Verifying circuits on advanced process nodes has always been difficult, and it’s no easier with today’s nanometer CMOS processes. There’s a great paradox in nanometer circuit design and verification. Designers achieve their greatest differentiation when they implement analog, mixed-signal, RF and custom … Read More
If you are doing transistor-level IC design then you’ve probably come up against questions like:
In the old days we would hold up the old and new versions of the schematics or IC layout and try to eye-ball what had changed. Now we have an automated… Read More
Introduction
Mentor Graphics and GLOBALFOUNDRIES have been working together for several generations since the 65nm node on making IC designs yield higher. Michael Buehler-Garcia, director of Calibre Design SolutionsMarketing at Mentor Graphics spoke with me by phone today to explain how they are working with GLOBALFOUNDRIES… Read More
There are a large number of challenges at 20nm that didn’t exist at 45nm or even 32nm.
The biggest issues are in the lithography area. Until now it has been possible to make a reticle using advanced reticle enhacement technology (RET) decoration and have it print. Amazing when you think that at 45nm we are making 45nm features… Read More
Atrenta has four seminars coming up on SoC realization. More and more design is actually about finding IP and integrating it together at the block level, and then handing it off to a standard RTL to GDSII flow. The three focus areas are:
Next Tuesday, August 23rd, is the ANSYS Regional Conference for Silicon Valley. It takes place at the Techmart Network Meeting Center. Apache has three presentations during the day:
Last month I had the pleasure of meeting Mr Wonyoung Kim, a PhD candidate from Harvard University. Like many candidates, Wonyoung is shopping his thesis for capital in hopes of starting a semiconductor IP company. Here is a brief summary of the technology, please provide appropriate feedback and let’s see if we can get him… Read More
The last of the current series of webinars is on Sentinel-PSI,IC-Package, Power and Signal Integrity Solution. It will be at 11am Pacific time on Thursday 11th August. It will be conducted by Dr. Tao Su, product manager of the Sentinel products. Dr. Su has many years of experience in the EDA industry and is specialized in power integrity… Read More
I’ve blogged about the Calibre family of IC design tools before:
Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is Better… Read More
Formal verification has grown in importance as designs have grown and it has become necessary to face up to the theoretical impossibility of using simulation to get complete coverage along with the practical impossibility of simulating enough to even get close.
There are a number of solvers for what is called satisfiability (SAT)… Read More
