Make plans to share your work with other experts in April 2026
Present your research at the only cross-disciplinary event highlighting compelling optics and photonics technologies—from digital optics to quantum technologies to optical imaging, sensing, and metrology. Additional topics include THz photonics, 3D printed
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From materials to metrology: pushing the limits of lithography
Share your research, challenges, and breakthroughs at this leading semiconductor conference in San Jose
Submit your abstract and connect with leading researchers advancing solutions in optical lithography, EUVL, patterning technologies, metrology, and process… Read More
Share your work, insights, and breakthroughs. The 2026 call for papers is open.
SPIE Photonics West is the world’s largest optics and photonics technologies event. Present your research in biomedical optics, biophotonics, industrial lasers, optoelectronics, microfabrication, displays, quantum, and emerging vision technologies.… Read More
SPIE Optifab 2025by Admin on 08-27-2025 at 9:22 pm
Join colleagues at the largest optical manufacturing conference and exhibition in North America
SPIE Optifab is the premier event to meet with top companies and learn about the latest optical fabrication technologies. Organized jointly by SPIE and APOMA, Optifab is the largest optical manufacturing conference and exhibition
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It lays the foundation for the Stochastics Resolution Gap
Chris Mack, the CTO of Fractilia, recently wrote of the “Stochastics Resolution Gap,” which is effectively limiting the manufacturability of EUV despite its ability to reach resolution limits approaching 10 nm in the lab [1,2]. As researchers have inevitably found, … Read More
Join your colleagues in beautiful San Diego.
Make plans to attend and learn about latest insights, and breakthroughs.
New this year – a symposium on Astronomical Applications.
We are excited to announce the addition of a fourth symposium sharing advances in space and ground telescopes, UV/x-ray/gamma-ray astronomy,
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Share your research and join the outstanding program for 2025
Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
We are still accepting post-deadline abstract submissions,
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-We attended the SPIE lithography Conference in San Jose
-No significant news or announcements on EUV
-Focus on 500WPM target and High & Hyper NA rollout
-AMAT overblown Sculpta-Not exactly what its cracked up to be
We have been attending SPIE for many years now and are happy to see a return to pre Covid levels… Read More
At this year’s SPIE Advanced Lithography conference, changes to EUV masks were particularly highlighted, as a better understanding of their behavior is becoming clear. It’s now confirmed that a seemingly symmetric EUV mask absorber pattern does not produce a symmetric image at the wafer, as a conventional DUV … Read More
-KLA has another great QTR in face of overwhelming demand
-Supply chain issues obliterated by backlog
-Longer term technology leadership concerns are increasing
-We see limited upside near term & remain cyclically cautious
Another great quarter- demand remains super strong
KLA’s performance remains great as does… Read More