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Always in motion is the future. ~Yoda
For nearly ten years now, full-chip simulation engines have successfully used process models to perform OPC in production. New full-chip models were regularly introduced as patterning processes evolved to span immersion exposure, bilayer resists, phase shift masking, pixelated illumination… Read More
For the greater good of the semiconductor ecosystem, SemiWiki and Mentor Graphics present SemiWiki Seminars, a free seminar and software demonstration series addressing the latest innovations in IC design. SemiWiki Seminars discuss interesting new challenges and potential solutions aimed at increased circuit density … Read More
3D and 2.5D (silicon interposer) designs create new challenges for EDA. Not all of them are in the most obvious areas. Mentor has an interesting presentation on what is required for verification and testing of these types of designs. Obviously it is somewhat Mentor-centric but in laying out the challenges it is pretty much agnostic.… Read More
Hierarchy is used in IC designs at many abstraction levels to help describe a design in a compact format:
But the question and focus for this blog is, “What is a hierarchical SPICE Circuit Simulator?”… Read More
Advanced process technologies for manufacturing computer chips enable more functionality, higher performance, and low power through smaller sizes. Memory bits on a chip are predicted to double every two years to keep up with the demand for increased performance.
To meet these new requirements for performance and power, memory… Read More
In my last corporate EDA job I had customers in Korea that were evaluating a new circuit simulator and getting strange results. When I asked, “Could you send me your test case?” the reply was always, “No, we cannot let any of our IC design data leave the building because of security concerns.”… Read More
Joe Sawicki is the VP and General Manager at Mentor Graphics for the Design-to-Silicon Division where the Calibre product line is developed. We met today in Wilsonville, Oregon to review the challenges in IC design, processing and manufacturing.… Read More
LVS Challenges at Advanced Nodes
Accurate, comprehensive device recognition, connectivity extraction, netlist generation and, ultimately, circuit comparison becomes more complex with each new process generation. As the number of layers and layer derivations increases the complexity of devices, especially Layout Dependent… Read More
Preventing electrical circuit failure is a growing concern for IC designers today. Certain types of failures such as electrostatic discharge (ESD) events, have well established best practices and design rules that circuit designers should be following. Other issues have emerged more recently, such as how to check circuits… Read More
I’ve blogged about the Calibre family of IC design tools before:
Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is Better… Read More
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