ASML’s decision to collaborate with Xanadu targets one of photonic quantum computing’s most unforgiving engineering constraints: photon loss. The companies will investigate advanced lithography processes for Xanadu’s photonic quantum hardware, focusing on whether tighter patterning control can suppress loss mechanisms… Read More
At advanced nodes, observed defectivity, variability, and process-window behavior increasingly extend beyond what EPE and CD metrics can characterize. Closing that gap requires new ways to model, optimize, and measure patterning as well
Siemens has announced advances in its collaboration with NVIDIA to accelerate computational lithography, addressing a demanding step in manufacturing advanced AI semiconductors. By integrating NVIDIA’s cuLitho library with Siemens Calibre manufacturing software, the companies aim to make sophisticated photomask optimization… Read More
Semiconductor manufacturing depends on lithography: the process of transferring tiny circuit patterns onto a silicon wafer. Conventional extreme-ultraviolet (EUV) lithography projects light with a wavelength of 13.5 nanometers through a reflective optical system, using a custom photomask to define each layer. It can … Read More
EUV has long been an interesting story. We have written 200+ articles on EUV and they just keep on coming. Thankfully the premier lithography conference is right here in Silicon Valley. SPIE began in 1955 as the Society of Photographic Instrumentation Engineers, bringing together engineers using scientific cameras and high-speed… Read More
Recently, I had the opportunity to speak with Johann Foucher, founder and CEO of Pollen Metrology, a French company whose journey offers a rare vantage point on how artificial intelligence is reshaping semiconductor manufacturing from the inside out. What makes Pollen Metrology’s story compelling isn’t just … Read More
ASML’s grip on the most advanced corner of chip manufacturing is tightening. The Dutch company, already the sole supplier of extreme ultraviolet lithography systems, is winning broader industry support for High Numerical Aperture EUV, or High NA, its next-generation technology for printing smaller and denser circuitry.… Read More
ASML and TSMC’s proposed shift from 6-inch to 12-inch photomasks is an attempt to redesign a critical but often overlooked part of advanced semiconductor manufacturing. Photomasks are precision plates carrying the circuit patterns projected by a lithography scanner onto a silicon wafer. In extreme-ultraviolet lithography,… Read More
Daniel is joined by Dr. Germain Fenger, Senior Director of Product Management at Synopsys where he leads advanced mask solutions and computational lithography technologies. With a background spanning semiconductor manufacturing, lithography research, engineering, and product leadership, Germain has held roles at imec,… Read More
The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and get business done. Find these technology solutions and more:
• Photoresist, EUV, and other specialty materials
• E-beam lithography systems
• Precision cleaning, contamination, transport… Read More
