 20nm design is realizing SoCs with 20 billion transistors. Saleem Haider from Synopsys spoke with me last week to review how Synopsys… Read More


TSMC ♥ Solido

TSMC ♥ Solido
by Daniel Nenni on 04-27-2013 at 8:00 am

Process variation has been a top trending term since SemiWiki began as a result of the articles, wikis, and white papers posted on the Solido landing page. Last year Solido and TSMC did a webinar together, an article in EETimes, and Solido released a book on the subject. Process variation is a challenge today at 28nm and it gets worse… Read More


Mentor CEO Wally Rhines U2U Keynote

Mentor CEO Wally Rhines U2U Keynote
by Daniel Nenni on 04-26-2013 at 2:00 pm

You will never meet a more approachable CEO in the semiconductor ecosystem than Dr. Walden C. Rhines. The first time I met Wally was way back when I blogged for food and he invited me over for lunch. Even better, a year or two later I was having dinner with a friend at the DBL Tree in San Jose. Wally was waiting for his flight home so he joined… Read More