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synopsys advances in atpg 800x100 px 
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Synopsys
Posted on

Double Patterning for IC Design, Extraction and Signoff

Double Patterning for IC Design, Extraction and Signoff
by Daniel Payne on 01-21-2013 at 3:27 pm
Categories: EDA, Synopsys

TSMC and Synopsys hosted a webinar in December on this topic of double patterning and how it impacts the IC extraction flow. The 20nm process node has IC layout geometries so closely spaced that the traditional optical-based lithography cannot be used, instead lower layers like Poly and Metal 1 require a new approach of using two… Read More

Posted on

Yawn… New EDA Leader Results Are Coming

Yawn… New EDA Leader Results Are Coming
by Randy Smith on 01-18-2013 at 4:00 pm
Categories: Cadence, EDA, Siemens EDA, Synopsys

We will soon start to see the quarterly financial reporting installments of the “Big 3” public EDA companies. I predict they will be as boring as usual. I am not sure if I would want it any differently though.

Back in the 90s there were times when it was truly interesting to wait to see what Cadence, Mentor, or later Synopsys, might announce.… Read More

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IP vendors enable SuperSpeed USB IP take off in 2012

IP vendors enable SuperSpeed USB IP take off in 2012
by Eric Esteve on 01-15-2013 at 5:09 am
Categories: IP, Synopsys

SuperSpeed USB has been clearly ranked in the Interface protocols winner list, see this previous post. It could be interesting to dig into this IP market segment, determine in which applications USB 3.0 has been successfully deployed and who are the IP vendors serving this market, enabling SuperSpeed USB to take off.

SuperSpeed… Read More

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A Brief History of Synopsys DesignWare ® IP

A Brief History of Synopsys DesignWare ® IP
by Daniel Nenni on 01-11-2013 at 9:00 am
Categories: IP, Synopsys

Let’s play word association. I say “EDA”, you immediately think “Synopsys”. I say “IP” and although 15 years ago you may not, today, you think “Synopsys”. For nearly two decades, Synopsys has grown its IP business through both organic development and acquisition, with a clear focus on enabling designers to meet their time-to-market… Read More

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Integrating your SoC into the analog world

Integrating your SoC into the analog world
by Don Dingee on 01-02-2013 at 7:00 pm
Categories: EDA, Synopsys

Our world is decidedly analog, made up of stimuli for our five basic senses of sight, touch, hearing, taste, and smell, and more advanced senses like balance and acceleration. To be effective on the Internet of Things, digital devices must integrate with the analog world, interfacing with sensors and control elements.… Read More

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The Semiconductor Landscape – II

The Semiconductor Landscape – II
by Pawan Fangaria on 01-01-2013 at 9:15 pm
Categories: EDA, GlobalFoundries, Synopsys

It has been a year since my article Semiconductor Landscape in Jan 2012 I wanted to look back into the major events over the year and then anticipate what’s in store going forward. What has happened over the year is much more than what I could foresee. Major consolidation in EDA space – Synopsys acquired Magma, SpringSoft, Ciranova,… Read More

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FinFET Modeling and Extraction at 16-nm

FinFET Modeling and Extraction at 16-nm
by Daniel Payne on 12-18-2012 at 12:05 pm
Categories: EDA, FinFET, Synopsys

In 2012 FinFET is one of the most talked about MOS technologies of the year because traditional planar CMOS has slowed down on scaling below the 28nm node. To learn more about FinFET process modeling I attended a Synopsys webinar where Bari Biswas presented for about 42 minutes include a Q&A portion at the end.


Bari Biswas, Synopsys… Read More

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A Brief History of Synopsys

A Brief History of Synopsys
by Daniel Nenni on 12-12-2012 at 1:00 pm
Categories: EDA, Synopsys

One of the largest software companies in the world, Synopsys is a market and technology leader in the development and sale of electronic design automation (EDA) tools and semiconductor intellectual property (IP). Synopsys is also a strong supporter of local education through the Synopsys Outreach Foundation. Each year in multiple… Read More

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Double Patterning Verification

Double Patterning Verification
by Paul McLellan on 12-10-2012 at 3:03 am
Categories: EDA, Synopsys

You can’t have failed to notice that 20nm is coming. There are a huge number of things that are different about 20nm from 28nm, but far and away the biggest is the need for double patterning. You probably know what this is by now, but just in case, here is a quick summary.

Lithography is done using 193nm light. Today we use immersion… Read More