SPIE Advanced Lithography + Patterning 2026

SPIE Advanced Lithography + Patterning 2026
by Admin on 08-27-2025 at 9:58 pm

Share your research, challenges, and breakthroughs at this leading semiconductor conference in San Jose

Submit your abstract and connect with leading researchers advancing solutions in optical lithography, EUVL, patterning technologies, metrology, and process… Read More


IMEC’s Advanced Node Yield Model Now Addresses EUV Stochastics

IMEC’s Advanced Node Yield Model Now Addresses EUV Stochastics
by Fred Chen on 08-23-2025 at 8:00 am

EUV Stochastics

It lays the foundation for the Stochastics Resolution Gap

Chris Mack, the CTO of Fractilia, recently wrote of the “Stochastics Resolution Gap,” which is effectively limiting the manufacturability of EUV despite its ability to reach resolution limits approaching 10 nm in the lab [1,2]. As researchers have inevitably found, … Read More


SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025

SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025
by Admin on 06-10-2025 at 4:34 pm

Share your research and join the outstanding program for 2025

Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

We are still accepting post-deadline abstract submissions,

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Report from SPIE- EUV’s next 15 years- AMAT “Sculpta” braggadocio rollout

Report from SPIE- EUV’s next 15 years- AMAT “Sculpta” braggadocio rollout
by Robert Maire on 03-06-2023 at 10:00 am

EUV DUV Lithography

-We attended the SPIE lithography Conference in San Jose
-No significant news or announcements on EUV
-Focus on 500WPM target and High & Hyper NA rollout
-AMAT overblown Sculpta-Not exactly what its cracked up to be

SPIE Lithography 2023

We have been attending SPIE for many years now and are happy to see a return to pre Covid levels… Read More


Double Diffraction in EUV Masks: Seeing Through The Illusion of Symmetry

Double Diffraction in EUV Masks: Seeing Through The Illusion of Symmetry
by Fred Chen on 05-22-2022 at 7:00 am

Double Diffraction in EUV Masks

At this year’s SPIE Advanced Lithography conference, changes to EUV masks were particularly highlighted, as a better understanding of their behavior is becoming clear. It’s now confirmed that a seemingly symmetric EUV mask absorber pattern does not produce a symmetric image at the wafer, as a conventional DUV … Read More


Has KLA lost its way?

Has KLA lost its way?
by Robert Maire on 05-01-2022 at 6:00 am

KLA SPIE 2022

-KLA has another great QTR in face of overwhelming demand
-Supply chain issues obliterated by backlog
-Longer term technology leadership concerns are increasing
-We see limited upside near term & remain cyclically cautious

Another great quarter- demand remains super strong

KLA’s performance remains great as does… Read More