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DFM closure is a growing issue these days even at the 45nm node, and IC designers at ST-Ericsson have learned that transitioning from dummy fill to SmartFill has saved them time and improved their DFM score.
The SOC
ST-Ericsson designed an SOC for mobile platforms called the U8500 and their foundry choice was a 45nm node at STMicroelectronics… Read More
Memory designers need to predict the timing, current and power of their designs with high accuracy before tape-out to ensure that all the design goals will be met. Extracting the parasitic values from the IC layout and then running circuit simulation is a trusted methodology however the accuracy of the results ultimately depend… Read More
I met with Jeff Wilson, Product Marketing Manager at Mentor in the Calibre product group to learn more about Smart Fill versus Dummy Fill for DFM flows. Jeff works in the Wilsonville, Oregon office and we first meet at Silicon Compilers back in the 1990’s.
Dummy Fill
This diagram shows an IC layout layer on the left as originally… Read More
Introduction
IC designs go through a layout process and then a verification of that layout to determine if the layout layer width and spacing rules conform to a set of manufacturing design rules. Adhering to the layout rules will ensure that your chip has acceptable yields.
At the 28nm node a typical DRC (Design Rule Check) deck will… Read More
Inroduction
In the early days we made paper plots of an IC layout then measured the width and length of interconnect segments with a ruler to add up all of the squares, then multiplied by the resistance per square. It was tedious, error prone and took way too much time, but we were rewarded with accurate parasitic values for our SPICE… Read More
Intro
Earlier this month I drove to Mentor Graphics in Wilsonville, Oregon and spoke with Michael Buehler-Garcia, Director of Marketing and Nancy Nguyen, TME, both part of the Calibre Design to Silicon Division. I’m a big fan of correct-by-construction thinking in EDA tools and what they had to say immediately caught my… Read More
Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.
The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:
- Read a schematic or use Schematic Driven Layout
…
Read More
New ERC Tools Catch Design Errorsby glforte on 02-11-2011 at 2:18 pmCategories: EDA, Siemens EDA
A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan
Today’s IC designs are complex. They contain vast arrays of features and functionality in … Read More