The IEEE has an Orange Country Chapter of the Components, Packaging and Manufacturing Technology Society who are organizing an all-day workshop, 3D Integrated Circuits: Technologies Enabling the Revolution. This looks to be an informative day with real-world examples in both design and test being presented by over a dozen … Read More
The goal for automatic test pattern generation (ATPG) is to achieve maximum coverage with the fewest test patterns. This conflicts with the goals of managing power because during test, the IC is often operated beyond its normal functional modes to get the highest quality test results. When switching activity exceeds a device’s… Read More
ISTFA
Silicon Valley is a great location for trade shows and technical conferences, so if you have an interest in test and failure analysis then don’t miss out on the 37th annual International Symposium for Testing and Failure Analysis. This year ISTFA will be held from Sunday, November 13th thru Thursday, November 17th … Read More
Wally Rhines’s keynote at the ARM TechCon was about differentiation and how to use it to create measurable value. We all know what differentiation means in some intuitive sense, but how do you make it measurable? Wally’s answer was that differentiation is a measure of the difficulty of switching suppliers and is best… Read More
By Carey Robertson, Director of Product Marketing, Mentor Graphics
IC physical verification requires a number of different types of checking, the most familiar being design rule checking (DRC), layout vs. schematic (LVS) checking, and parasitic extraction combined with circuit simulation. Fundamentally, it does not matter… Read More
This was my first ARM TechCon, they cordially invited me as media, but it certainly was not what I expected. Making matters worse, I had literally just flown in from a very long weekend sailing in Mexico which was much more interesting and certainly made me much less tolerant of sales and marketing nonsense. My Uncle Jim lives on a sailboat… Read More
The TSMC OIP conference was Monday and Tuesday of last week. You have probably NOT read about it since it was invitation only and press was not invited. Slides were not made available (except for Mentor), no photos or video were allowed, it was a very private affair. Given that, I won’t be able to go into great detail but I will give you… Read More
EDA companies and foundries must closely collaborate in order to deliver IC tool flows that work without surprises at the 40nm and 28nm nodes.
Tomorrow in San Jose you can attend this 4th annual event hosted by TSMC along with Mentor Graphics and other EDA and IP companies.
Here are some of the topics that will interest IC designers… Read More
Will Rogers said that an economist’s guess is liable to be as good as anyone’s, but with advanced-node optical lithography, I might have to disagree. Unlike the fickle economy, the distorting effects of the mask and lithographic system are ruled by physics, and so can be modeled.
In this installment, I’ll talk about two critical… Read More
Last week GLOBALFOUNDRIES and Mentor Graphics presented at the Tech Design Forum on how they collaborated on a third generation DFM flow. When I reviewed the slides of the presentation it really struck me on how the old thinking in DRC (Design Rule Checking) of Pass/Fail for layout rules had been replaced with a score represented… Read More
