ANSYS Tools Shine at FinFET Nodes!

ANSYS Tools Shine at FinFET Nodes!
by Pawan Fangaria on 09-30-2014 at 4:00 pm

In the modern semiconductor ecosystem we are seeing rapid advancement in technology breaking past once perceived limits; 28nm, 20nm, 16-14nm, 10nm and we are foreseeing 7nm now. Double and multi-patterning are already being seen along with complex FinFET structures in transistors to gain the ultimate advantages in PPA from… Read More


Sidense overlays OTP on TSMC 16nm FinFET

Sidense overlays OTP on TSMC 16nm FinFET
by Don Dingee on 09-13-2014 at 7:00 am

Process shrinks, which have served us well for most of the Moore’s Law journey, are reaching their limits. For switching transistors, the biggest problems of leakage current and gate oxide vulnerability in planar MOSFETs have led the industry to new 3D microstructures such as FinFET. For non-volatile memory, the problem is generally… Read More


FinFET Design for Power, Noise and Reliability

FinFET Design for Power, Noise and Reliability
by Daniel Payne on 08-29-2014 at 4:00 pm

IC designers have been running analysis tools for power, noise and reliability for many years now, so what is new when you start using FinFET transistors instead of planar transistors? Calvin Chow from ANSYS (Apache Design) presented on this topic earlier in the summer through a 33 minutewebinar that has been archived. There is… Read More


IO Design Optimization Flow for Reliability in 28nm

IO Design Optimization Flow for Reliability in 28nm
by Daniel Payne on 07-31-2014 at 5:00 pm

User group meetings are a rich source of information for IC designers because they have actual designers talking about how they used EDA tools in their methodology to achieve a goal. Engineers at STMicroelectronicspresented at a MunEDAUser Group on the topic: I/O Design Optimization Flow For Reliability In Advanced CMOS Nodes.… Read More


Ensuring ESD Integrity

Ensuring ESD Integrity
by Daniel Payne on 07-31-2014 at 10:00 am

Electro Static Discharge (ESD) is a fact of life for IC designs and has been ever since electronics were first created and then started failing because of sudden, large currents flowing through the design caused by human, processing or machine contact. It’s just too expensive to layout an IC today, fabricate it, test for … Read More


Intel & Ansys Enable 14nm Chip Production

Intel & Ansys Enable 14nm Chip Production
by Pawan Fangaria on 06-20-2014 at 10:00 am

In the semiconductor industry, it feels great to hear about the process technology shrinking to lower nodes along with innovative transistor structures that offer major gains in PPA (Power, Performance and Area). However, it requires huge investment of capital, time and effort from foundries to conceptualize, prototype and… Read More


Five Things You Don’t Know About MunEDA

Five Things You Don’t Know About MunEDA
by Paul McLellan on 06-17-2014 at 3:00 pm

So first the one thing that you do know. MunEDA are based in Munich which makes them German. I have to confess that until I got involved helping them a bit with some marketing stuff that that was about all I knew about them too.

So now five things that you might not know:

1. MunEDA have a much wider customer list that you know and would even… Read More


FinFET Based Designs Made Easy & Reliable

FinFET Based Designs Made Easy & Reliable
by Pawan Fangaria on 06-15-2014 at 11:00 am

Although semiconductor manufacturing has taken off with FinFET based process technology which provides lucrative payoffs on performance improvement, power reduction and area saving in devices for high density and high performance SoC demand of modern era, apprehensions remain about its reliability due to reduced noise … Read More


High Sigma Yield Analysis and Optimization at DAC

High Sigma Yield Analysis and Optimization at DAC
by Daniel Payne on 06-02-2014 at 7:20 pm

When I hear the phrase “high sigma” I think of the EDA vendor Solido, however at DAC on Monday I visited another EDA company called MunEDAthat has several products of interest to transistor-level IC designers. I was able to speak with three different people from MunEDA and here’s what I learned.… Read More


Sidense NVM IP clears TSMC9000 at 28nm

Sidense NVM IP clears TSMC9000 at 28nm
by Don Dingee on 05-29-2014 at 7:00 pm

Maybe I’ve spent too many years whiffing solder flux fumes and absorbing doses of X-band radiation in anechoic chambers, but I’m a firm believer in the axiom: “Give me enough engineers, and I can get 10 of anything to work right, once.” We have to make this … fit into this … using only this stuff … is what legends are made of.… Read More