Please join us for our SPIE 2022 Virtual Technical Forum to learn the latest on Synopsys Manufacturing’s mask synthesis, mask data prep and lithography simulation solutions. The Tech Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 3nm and beyond.
… Read More
Stochastic defects continue to draw attention in the area of EUV lithography. It is now widely recognized that stochastic issues not only come from photon shot noise due to low (absorbed) EUV photon density, but also the resist material and process factors [1-4].
It stands to reason that resist absorption of EUV light, which is … Read More
The 5nm foundry node saw the arrival of 6-track standard cells with four narrow routing tracks between wide power/ground rails (Figure 1a), with minimum pitches of around 30 nm . The routing tracks require cuts  with widths comparable to the minimum half-pitch, to enable the via connections to the next metal layer with the… Read More
27 February – 3 March 2022
San Jose, California, United States
The conference for emerging technology in the semiconductor industry
A conference program has been built with all the great content you expect at SPIE Advanced Lithography + Patterning
Prepare to join other leading researchers who are solving challenges in
… Read More
In this article, we will explore the use of self-aligned litho-etch-litho-etch (SALELE) double patterning for BEOL metal layers in the 7nm node (40 nm minimum metal pitch ) with DUV, and 5nm node (28 nm minimum metal pitch ) with EUV. First, we mention the evidence that this technique is being used; Xilinx  disclosed the… Read More
I recently posted an insightful article  published in 2013 on the cost of 3D NAND Flash by Dr. Andrew Walker, which has since received over 10,000 views on LinkedIn. The highlight was the plot of cost vs. the number of layers showing a minimum cost for some layer number, dependent on the etch sidewall angle. In this article, the same… Read More
Promoting EUV Lithography via Workshops, Consulting & Education
EUV Litho, Inc., together with EUV-IUCC, is excited to announce EUVL Supplier… Read More
For the 10nm – 5nm nodes, the leading-edge foundries are designing cells which utilize 6 or 7 metal tracks, entailing a wide metal line for every 4 or 5 minimum width lines, respectively (Figure 1).
Figure 1. Left: a 7-track cell. Right: a 6-track cell.
This is a fundamental vulnerability for lithography, as defocus can change… Read More