DRC/DFM inside of Place and Route

DRC/DFM inside of Place and Route
by Daniel Payne on 03-31-2011 at 10:19 am

Intro
Earlier this month I drove to Mentor Graphics in Wilsonville, Oregon and spoke with Michael Buehler-Garcia, Director of Marketing and Nancy Nguyen, TME, both part of the Calibre Design to Silicon Division. I’m a big fan of correct-by-construction thinking in EDA tools and what they had to say immediately caught my… Read More


Getting Real Time Calibre DRC Results

Getting Real Time Calibre DRC Results
by Daniel Payne on 03-10-2011 at 10:00 am

Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.

The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:

  • Read a schematic or use Schematic Driven Layout
Read More

New ERC Tools Catch Design Errors

New ERC Tools Catch Design Errors
by glforte on 02-11-2011 at 2:18 pm

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A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan

Today’s IC designs are complex. They contain vast arrays of features and functionality in Read More


Computational Lithography, Scaling’s Best Friend

Computational Lithography, Scaling’s Best Friend
by glforte on 11-03-2010 at 11:51 pm

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By Joseph Sawicki, Vice President & General Manager, Design to Silicon Division

It is one of the more amazing stories in the continued march of Moore’s Law over the past four nodes. Previously scaling was enabled solely though changes in the physical domain, whether through decreasing the wavelength of light, increasing … Read More