Most embedded programming strategies involve decomposing the embedded application into chunks, which can then be executed as independent tasks. More advanced applications involve some type of data flow, and may attempt to execute operations in parallel where possible.… Read More
In my opinion, FinFETs will be the most significant piece of technology we, as semiconductor ecosystem people, will experience this decade. Seriously this is exciting stuff and one of the top search terms on SemiWiki for 6 months running. Here is a quick peek at what the top EDA companies will be talking about at the Common Platform… Read More
We will soon start to see the quarterly financial reporting installments of the “Big 3” public EDA companies. I predict they will be as boring as usual. I am not sure if I would want it any differently though.
Back in the 90s there were times when it was truly interesting to wait to see what Cadence, Mentor, or later Synopsys, might announce.… Read More
David Avercrombie of Mentor won the award for the best tutorial at the 2012 TSMC OIP for his presentation, along with Peter Hsu of TSMC, on Finding and Fixing Double Patterning Errors in 20nm. The whole presentation along with the slides is now available online here. The first part of the presentation is an introduction to double … Read More
At TSMC’s Open Innovation Platform (OIP) Ecosystem Forum, Mentor made technical presentations on four different topics, two of them co-presented with TSMC and LSI Corporation. Those presentations are described below with links to downloadable pdf presentation files.
Finding and Fixing Double Patterning Errors in… Read More
I have no idea if chicken was actually on the menu, but on December 12, Calibre RealTime picked up its thirdindustry award, this time the 2012 Elektra Award for Design Tools and Development Software from the European Electronics Industry. Calibre RealTime came out on top in a group full of prestigious finalists, including ByteSnap,… Read More
Design For Manufacturing (DFM) is the art and science of making an IC design yield better in order to receive a higher ROI. Ian Smith, an AE from Mentor in the Calibre group presented a pertinent webinar, IP Scoring Using TSMC DFM Kits. I’ll provide an overview of what I learned at this webinar.… Read More
Double patterning at 20nm is one of those big unavoidable changes that it is almost impossible to know too much about. Mentor’s David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. There is… Read More
Sign up for a free webinar on December 11 on Accelerating Yield and Failure Analysis with Diagnosis.
The one hour presentation will be delivered via webcast by Geir Eide, Mentor’s foremost expert in yield learning. He will cover scan diagnosis, a software-based technique, that effectively identifies defects in digital logic… Read More
Finding and debugging failures on integrated circuits has become increasingly difficult. Two sessions at ISTFA (International Symposium for Testing and Failure Analysis) on Thursday address the current best practices and research directions of diagnosis.
The first was a tutorial this morning by Mentor Graphics luminary… Read More
