At the Imec technology forum in Belgium, Dan Mocuta and Juliana Radu presented “Evolution and Disruption: A Perspective on Logic Scaling and Beyond”, I also had a chance to sit down with Dan and discuss the presentation.
Scaling of devices will only get you so far, you need to look at new devices and new… Read More
At the Imec technology forum in Belgium Gouri Sankar Kar and Arnaud Furnemont presented memory and storage perspectives and I also got to interview Arnaud. Arnaud leads overall memory development at Imec and personally leads NAND and DNA research.
Memory research is focused on power, energy, speed and cost with energy and throughput… Read More
One of the more frequent questions I get, “What is next after FinFETs?” is finally getting answered. Thankfully I am surrounded by experts in the process technology field including Scotten Jones of IC Knowledge. I am also surrounded by design enablement experts so I really am the man in the middle which brings us to a discussion between… Read More
This year the Advanced Lithography Conference felt very different to me than the last couple of years. I think it was Chris Mack who proclaimed it the year of Stochastics. EUV has dominated the conference for the last several years but in the past the conversation has been mostly centered on the systems, system power and uptime.
I … Read More
At the IEDM 2017, imec held an imec technology forum and presented several papers, I also had the opportunity to interview Anda Mocuta director of technology solutions and enablement. In this article I will summarize the keys points of what I learned about the future of logic. I will follow this up with a later article covering memory.… Read More
On September 6, 2017, Cadence Design Systems, Lumerical Solutions and PhoeniX Software hosted their second Photonics Summit. As with last year’s summit, this was a two-day event, with the first day including in a myriad of photonics presentations and the second day being a hands-on workshop. The hands-on workshop taught attendees… Read More
At SEMICON West I attended the imec technology forum where Zsolt Tokei presented “How to Solve the BEOL RC Dilemma” and the SEMICON Economics of Density Scaling session where Larry Clevenger of IBM presented “Interconnect Scaling Strategic for Advanced Semiconductor Nodes”. I also had the opportunity… Read More
At the SPIE Advanced Lithography Conference imec published a number of papers on EUV, multi-patterning and other lithography issues. In addition to seeing several of the papers presented I had a chance to sit down with imec’s director of advanced patterning, Greg McIntyre. In this article I will summarize my discussions… Read More
As feature sizes have shrunk, the semiconductor industry has moved from simple, single-exposure lithography solutions to increasingly complex resolution-enhancement techniques and multi-patterning. Where the design on a mask once matched the image that would be produced on the wafer, today the mask and resulting image … Read More
At the ISS Conference in January, An Steegen EVP of Semiconductor Technology & Systems at imec gave a talk entitled “Patterning Options for Advanced Technology Nodes”. I was present for her talk and had the opportunity to have a follow up interview with An.… Read More