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I was at Wally’s u2u (Mentor user group) keynote yesterday. The other keynote was by Ivo Bolsens of Xilinx and is here. He started off by looking at how the semiconductor industry has recovered and silicon area shipments are now back on trend after a pronounced drop in 2009 and revenue has followed. Finally the semiconductor… Read More
Introduction
Circuit designers work at the transistor level and strive to get the ultimate in performance, layout density or low power by creating crafty circuit topologies in both schematics and layout. Along with this quest comes the daunting task of verifying that all of your rules and best practices about reliability have… Read More
Inroduction
In the early days we made paper plots of an IC layout then measured the width and length of interconnect segments with a ruler to add up all of the squares, then multiplied by the resistance per square. It was tedious, error prone and took way too much time, but we were rewarded with accurate parasitic values for our SPICE… Read More
Intro
Earlier this month I drove to Mentor Graphics in Wilsonville, Oregon and spoke with Michael Buehler-Garcia, Director of Marketing and Nancy Nguyen, TME, both part of the Calibre Design to Silicon Division. I’m a big fan of correct-by-construction thinking in EDA tools and what they had to say immediately caught my… Read More
For an industry committed to constant innovation, changes in any part of the design flow are only slowly adopted, and only when absolutely necessary. Almost 10 years ago, it became clear that shrinking process technologies would bring a massive growth of layout and mask data—rougly 50% per node. This avalanche of data seriously… Read More
In part I of this series, we looked at the history of lithography process models, starting in 1976. Some technologies born in that era, like the Concorde and the space shuttle, came to the end of their roads. Others did indeed grow and develop, such as the technologies for mobile computing and home entertainment. And lithography … Read More
Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.
The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:
For a brief time in the 1990s, when 4X magnification steppers suddenly made mask features 4X larger, there was a period in the industry referred to as the “mask vendor’s holiday.” The party ended before it got started with the arrival of sub-wavelength lithography, and we all trudged back to the OPC/RET mines. Since then, the demands… Read More
Abstract:
There has been a remarkable acceleration in the adoption of advanced verification methodologies, languages and new standards. This is true across all types of IC design and geographic regions. Designers and verification engineers are surprisingly open to new approaches to keep pace with the relentless rise in design… Read More
Thirty five years ago, in 1976, the Concorde cut transatlantic flying time to 3.5 hrs, Apple was formed, NASA unveiled the first space shuttle, the VHS vs Betamax wars started, and Barry Manilow’s I Write the Songs saturated the airwaves. Each of those advances, except perhaps Barry Manilow, was the result of the first modern-era,… Read More
Podcast EP170: An Overview of the New Calibre Shift-Left Methodology with Jeff Wilson
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