As power has become one of the most important criteria in semiconductor design today, I was wondering whether there is a standard set for the power verification for an overall chip. We do have formats evolved like CPF and UPF and there are tools available to check power and signal integrity (SI), however I don’t see a standard objective… Read More
EDA companies produce a wealth of content to help IC engineers get the best out of their tools through several means:
Mentor Graphics throws a very nice dinner party at DAC each year for journalists, bloggers and top customers, so this year I spoke with Michael Buehler-Garcia about what’s new with Calibre.
Michael Buehler-Garcia, Mentor Graphics
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With nearly twenty five years in business, Tanner EDA Application Engineers have seen a wide range of support requests. One consistent topic area is around design data management and design reuse. In one recent instance, our customer, an IDM who produces imaging sensors for infrared vision systems, called on Tanners AE team for… Read More
Have you seen the latest design rule manuals? At 28nm and 20nm design sign-off is no longer just DRC and LVS. These basic components of physical verification are being augmented by an expansive set of yield analysis and critical feature identification capabilities, as well as layout enhancements, printability, and performance… Read More
As chips have become larger, one of the more challenging steps is full-chip signoff. Lots of other steps in the design process can work on just a part of the problem, but by definition full-chip signoff has to work on the full chip. But it is not just that chips have got larger, the number of corners that need to be validated has also exploded.… Read More
I’ve blogged about the Calibre family of IC design tools before:
Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is Better… Read More
